摘要:
Polyarylene ethers which, based on the total amount of the structural units present in the polyether resin, contain 2-100 mol % of a recurring structural unit of formula I ##STR1## and 0-98 mol % of a recurring structural unit of formula II wherein each a is 1 or 2, 10 to 100% of X, based on the total number of the bonds X present in the structural units of formulae I and II, are --SO.sub.2 --, and 0 to 90% of X are --CO--, and A is a group of formula IIIa-IIIg: ##STR2## wherein Y is --CH.sub.2 --, --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --, --S--, --SO--, --SO.sub.2 --, --O-- or --CO--, and the aromatic rings in the structural units of formulae I and II are unsubstituted or substituted by one or more alkyl groups of 1 to 4 carbon atoms, have good solubility in organic solvents and are suitable preferably for modifying other plastics materials or for use as matrix resins for the production of fibrous composite structures.
摘要:
The invention relates to polyarylene ethers which contain, based on the total amount of structural elements present in the polyether resin, 5-100 mol % of a recurring structural element of the formula I ##STR1## and 0-95 mol % of a recurring structural element of the formula II ##STR2## in which X and X' independently of one another are --SO--, --SO.sub.2 -- or --CO--, one of the radicals R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is phenyl or phenyl which is substituted by one to three (C.sub.1 -C.sub.4)alkyl groups and the remaining radicals R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, (C.sub.1 -C.sub.4)alkyl, phenyl or phenyl which is substituted by one to three (C.sub.1 -C.sub.4)alkyl groups, and A is an aromatic radical, at least 25% of the bonds X and/or Y and/or the bridge members contained in A being --SO.sub.2 --.These industrial materials are distinguished by very good mechanical properties and good solubility.
摘要:
Polyarylene ether sulfones which have a reduced viscosity of 0.1 to 2.0 dl/g, measured at 25.degree. C. in a 1% solution in N-methylpyrrolidone (NMP), and which contain, based on the total number of structural units present in the polyarylene ether sulfone resin, 99-1 mol % of a recurring structural unit of formula I ##STR1## and 1-99 mol % of a recurring structural unit of formula II--O--Ar.sub.2 --O--Ar.sub.1 -- (II)wherein the aromatic rings in the structural unit of formula I are unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, Ar.sub.1 is a radical of formula IIIa-IIIc ##STR2## wherein a is 0 or 1, ##STR3## which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, and Ar.sub.2 is a radical of formula IVa-IVe ##STR4## wherein b is 0 or 1 ##STR5## wherein c is 0 or 1 ##STR6## wherein Z is --CO--, --SO.sub.2 --, --SO--, --S--, --O--, ##STR7## wherein R is methyl or phenyl, which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, are soluble in customary organic solvents and can be processed from the solution to films or incorporated in other matrix resins.
摘要:
Compounds of the formula I ##STR1## in which a is 1, 2 or 3, b is 0, 1, or 2, R.sup.1 and R.sup.2, independently of one another are hydrogen or methyl, R.sup.3 is C.sub.1 -C.sub.6 alkyl, R.sup.4 is selected from the group consisting of the formulas IIa, IIb, IIc, IId, IIe or IIf ##STR2## X is --O--, --S--, --CO--, --COO--, --CO--NR.sup.5 -- or --CR.sup.6 R.sup.7 --, Z.sup.1 is --CR.sup.6 R.sup.7 --, Z.sup.2 is --SO.sub.2 -- or --CO--, Y is a direct C--C bond, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --P(O)R.sup.9 --, --COO--, --CO--NR.sup.5 --, --C.sub.n H.sub.2n -- or --CR.sup.10 R.sup.11 --, n is an integer from 1 to 12, R.sup.5 is hydrogen or C.sub.1 -C.sub.6 alkyl, R.sup.6 and R.sup.7, independently of one another, are hydrogen, or C.sub.1 -C.sub.6 alkyl, --CF.sub.3, cyclohexyl or phenyl, or R.sup.6 and R.sup.7 together with the common C atom are a cycloalkylidene radical having 5 to 7 ring carbon atoms, R.sup.8 is C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.9 is methyl, cyclohexyl or phenyl, R.sup. 10 is --CF.sub.3, cyclohexyl or phenyl, R.sup.11 can adopt one of the meanings of R.sup.10 or is additionally hydrogen, or R.sup.10 and R.sup.11 together with the common C atom are a cycloalkylidene radical having 5 to 7 ring carbon atoms.The compounds can be used as matrix resin, in particular in combination with polymaleimides, for the production of composite materials.
摘要:
Biomedical devices, such as ophthalmic lenses, and methods of making such devices having a surface coating including at least one polyionic layer. A preferred method involves spray coating a polycationic material onto a core lens, rinsing and drying the lens, followed by spray coating a polyanionic material, rinsing and drying. The coating process may be applied a plurality of times to achieve a multi-layer coating on the lens surface. A particularly preferred embodiment is a contact lens comprising a highly oxygen permeable hydrophobic core coated with a 5 to 20 bilayers of hydrophilic polyionic materials.
摘要:
A method of incorporating radiation-absorbing agents (i.e., dyes) into polymeric materials. A preferred method involves crosslinking or polymerizing a polymerizable or crosslinkable material in the presence of a polymeric dye. A preferred product is a tinted contact lens comprising poly(vinyl alcohol). The methods offer advantages in reduced fabrication cycles, reduced extractables, elimination of post-polymerization activation steps, elimination of post-polymerization extraction steps and reduced scrap and costs associated with lens handling.
摘要:
The invention relates to curable compositions comprising(a) a copolyether resin having end groups --OR.sup.1 linked direct to phenyl nuclei and containing 1 to 50 mol % of repeating structural units of formula I ##STR1## and 99 to 50 mol % of repeating structural units of formula II ##STR2## wherein R.sup.1 is hydrogen, a phenylene radical substituted by amino agroups or ethylenically unsaturated radicals or is a 2,3-epoxypropyl radical, R.sup.2 is a direct C--C bond or a group of formula --C.sub.r H.sub.2r --, --O--, --S--, --CO-- or --SO.sub.2 --, r is 1 to 20, R.sup.3 is hydrogen or methyl, R.sup.4, R.sup.5 and R.sup.7 are inert substituents, m, n and o are each independently 0, 1 or 2, p is 1 or 2, R.sup.6 is a radical of a bisphenol, X and Y are --SO.sub.2 -- or --CO--, and(b) at least one compound of formula VIII, IX or X ##STR3## wherein A forms a maleimidyl, nadicimidyl, allylnadicimidyl or methallylnadicimidyl system, and R.sup.14 and R.sup.15 are mono- or divalent alipahtic, cycloaliphatic, aromatic or heterocyclic radicals, and R.sup.16 and an aromatic radical of valency t and t is an integer from 3 to 12.The compounds can be used as matrix resins for the preparation of fibrous composite structures.
摘要:
N-Cyanoacylamide compounds of the formula I ##STR1## wherein R.sub.1 is hydrogen, alkyl, cycloalkyl or aryl, R.sub.2 is hydrogen or alkyl and R.sub.3 is alkylene or arylenealkylene, are prepared by reacting 1 mol of an N-cyanocarboxylic acid amide salt with 1 mol of a halogen compound in a polar, aprotic solvent.The N-cyanoacylamide compounds of the formula I can be used for hardening epoxide resins, for the preparation of isomelamine or for the preparation of linear polymers which can be crosslinked by heat.
摘要:
Curable mixtures containing (a) epoxide compounds with on average more than one 1,2-epoxide group per molecule, (b) the condensates prepared from certain phenols, certain amines and aldehydes or ketones in an acid medium and, where relevant, (c) curing accelerators. The novel curable mixtures have a good storage stability and give shaped substances with outstanding resistance to chemicals.
摘要:
Novel carboxylic acid metal salt/amine complexes are prepared by reacting 1 mol of a carboxylic acid metal salt of the formula(A.sup..crclbar.).sub.2 ME.sup.2+in which A.sup..crclbar. is the anion of a carboxylic acid which contains polar substituents or radicals and in particular contains an amide or imide grouping, such as a halogenoacetic acid, nitrilo-, cyano- or ureido-acetic acid, monoamidosuccinic acid, succinimidyl- or maleimidyl-alkanecarboxylic acid, benzenesulphonic acid or pyrrolidone-5-carboxylic acid, and Me.sup.2+ is a divalent metal cation, with 1 mol of a diamine of the formulaR.sub.1 --NH--R--NH--R.sub.2in which R is an aliphatic radical having not more than 7 C atoms or is a cycloaliphatic radical and R.sub.1 and R.sub.2 are hydrogen, alkyl having 1 to 4 C atoms, cyclohexyl, benzyl, 2-aminoethyl or 3-aminopropyl, in a polar organic solvent and in the temperature range from 25.degree. to 200.degree. C., to give complex compounds. The novel complex compounds are suitable as catalytic curing agents for epoxide resins.