SEMICONDUCTOR DEVICE WITH INHERENT CAPACITANCES AND METHOD FOR ITS PRODUCTION
    5.
    发明申请
    SEMICONDUCTOR DEVICE WITH INHERENT CAPACITANCES AND METHOD FOR ITS PRODUCTION 有权
    具有固有电容的半导体器件及其制造方法

    公开(公告)号:US20090224302A1

    公开(公告)日:2009-09-10

    申请号:US12043429

    申请日:2008-03-06

    IPC分类号: H01L29/94 H01L21/8238

    摘要: A semiconductor device with inherent capacitances and method for its production. The semiconductor device has an inherent feedback capacitance between a control electrode and a first electrode. In addition, the semiconductor device has an inherent drain-source capacitance between the first electrode and a second electrode. At least one monolithically integrated additional capacitance is connected in parallel to the inherent feedback capacitance or in parallel to the inherent drain-source capacitance. The additional capacitance comprises a first capacitor surface and a second capacitor surface opposite the first capacitor surface. The capacitor surfaces are structured conductive layers of the semiconductor device on a front side of the semiconductor body, between which a dielectric layer is located and which form at least one additional capacitor.

    摘要翻译: 具有固有电容的半导体器件及其制造方法。 半导体器件在控制电极和第一电极之间具有固有的反馈电容。 此外,半导体器件在第一电极和第二电极之间具有固有的漏极 - 源极电容。 至少一个单片集成附加电容与固有反馈电容并联连接,或与固有漏 - 源电容并联连接。 附加电容包括与第一电容器表面相对的第一电容器表面和第二电容器表面。 电容器表面是半导体器件的前侧上的半导体器件的结构化导电层,介电层位于其之间,并形成至少一个附加电容器。