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38 条记录 (耗时 0.02 秒)

    Method for depositing coatings on the interior surfaces of tubular structures
    1.
    发明授权
    Method for depositing coatings on the interior surfaces of tubular structures 有权
    在管状结构的内表面上沉积涂层的方法

    公开(公告)号：US07052736B2

    公开(公告)日：2006-05-30

    申请号：US10807039

    申请日：2004-03-23

    申请人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    IPC分类号： B05D7/22 ,  C23C14/22

    CPC分类号： B05D7/22 ,  B05D1/62 ,  B05D7/52 ,  B05D2254/04 ,  F41A21/04 ,  Y10T428/13

    摘要： A method is disclosed for substantially uniformly coating an interior surface of a ferromagnetic tubular structure such as a ferromagnetic tube having a high aspect ratio. The method entails inducing a magnetic field of a given magnitude within the tubular structure. Further, a bias is applied at a given voltage to the tubular structure. Then, the interior surface of the tubular structure is exposed to a gaseous precursor material under conditions effective to convert a quantity of the gaseous precursor material to ionize gaseous precursor material. The given magnitude and voltage is such that it is effective to deposit the ionized the gaseous precursor material onto the interior surface and converts the ionized gaseous precursor material to a substantially uniform protective coating in the interior surface.

    摘要翻译： 公开了一种基本上均匀地涂覆铁磁管状结构的内表面的方法，例如具有高纵横比的铁磁管。 该方法需要在管状结构内引起给定量值的磁场。 此外，在给定电压下施加偏压到管状结构。 然后，管状结构的内表面在有效地将一定量的气态前体材料转化成电离气态前体材料的条件下暴露于气态前体材料。 给定的量值和电压使得将离子化的气态前体材料沉积到内表面上并将离子化的气态前体材料转化成内表面中基本均匀的保护涂层是有效的。

    Method for depositing coatings on the interior surfaces of tubular walls
    2.
    发明授权
    Method for depositing coatings on the interior surfaces of tubular walls 有权
    在管壁内表面上沉积涂层的方法

    公开(公告)号：US06764714B2

    公开(公告)日：2004-07-20

    申请号：US10167189

    申请日：2002-06-11

    申请人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James Arps

    IPC分类号： C23C1606

    CPC分类号： F41A21/04 ,  B05D1/62 ,  B05D7/22 ,  B05D7/52 ,  B05D2254/04 ,  Y10T428/30

    摘要： Methods for coating the interior surface of tubular structures having high aspect ratios and tubular structures produced by such methods. The interior surface of the tubular structure is coated by inducing a magnetic field having a given magnitude around a circumference along a length of the tubular structure, applying a bias at a given voltage to the tubular structure, and exposing the interior surface to a precursor material to deposit the precursor material onto the interior surface of the tubular structure.

    摘要翻译： 用于涂覆具有高纵横比的管状结构的内表面的方法和通过这些方法制造的管状结构。 管状结构的内表面通过沿管状结构的长度诱导围绕圆周具有给定大小的磁场，将给定电压的偏压施加到管状结构，并将内表面暴露于前体材料 以将前体材料沉积到管状结构的内表面上。

    Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition
    3.
    发明申请
    Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition 审中-公开
    金属等离子体浸没离子注入和金属等离子体浸没离子沉积的装置和方法

    公开(公告)号：US20050061251A1

    公开(公告)日：2005-03-24

    申请号：US10932925

    申请日：2004-09-02

    申请人： Ronghua Wei ,  Thomas Booker ,  Christopher Rincon ,  James Arps

    发明人： Ronghua Wei ,  Thomas Booker ,  Christopher Rincon ,  James Arps

    IPC分类号： C23C14/00 ,  C23C14/26 ,  C23C14/30 ,  C23C14/32 ,  C23C14/48 ,  C23C16/00 ,  H01J37/32

    CPC分类号： C23C14/48 ,  C23C14/26 ,  C23C14/30 ,  C23C14/32 ,  H01J37/32412

    摘要： This invention is a method for metal plasma ion implantation and metal plasma ion deposition, comprising: providing a vacuum chamber with at least one workpiece having a surface positioned on a worktable within the vacuum chamber; reducing the pressure in the vacuum chamber; generating a plasma of metal ions within the vacuum chamber, applying a negative bias to the worktable to thereby accelerate metal ions from the plasma toward at least one workpiece to thereby either implant metal ions into or deposit metal ions onto the workpiece or both. This invention includes an apparatus for metal ion implantation and metal ion plasma deposition, comprising: a vacuum chamber, a metal plasma generator within the vacuum chamber, and at least one worktable within the vacuum chamber.

    摘要翻译： 本发明是一种用于金属等离子体离子注入和金属等离子体离子沉积的方法，包括：提供具有至少一个工件的真空室，所述工件具有位于所述真空室内的工作台上的表面; 降低真空室内的压力; 在真空室内产生金属离子等离子体，向工作台施加负偏压，从而将金属离子从等离子体加速至至少一个工件，从而将金属离子注入或将金属离子沉积到工件上或两者上。 本发明包括一种用于金属离子注入和金属离子等离子体沉积的装置，包括：真空室，真空室内的金属等离子体发生器和真空室内的至少一个工作台。

    Methods of forming nanocomposites containing nanodiamond particles by vapor deposition
    6.
    发明授权
    Methods of forming nanocomposites containing nanodiamond particles by vapor deposition 有权
    通过气相沉积形成含有纳米金刚石颗粒的纳米复合材料的方法

    公开(公告)号：US08496992B2

    公开(公告)日：2013-07-30

    申请号：US12964826

    申请日：2010-12-10

    申请人： Ronghua Wei ,  Christopher Rincon ,  Kent E. Coulter

    发明人： Ronghua Wei ,  Christopher Rincon ,  Kent E. Coulter

    IPC分类号： C23C16/26

    CPC分类号： B82Y30/00 ,  C23C14/0605 ,  C23C14/0611 ,  C23C14/0641 ,  C23C14/35 ,  C23C16/26 ,  C23C16/34 ,  C23C26/00

    摘要： A method of coating a substrate, with the method comprising: providing a substrate; dispersing nanodiamond powder in a liquid to provide a coating precursor; converting the liquid of the coating precursor to a vapor; introducing the coating precursor to a vapor deposition process; and operating the vapor deposition process to produce a nanocrystalline diamond-containing nanocomposite coating on the substrate, the nanocomposite coating produced using the coating precursor and comprising the nanodiamond particles.

    摘要翻译： 一种涂覆基材的方法，其方法包括：提供基材; 将纳米金刚石粉末分散在液体中以提供涂层前体; 将涂覆前体的液体转化为蒸气; 将涂料前体引入气相沉积工艺; 以及操作气相沉积工艺以在衬底上产生纳米晶体含金刚石的纳米复合材料涂层，所述纳米复合涂层使用涂层前体制备并且包含纳米金刚石颗粒。

    Plasma immersion ion processing for coating of hollow substrates
    7.
    发明授权
    Plasma immersion ion processing for coating of hollow substrates 有权
    用于涂覆中空基板的等离子浸渍离子处理

    公开(公告)号：US08029875B2

    公开(公告)日：2011-10-04

    申请号：US11752787

    申请日：2007-05-23

    申请人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    发明人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

    IPC分类号： H05H1/24

    CPC分类号： C23C16/0245 ,  C23C16/045 ,  C23C16/24 ,  C23C16/26 ,  C23C16/505

    摘要： The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.

    摘要翻译： 本公开涉及等离子体离子沉积和涂层形成的方法。 可以提供真空室，其中真空室由具有长度，直径和内表面的中空衬底形成。 可以在室内形成等离子体，同时向中空衬底施加负偏压以将离子从等离子体吸入中空衬底的内表面，以将离子沉积到内表面上并形成涂层。 该涂层可具有至少500的维氏硬度值（Hv）。

    Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode
    8.
    发明授权
    Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode 有权
    使用加热的中心电极等离子体浸没离子处理和沉积在中空基板中的涂层的方法

    公开(公告)号：US08753725B2

    公开(公告)日：2014-06-17

    申请号：US13046181

    申请日：2011-03-11

    申请人： Ronghua Wei ,  Richard L. Johnson ,  Christopher Rincon ,  Michael A. Miller

    发明人： Ronghua Wei ,  Richard L. Johnson ,  Christopher Rincon ,  Michael A. Miller

    IPC分类号： H05H1/24

    CPC分类号： C23C16/0227 ,  C23C16/0272 ,  C23C16/045 ,  C23C16/26

    摘要： A method for plasma immersion ion processing including providing a hollow substrate having an interior surface defining an interior and a gas feed tube extending through the interior, wherein the gas feed tube is hollow and includes a wall having a plurality of holes defined therein and applying tension to said gas feed tube by affixing a spring to one end of said gas feed tube and said vacuum chamber. The method may also include heating the gas feed tube to a temperature in the range of 50° C. to 650° C.; supplying a precursor gas to the interior of the hollow substrate through the plurality of holes in the gas feed tube and generating a plasma; and applying a negative bias to the hollow substrate relative to the gas feed tube to draw ions from the plasma to the interior surface to form a coating on the interior surface.

    摘要翻译： 一种用于等离子体浸没离子处理的方法，包括提供具有限定内部的内表面的中空基板和延伸穿过内部的气体供给管，其中气体供给管是中空的，并且包括壁，其中限定有多个孔并施加张力 通过将弹簧固定到所述气体供给管和所述真空室的一端而连接到所述气体供给管。 该方法还可以包括将气体进料管加热至50℃至650℃的温度范围内。 通过气体供给管中的多个孔将前体气体供应到中空基板的内部并产生等离子体; 以及相对于所述气体供给管将负偏压施加到所述中空衬底以将离子从所述等离子体吸入所述内表面以在所述内表面上形成涂层。

    SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE
    10.
    发明申请
    SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE 审中-公开
    用于在管状结构的内表面沉积涂层的系统和方法

    公开(公告)号：US20110111132A1

    公开(公告)日：2011-05-12

    申请号：US12939248

    申请日：2010-11-04

    申请人： Ronghua Wei ,  Christopher Rincon ,  Edward Langa ,  Narayana S. Cheruvu

    发明人： Ronghua Wei ,  Christopher Rincon ,  Edward Langa ,  Narayana S. Cheruvu

    IPC分类号： C23C14/02 ,  B29C71/04

    CPC分类号： C23C16/045 ,  C23C16/26 ,  H01J37/32596

    摘要： A system and method for depositing coatings on an inner surface of a tubular structure includes at least one pump for creating and maintaining a vacuum in the tubular structure, a meshed electrode adapted to be positioned in a center of the tubular structure, and a biased voltage power supply connected to the meshed electrode. The biased voltage power supply is adapted to apply a negative voltage to the meshed electrode such that the negative voltage causes a hollow cathode discharge inside the meshed electrode. The creation of the hollow cathode discharge causes ions to be drawn out of a mesh on the meshed electrode and accelerate onto an inner surface of the tubular structure, thereby coating the inner surface with a desired coating.

    摘要翻译： 用于在管状结构的内表面上沉积涂层的系统和方法包括至少一个用于在管状结构中产生和保持真空的泵，适于定位在管状结构的中心的网状电极和偏置电压 电源连接到网状电极。 偏置电压电源适于向网状电极施加负电压，使得负电压在网状电极内部引起空心阴极放电。 空心阴极放电的产生导致离子从网状电极上的网状物拉出并加速到管状结构的内表面上，从而以期望的涂层涂覆内表面。