公开(公告)号：US20100320526A1

公开(公告)日：2010-12-23

申请号：US12727730

申请日：2010-03-19

申请人： Masaru KIDOH ,  Ryota KATSUMATA ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Tomoko FUJIWARA ,  Yoshimasa MIKAJIRI ,  Shigeto OOTA ,  Hideaki AOCHI ,  Ryouhei KIRISAWA ,  Junya MATSUNAMI

发明人： Masaru KIDOH ,  Ryota KATSUMATA ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Tomoko FUJIWARA ,  Yoshimasa MIKAJIRI ,  Shigeto OOTA ,  Hideaki AOCHI ,  Ryouhei KIRISAWA ,  Junya MATSUNAMI

IPC分类号： H01L29/792 ,  H01L21/336

CPC分类号： H01L27/11578 ,  H01L23/522 ,  H01L23/53257 ,  H01L23/53271 ,  H01L27/11582 ,  H01L2924/0002 ,  H01L2924/00

摘要： A nonvolatile semiconductor memory device includes: a semiconductor substrate; a memory unit; and a circuit unit provided between the semiconductor substrate and the memory unit. The memory unit includes: a stacked structural unit having electrode films alternately stacked with inter-electrode-film insulating films; a semiconductor pillar piercing the stacked structural unit; and a storage unit provided corresponding to an intersection between the electrode films and the semiconductor pillar. The circuit unit includes first and second transistors having different conductivity type, a first interconnect, and first and second contact plugs. The first interconnect includes silicide provided on a side of the first and second transistors opposite to the semiconductor substrate. The first contact plug made of polysilicon of the first conductivity type connects the first interconnect to the first transistor. The second contact plug made of polysilicon of the second conductivity type connects the first interconnect to the second transistor.

摘要翻译： 非易失性半导体存储器件包括：半导体衬底; 记忆单元 以及设置在半导体衬底和存储器单元之间的电路单元。 存储单元包括：层叠结构单元，其具有交替层叠有电极间绝缘膜的电极膜; 穿过堆叠结构单元的半导体柱; 以及与电极膜和半导体柱之间的交点对应地设置的存储单元。 电路单元包括具有不同导电类型的第一和第二晶体管，第一互连以及第一和第二接触插塞。 第一互连包括设置在与半导体衬底相对的第一和第二晶体管一侧的硅化物。 由第一导电类型的多晶硅制成的第一接触插头将第一互连件连接到第一晶体管。 由第二导电类型的多晶硅制成的第二接触插头将第一互连件连接到第二晶体管。

公开(公告)号：US20100244186A1

公开(公告)日：2010-09-30

申请号：US12722920

申请日：2010-03-12

申请人： Ryota KATSUMATA ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI ,  Ryouhei KIRISAWA ,  Junya MATSUNAMI ,  Tomoko FUJIWARA

发明人： Ryota KATSUMATA ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI ,  Ryouhei KIRISAWA ,  Junya MATSUNAMI ,  Tomoko FUJIWARA

IPC分类号： H01L27/10 ,  H01L21/822 ,  G11C17/16

CPC分类号： H01L27/1021 ,  H01L23/5252 ,  H01L27/0207 ,  H01L27/101 ,  H01L27/112 ,  H01L27/11206 ,  H01L2924/0002 ,  H01L2924/00

摘要： A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of stacked component units stacked in a first direction, each of the stacked component units including a first conducting film made of a semiconductor of a first conductivity type provided perpendicular to the first direction and a first insulating film stacked in the first direction with the first conducting film; a semiconductor pillar piercing the stacked structural unit in the first direction and including a conducting region of a second conductivity type, the semiconductor pillar including a first region opposing each of the first conducting films, and a second region provided between the first regions with respect to the first direction, the second region having a resistance different from a resistance of the first region; and a second insulating film provided between the semiconductor pillar and the first conducting film.

摘要翻译： 一种非易失性半导体存储器件，包括：堆叠结构单元，包括沿第一方向堆叠的多个堆叠的元件单元，每个堆叠元件单元包括由垂直于第一元件垂直设置的第一导电类型的半导体制成的第一导电膜 方向和与第一导电膜在第一方向上堆叠的第一绝缘膜; 所述半导体柱在所述第一方向上穿透所述层叠结构单元，并且包括第二导电类型的导电区域，所述半导体柱包括与所述第一导电膜相对的第一区域，以及设置在所述第一区域之间的第二区域， 所述第一方向，所述第二区域具有与所述第一区域的电阻不同的电阻; 以及设置在所述半导体柱和所述第一导电膜之间的第二绝缘膜。

公开(公告)号：US20100207194A1

公开(公告)日：2010-08-19

申请号：US12706127

申请日：2010-02-16

申请人： Hiroyasu TANAKA ,  Hideaki AOCHI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Tomoko FUJIWARA ,  Junya MATSUNAMI ,  Ryouhei KIRISAWA

发明人： Hiroyasu TANAKA ,  Hideaki AOCHI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Masaru KITO ,  Yoshiaki FUKUZUMI ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Tomoko FUJIWARA ,  Junya MATSUNAMI ,  Ryouhei KIRISAWA

IPC分类号： H01L27/115 ,  H01L21/8246

CPC分类号： H01L29/792 ,  H01L27/11578 ,  H01L27/11582 ,  H01L29/66833

摘要： A nonvolatile semiconductor memory device includes: a semiconductor substrate; a stacked body provided on the semiconductor substrate, the stacked body having electrode films and insulating films being alternately stacked; a first and second semiconductor pillars; and a first and second charge storage layers. The first and second semiconductor pillars are provided inside a through hole penetrating through the stacked body in a stacking direction of the stacked body. The through hole has a cross section of an oblate circle, when cutting in a direction perpendicular to the stacking direction. The first and second semiconductor pillars face each other in a major axis direction of the first oblate circle. The first and second semiconductor pillars extend in the stacking direction. The first and second charge storage layers are provided between the electrode film and the first and second semiconductor pillars, respectively.

摘要翻译： 非易失性半导体存储器件包括：半导体衬底; 设置在所述半导体基板上的层叠体，具有交替堆叠的电极膜和绝缘膜的层叠体， 第一和第二半导体柱; 以及第一和第二电荷存储层。 第一半导体柱和第二半导体柱设置在层叠体的层叠方向上贯穿层叠体的贯通孔内。 当沿垂直于堆叠方向的方向切割时，通孔具有扁圆形的横截面。 第一和第二半导体柱在第一扁圆的长轴方向上彼此面对。 第一和第二半导体柱沿层叠方向延伸。 第一和第二电荷存储层分别设置在电极膜和第一和第二半导体柱之间。

公开(公告)号：US20130109157A1

公开(公告)日：2013-05-02

申请号：US13723601

申请日：2012-12-21

申请人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Masaru KIDOH ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hiroyasu TANAKA ,  Ryota KATSUMATA ,  Hideaki AOCHI

发明人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Masaru KIDOH ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hiroyasu TANAKA ,  Ryota KATSUMATA ,  Hideaki AOCHI

IPC分类号： H01L29/792

CPC分类号： H01L29/7926 ,  H01L27/0688 ,  H01L27/11551 ,  H01L27/11556 ,  H01L29/7881

摘要： A non-volatile semiconductor storage device includes a plurality of memory strings each having a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprising: a first semiconductor layer including a columnar portion extending in a vertical direction with respect to a substrate; a plurality of first conductive layers formed to surround side surfaces of the columnar portions via insulation layers, and formed at a certain pitch in the vertical direction, the first conductive layers functioning as floating gates of the memory cells; and a plurality of second conductive layers formed to surround the first conductive layers via insulation layers, and functioning as control electrodes of the memory cells. Each of the first conductive layers has a length in the vertical direction that is shorter than a length in the vertical direction of each of the second conductive layers.

摘要翻译： 非挥发性半导体存储装置包括多个存储串，每个存储串具有串联连接的多个电可重写存储单元。 每个存储器串包括：第一半导体层，包括相对于衬底在垂直方向上延伸的柱状部分; 多个第一导电层，经由绝缘层形成为围绕柱状部分的侧表面，并以垂直方向上的一定间距形成，第一导电层用作存储器单元的浮动栅极; 以及形成为经由绝缘层包围第一导电层并且用作存储单元的控制电极的多个第二导电层。 每个第一导电层在垂直方向上具有比每个第二导电层的垂直方向上的长度短的长度。

公开(公告)号：US20120135593A1

公开(公告)日：2012-05-31

申请号：US13366509

申请日：2012-02-06

申请人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hideaki AOCHI

发明人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hideaki AOCHI

IPC分类号： H01L21/336

CPC分类号： H01L27/11578 ,  H01L27/11582 ,  H01L29/66833 ,  H01L29/792 ,  H01L29/7926

摘要： A nonvolatile semiconductor memory device includes a plurality of memory strings, each of which has a plurality of electrically rewritable memory cells connected in series; and select transistors, one of which is connected to each of ends of each of the memory strings. Each of the memory strings is provided with a first semiconductor layer having a pair of columnar portions extending in a perpendicular direction with respect to a substrate, and a joining portion formed so as to join lower ends of the pair of columnar portions; a charge storage layer formed so as to surround a side surface of the columnar portions; and a first conductive layer formed so as to surround the side surface of the columnar portions and the charge storage layer, and configured to function as a control electrode of the memory cells. Each of the select transistors is provided with a second semiconductor layer extending upwardly from an upper surface of the columnar portions; and a second conductive layer formed so as to surround a side surface of the second semiconductor layer with a gap interposed, and configured to function as a control electrode of the select transistors.

摘要翻译： 非易失性半导体存储器件包括多个存储串，每个存储串具有串联连接的多个电可重写存储单元; 并选择晶体管，其中一个连接到每个存储器串的每一端。 每个存储器串都具有第一半导体层，该第一半导体层具有相对于基板在垂直方向上延伸的一对柱状部分，以及形成为连接该一对柱状部分的下端的接合部分; 形成为围绕所述柱状部的侧面的电荷存储层; 以及形成为围绕柱状部分的侧面和电荷存储层的第一导电层，并且被配置为用作存储单元的控制电极。 每个选择晶体管设置有从柱状部分的上表面向上延伸的第二半导体层; 以及第二导电层，其被形成为以间隔开的方式围绕所述第二半导体层的侧表面，并且被配置为用作所述选择晶体管的控制电极。

公开(公告)号：US20100072538A1

公开(公告)日：2010-03-25

申请号：US12534576

申请日：2009-08-03

申请人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hideaki AOCHI

发明人： Masaru KITO ,  Yoshiaki FUKUZUMI ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Hideaki AOCHI

IPC分类号： H01L27/115 ,  H01L21/8246

CPC分类号： H01L27/11578 ,  H01L27/11582 ,  H01L29/66833 ,  H01L29/792 ,  H01L29/7926

摘要： A nonvolatile semiconductor memory device includes a plurality of memory strings, each of which has a plurality of electrically rewritable memory cells connected in series; and select transistors, one of which is connected to each of ends of each of the memory strings. Each of the memory strings is provided with a first semiconductor layer having a pair of columnar portions extending in a perpendicular direction with respect to a substrate, and a joining portion formed so as to join lower ends of the pair of columnar portions; a charge storage layer formed so as to surround a side surface of the columnar portions; and a first conductive layer formed so as to surround the side surface of the columnar portions and the charge storage layer, and configured to function as a control electrode of the memory cells. Each of the select transistors is provided with a second semiconductor layer extending upwardly from an upper surface of the columnar portions; and a second conductive layer formed so as to surround a side surface of the second semiconductor layer with a gap interposed, and configured to function as a control electrode of the select transistors.

摘要翻译： 非易失性半导体存储器件包括多个存储串，每个存储串具有串联连接的多个电可重写存储单元; 并选择晶体管，其中一个连接到每个存储器串的每一端。 每个存储器串都具有第一半导体层，该第一半导体层具有相对于基板在垂直方向上延伸的一对柱状部分，以及形成为连接该一对柱状部分的下端的接合部分; 形成为围绕所述柱状部的侧面的电荷存储层; 以及形成为围绕柱状部分的侧面和电荷存储层的第一导电层，并且被配置为用作存储单元的控制电极。 每个选择晶体管设置有从柱状部分的上表面向上延伸的第二半导体层; 以及第二导电层，其被形成为以间隔开的方式围绕所述第二半导体层的侧表面，并且被配置为用作所述选择晶体管的控制电极。

公开(公告)号：US20100171162A1

公开(公告)日：2010-07-08

申请号：US12647836

申请日：2009-12-28

申请人： Ryota KATSUMATA ,  Hideaki AOCHI ,  Masaru KITO ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Masaru KIDOH ,  Yoshiaki FUKUZUMI

发明人： Ryota KATSUMATA ,  Hideaki AOCHI ,  Masaru KITO ,  Hiroyasu TANAKA ,  Megumi ISHIDUKI ,  Yosuke KOMORI ,  Masaru KIDOH ,  Yoshiaki FUKUZUMI

IPC分类号： H01L27/088 ,  H01L21/822

CPC分类号： H01L27/11578 ,  H01L27/0688 ,  H01L27/11582 ,  H01L29/66833 ,  H01L29/792 ,  H01L29/7926

摘要： Each of memory strings comprising: a first semiconductor layer having a pair of columnar portions extending in a vertical direction to a substrate and a joining portion formed to join lower ends of the pair of columnar portions; an electric charge accumulation layer formed to surround a side surface of the first semiconductor layer; and a first conductive layer formed to surround a side surface of the electric charge accumulation layer. The columnar portions are aligned at a first pitch in a first direction orthogonal to the vertical direction, and arranged in a staggered pattern at a second pitch in a second direction orthogonal to the vertical and first directions. The first conductive layers are configured to be arranged at the first pitch in the first direction, and extend to curve in a wave-like fashion in the second direction along the staggered-pattern arrangement.

摘要翻译： 每个存储串包括：第一半导体层，具有在垂直方向上延伸到基板的一对柱状部分和形成为连接该一对柱状部分的下端的接合部分; 形成为包围第一半导体层的侧面的电荷蓄积层; 以及形成为围绕电荷蓄积层的侧表面的第一导电层。 柱状部分在垂直于垂直方向的第一方向上以第一间距排列，并且在垂直于垂直方向和第一方向的第二方向上以第二间距布置成交错图案。 第一导电层被配置为沿着第一方向以第一间距布置，并且沿着交错图案布置在第二方向上以波浪形的方式延伸。

公开(公告)号：US20100117137A1

公开(公告)日：2010-05-13

申请号：US12559865

申请日：2009-09-15

申请人： Yoshiaki FUKUZUMI ,  Masaru KITO ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI

发明人： Yoshiaki FUKUZUMI ,  Masaru KITO ,  Ryota KATSUMATA ,  Masaru KIDOH ,  Hiroyasu TANAKA ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI

IPC分类号： H01L29/792 ,  H01L21/336

CPC分类号： H01L27/11578 ,  H01L21/28282 ,  H01L27/11582 ,  H01L29/66833 ,  H01L29/792 ,  H01L29/7926

摘要： Each of memory strings is provided with a first semiconductor layer having a pair of columnar portions extending in a perpendicular direction with respect to a substrate; a charge storage layer formed to surround a side surface of the columnar portions; and a first conductive layer formed to surround the charge storage layer. Each of the select transistors is provided with a second semiconductor layer extending upwardly from an upper surface of the columnar portions; a gate insulating layer formed to surround a side surface of the second semiconductor layer; and a second conductive layer formed to surround the gate insulating layer. An effective impurity concentration of the second semiconductor layer is less than or equal to an effective impurity concentration of the first semiconductor layer.

摘要翻译： 每个存储器串都具有第一半导体层，该第一半导体层具有相对于衬底沿垂直方向延伸的一对柱状部分; 形成为围绕所述柱状部的侧面的电荷存储层; 以及形成为围绕电荷存储层的第一导电层。 每个选择晶体管设置有从柱状部分的上表面向上延伸的第二半导体层; 形成为围绕所述第二半导体层的侧表面的栅极绝缘层; 以及形成为围绕所述栅极绝缘层的第二导电层。 第二半导体层的有效杂质浓度小于或等于第一半导体层的有效杂质浓度。

公开(公告)号：US20090230458A1

公开(公告)日：2009-09-17

申请号：US12392636

申请日：2009-02-25

申请人： Megumi ISHIDUKI ,  Hideaki Aochi ,  Ryota Katsumata ,  Hiroyasu Tanaka ,  Masaru Kidoh ,  Masaru Kito ,  Yoshiaki Fukuzumi ,  Yosuke Komori ,  Yasuyuki Matsuoka

发明人： Megumi ISHIDUKI ,  Hideaki Aochi ,  Ryota Katsumata ,  Hiroyasu Tanaka ,  Masaru Kidoh ,  Masaru Kito ,  Yoshiaki Fukuzumi ,  Yosuke Komori ,  Yasuyuki Matsuoka

IPC分类号： H01L29/792 ,  H01L21/28

CPC分类号： H01L29/792 ,  H01L27/11565 ,  H01L27/11578 ,  H01L27/11582 ,  H01L29/42324 ,  H01L29/4234 ,  H01L29/7881 ,  H01L29/7926

摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a columnar semiconductor layer extending in a direction perpendicular to a substrate; a plurality of conductive layers formed at a sidewall of the columnar semiconductor layer via memory layers; and interlayer insulation layers formed above of below the conductive layers. A sidewall of the conductive layers facing the columnar semiconductor layer is formed to be inclined such that the distance thereof from a central axis of the columnar semiconductor layer becomes larger at lower position thereof than at upper position thereof. While, a sidewall of the interlayer insulation layers facing the columnar semiconductor layer is formed to be inclined such that the distance thereof from a central axis of the columnar semiconductor layer becomes smaller at lower position thereof than at upper position thereof.

摘要翻译： 非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。 每个存储器串包括：在垂直于衬底的方向上延伸的柱状半导体层; 多个导电层，经由存储层形成在所述柱状半导体层的侧壁处; 以及形成在导电层下方的层间绝缘层。 形成面向柱状半导体层的导电层的侧壁，使得其与柱状半导体层的中心轴的距离在其下部位置比在其上部位置变大。 同时，面对柱状半导体层的层间绝缘层的侧壁形成为倾斜，使得其在柱状半导体层的中心轴线处的距离在其下部位置处比在其上部位置变小。

公开(公告)号：US20100117047A1

公开(公告)日：2010-05-13

申请号：US12562402

申请日：2009-09-18

申请人： Hiroyasu TANAKA ,  Masaru KIDOH ,  Ryota KATSUMATA ,  Masaru KITO ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI ,  Yoshiaki FUKUZUMI

发明人： Hiroyasu TANAKA ,  Masaru KIDOH ,  Ryota KATSUMATA ,  Masaru KITO ,  Yosuke KOMORI ,  Megumi ISHIDUKI ,  Hideaki AOCHI ,  Yoshiaki FUKUZUMI

IPC分类号： H01L45/00 ,  H01L21/18

CPC分类号： H01L27/115 ,  G11C13/003 ,  G11C2213/33 ,  G11C2213/34 ,  G11C2213/71 ,  G11C2213/72 ,  G11C2213/78 ,  H01L27/0203 ,  H01L27/101 ,  H01L27/1021 ,  H01L27/2409 ,  H01L27/2454 ,  H01L27/249 ,  H01L45/04 ,  H01L45/1226 ,  H01L45/145

摘要： A non-volatile semiconductor storage device includes a plurality of memory element groups, each of the memory element groups having a plurality of memory elements, each of the memory elements having a resistance-change element and a Schottky diode connected in series. Each of the memory element groups includes: a first columnar layer extending in a lamination direction; a first insulation layer formed on a side surface of the first columnar layer and functioning as the resistance-change element; and a first conductive layer formed to surround the first columnar layer via the first insulation layer. The first conductive layer is formed of metal. The first columnar layer is formed of a semiconductor having such a impurity concentration that the first conductive layer and the semiconductor configure the Schottky diode.

摘要翻译： 非挥发性半导体存储装置包括多个存储元件组，每个存储元件组具有多个存储元件，每个存储元件具有串联连接的电阻变化元件和肖特基二极管。 每个存储元件组包括：沿层叠方向延伸的第一柱状层; 第一绝缘层，形成在第一柱状层的侧表面上并用作电阻变化元件; 以及经由所述第一绝缘层包围所述第一柱状层的第一导电层。 第一导电层由金属形成。 第一柱状层由具有第一导电层和半导体构成肖特基二极管的杂质浓度的半导体形成。