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38 条记录 (耗时 0.028 秒)

    Plasma immersion ion processing for coating of hollow substrates
    3.
    发明授权
    Plasma immersion ion processing for coating of hollow substrates 有权
    用于涂覆中空基板的等离子浸渍离子处理

    公开(公告)号：US08029875B2

    公开(公告)日：2011-10-04

    申请号：US11752787

    申请日：2007-05-23

    申请人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    IPC分类号： H05H1/24

    CPC分类号： C23C16/0245 ,  C23C16/045 ,  C23C16/24 ,  C23C16/26 ,  C23C16/505

    摘要： The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.

    摘要翻译： 本公开涉及等离子体离子沉积和涂层形成的方法。 可以提供真空室，其中真空室由具有长度，直径和内表面的中空衬底形成。 可以在室内形成等离子体，同时向中空衬底施加负偏压以将离子从等离子体吸入中空衬底的内表面，以将离子沉积到内表面上并形成涂层。 该涂层可具有至少500的维氏硬度值（Hv）。

    Method and apparatus for forming a nitride layer on a biomedical device
    4.
    发明授权
    Method and apparatus for forming a nitride layer on a biomedical device 有权
    在生物医学装置上形成氮化物层的方法和装置

    公开(公告)号：US07261914B2

    公开(公告)日：2007-08-28

    申请号：US10811485

    申请日：2004-03-26

    申请人： Ronghua Wei ,  Thomas L. Booker ,  Christopher Rincon ,  James H. Arps

    发明人： Ronghua Wei ,  Thomas L. Booker ,  Christopher Rincon ,  James H. Arps

    IPC分类号： B05D3/06

    CPC分类号： C23C14/48 ,  C23C8/24 ,  C23C8/36 ,  H01J2237/3387

    摘要： This invention is a method of forming a nitride layer on at least one metal or metal alloy biomedical device, comprising: providing a vacuum chamber with at least one biomedical device positioned thereon on a worktable within the vacuum chamber; reducing the pressure in the vacuum chamber; introducing nitrogen into the vacuum chamber so that the pressure in the vacuum chamber is about 0.01 to about 10 milli-Torr; generating electrons within the vacuum chamber to form positively charged nitrogen ions; providing a negative bias to the worktable so that the positively charged nitrogen ions contact the biomedical devices under conditions such that a nitride layer forms on the at least one prosthetic device.

    摘要翻译： 本发明是一种在至少一种金属或金属合金生物医学装置上形成氮化物层的方法，其包括：在真空室内的工作台上提供具有至少一个生物医学装置的真空室; 降低真空室内的压力; 将氮气引入真空室，使得真空室中的压力为约0.01至约10毫乇; 在真空室内产生电子以形成带正电的氮离子; 向工作台提供负偏压，使得带正电的氮离子在使得在至少一个假肢装置上形成氮化物层的条件下接触生物医学装置。

    Nanostructured low-Cr Cu-Cr coatings for high temperature oxidation resistance
    5.
    发明授权
    Nanostructured low-Cr Cu-Cr coatings for high temperature oxidation resistance 有权
    纳米结构的低Cr Cu-Cr涂层，用于高温抗氧化

    公开(公告)号：US07592051B2

    公开(公告)日：2009-09-22

    申请号：US11054665

    申请日：2005-02-09

    申请人： Kuang-Tsan Kenneth Chiang ,  James H. Arps ,  Ronghua Wei

    发明人： Kuang-Tsan Kenneth Chiang ,  James H. Arps ,  Ronghua Wei

    IPC分类号： C23C14/18

    CPC分类号： C23C14/22 ,  C23C14/16 ,  Y02T50/67 ,  Y10T428/12903

    摘要： This invention is directed to a method of preventing oxidation of copper alloys at high temperatures by deposition of a nano-structured, low-chromium copper-chromium protective coating to copper-alloy components. The coatings of the present invention are applied by an ion beam assisted, electron beam physical vapor deposition and consist of copper and chromium particles having a diameter of about 10 nm. This invention also encompasses the coated copper-alloy components produced by the disclosed deposition methods.

    摘要翻译： 本发明涉及一种通过将纳米结构的低铬铜铬保护涂层沉积到铜合金部件来防止铜合金在高温下氧化的方法。 本发明的涂层通过离子束辅助的电子束物理气相沉积法施加，并由直径约10nm的铜和铬颗粒组成。 本发明还包括通过公开的沉积方法制备的涂覆的铜合金部件。

    Method for depositing coatings on the interior surfaces of tubular structures
    6.
    发明授权
    Method for depositing coatings on the interior surfaces of tubular structures 有权
    在管状结构的内表面上沉积涂层的方法

    公开(公告)号：US07052736B2

    公开(公告)日：2006-05-30

    申请号：US10807039

    申请日：2004-03-23

    申请人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    IPC分类号： B05D7/22 ,  C23C14/22

    CPC分类号： B05D7/22 ,  B05D1/62 ,  B05D7/52 ,  B05D2254/04 ,  F41A21/04 ,  Y10T428/13

    摘要： A method is disclosed for substantially uniformly coating an interior surface of a ferromagnetic tubular structure such as a ferromagnetic tube having a high aspect ratio. The method entails inducing a magnetic field of a given magnitude within the tubular structure. Further, a bias is applied at a given voltage to the tubular structure. Then, the interior surface of the tubular structure is exposed to a gaseous precursor material under conditions effective to convert a quantity of the gaseous precursor material to ionize gaseous precursor material. The given magnitude and voltage is such that it is effective to deposit the ionized the gaseous precursor material onto the interior surface and converts the ionized gaseous precursor material to a substantially uniform protective coating in the interior surface.

    摘要翻译： 公开了一种基本上均匀地涂覆铁磁管状结构的内表面的方法，例如具有高纵横比的铁磁管。 该方法需要在管状结构内引起给定量值的磁场。 此外，在给定电压下施加偏压到管状结构。 然后，管状结构的内表面在有效地将一定量的气态前体材料转化成电离气态前体材料的条件下暴露于气态前体材料。 给定的量值和电压使得将离子化的气态前体材料沉积到内表面上并将离子化的气态前体材料转化成内表面中基本均匀的保护涂层是有效的。

    Methods of forming nanocomposites containing nanodiamond particles by vapor deposition
    7.
    发明授权
    Methods of forming nanocomposites containing nanodiamond particles by vapor deposition 有权
    通过气相沉积形成含有纳米金刚石颗粒的纳米复合材料的方法

    公开(公告)号：US08496992B2

    公开(公告)日：2013-07-30

    申请号：US12964826

    申请日：2010-12-10

    申请人： Ronghua Wei ,  Christopher Rincon ,  Kent E. Coulter

    发明人： Ronghua Wei ,  Christopher Rincon ,  Kent E. Coulter

    IPC分类号： C23C16/26

    CPC分类号： B82Y30/00 ,  C23C14/0605 ,  C23C14/0611 ,  C23C14/0641 ,  C23C14/35 ,  C23C16/26 ,  C23C16/34 ,  C23C26/00

    摘要： A method of coating a substrate, with the method comprising: providing a substrate; dispersing nanodiamond powder in a liquid to provide a coating precursor; converting the liquid of the coating precursor to a vapor; introducing the coating precursor to a vapor deposition process; and operating the vapor deposition process to produce a nanocrystalline diamond-containing nanocomposite coating on the substrate, the nanocomposite coating produced using the coating precursor and comprising the nanodiamond particles.

    摘要翻译： 一种涂覆基材的方法，其方法包括：提供基材; 将纳米金刚石粉末分散在液体中以提供涂层前体; 将涂覆前体的液体转化为蒸气; 将涂料前体引入气相沉积工艺; 以及操作气相沉积工艺以在衬底上产生纳米晶体含金刚石的纳米复合材料涂层，所述纳米复合涂层使用涂层前体制备并且包含纳米金刚石颗粒。

    Method for depositing coatings on the interior surfaces of tubular walls
    8.
    发明授权
    Method for depositing coatings on the interior surfaces of tubular walls 有权
    在管壁内表面上沉积涂层的方法

    公开(公告)号：US06764714B2

    公开(公告)日：2004-07-20

    申请号：US10167189

    申请日：2002-06-11

    申请人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    IPC分类号： C23C1606

    CPC分类号： F41A21/04 ,  B05D1/62 ,  B05D7/22 ,  B05D7/52 ,  B05D2254/04 ,  Y10T428/30

    摘要： Methods for coating the interior surface of tubular structures having high aspect ratios and tubular structures produced by such methods. The interior surface of the tubular structure is coated by inducing a magnetic field having a given magnitude around a circumference along a length of the tubular structure, applying a bias at a given voltage to the tubular structure, and exposing the interior surface to a precursor material to deposit the precursor material onto the interior surface of the tubular structure.

    摘要翻译： 用于涂覆具有高纵横比的管状结构的内表面的方法和通过这些方法制造的管状结构。 管状结构的内表面通过沿管状结构的长度诱导围绕圆周具有给定大小的磁场，将给定电压的偏压施加到管状结构，并将内表面暴露于前体材料 以将前体材料沉积到管状结构的内表面上。

    Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode
    9.
    发明授权
    Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode 有权
    使用加热的中心电极等离子体浸没离子处理和沉积在中空基板中的涂层的方法

    公开(公告)号：US08753725B2

    公开(公告)日：2014-06-17

    申请号：US13046181

    申请日：2011-03-11

    申请人： Ronghua Wei ,  Richard L. Johnson ,  Christopher Rincon ,  Michael A. Miller

    发明人： Ronghua Wei ,  Richard L. Johnson ,  Christopher Rincon ,  Michael A. Miller

    IPC分类号： H05H1/24

    CPC分类号： C23C16/0227 ,  C23C16/0272 ,  C23C16/045 ,  C23C16/26

    摘要： A method for plasma immersion ion processing including providing a hollow substrate having an interior surface defining an interior and a gas feed tube extending through the interior, wherein the gas feed tube is hollow and includes a wall having a plurality of holes defined therein and applying tension to said gas feed tube by affixing a spring to one end of said gas feed tube and said vacuum chamber. The method may also include heating the gas feed tube to a temperature in the range of 50° C. to 650° C.; supplying a precursor gas to the interior of the hollow substrate through the plurality of holes in the gas feed tube and generating a plasma; and applying a negative bias to the hollow substrate relative to the gas feed tube to draw ions from the plasma to the interior surface to form a coating on the interior surface.

    摘要翻译： 一种用于等离子体浸没离子处理的方法，包括提供具有限定内部的内表面的中空基板和延伸穿过内部的气体供给管，其中气体供给管是中空的，并且包括壁，其中限定有多个孔并施加张力 通过将弹簧固定到所述气体供给管和所述真空室的一端而连接到所述气体供给管。 该方法还可以包括将气体进料管加热至50℃至650℃的温度范围内。 通过气体供给管中的多个孔将前体气体供应到中空基板的内部并产生等离子体; 以及相对于所述气体供给管将负偏压施加到所述中空衬底以将离子从所述等离子体吸入所述内表面以在所述内表面上形成涂层。