Phase-change storage unit for replacing DRAM and FLASH and manufacturing method thereof
    5.
    发明授权
    Phase-change storage unit for replacing DRAM and FLASH and manufacturing method thereof 有权
    用于替换DRAM和闪存的相变存储单元及其制造方法

    公开(公告)号:US09362493B2

    公开(公告)日:2016-06-07

    申请号:US14129955

    申请日:2012-12-26

    IPC分类号: H01L45/00

    摘要: The present invention provides a phase-change storage unit for replacing DRAM and FLASH and a manufacturing method thereof, and the phase-change storage unit includes a phase-change material layer and a cylindrical lower electrode being in contact with and located below the phase-change material layer, where the phase-change material layer is formed by connecting a side wall layer and a round bottom layer, forms a hollow cylinder or hollow inverted conical frustum having an opening at an upper part, and the hollow cylinder or hollow inverted conical frustum is internally filled with a medium layer. The present invention adopts the means of preparing a phase-change material layer with a vertical side wall layer and a phase-change material layer with a slant side wall layer, in which a medium material is filled, and adopts the means of a small electrode, so as to reduce the thickness of the phase-change material layer, thereby reducing the phase-change region during the operation, improving the heat stability and the phase-change speed of the phase-change material layer, and finally achieving purposes of reducing the operating power consumption, improving the device data holding capability, increasing the operating speed of the device, and increasing the number of times of cyclic operating of the device.

    摘要翻译: 本发明提供一种用于替换DRAM和闪存的相变存储单元及其制造方法,并且相变存储单元包括相变材料层和与相位变换材料层相接触并位于其上的圆柱形下电极, 改变材料层,其中通过连接侧壁层和圆底层形成相变材料层,形成在上部具有开口的中空圆柱体或中空倒圆锥形截头锥体,并且中空圆柱体或中空倒圆锥形 锥体内部填充有中等层。 本发明采用制备具有垂直侧壁层的相变材料层和具有倾斜侧壁层的相变材料层的方法,其中填充介质材料,并且采用小电极的装置 ,以减小相变材料层的厚度,由此减少操作期间的相变区域,提高相变材料层的热稳定性和相变速度,最终达到减少相变材料层的目的 操作功耗,提高设备数据保持能力,提高设备运行速度,增加设备循环运行次数。

    Phase-Change Storage Unit Containing TiSiN Material Layer and Method for Preparing the Same
    6.
    发明申请
    Phase-Change Storage Unit Containing TiSiN Material Layer and Method for Preparing the Same 有权
    包含TiSiN材料层的相变储存单元及其制备方法

    公开(公告)号:US20150221863A1

    公开(公告)日:2015-08-06

    申请号:US14123454

    申请日:2012-12-27

    IPC分类号: H01L45/00

    摘要: The present invention provides a phase-change storage unit containing a TiSiN material layer and a method for preparing the same. The phase-change storage unit includes a phase-change material layer and a lower electrode located there below, the phase-change material layer and the lower electrode are connected by a TiSiN material layer, the lower electrode includes a bottom and a sheet side connected to the bottom, the sheet side is perpendicular to the bottom to form a blade structure, and the top of the sheet side contacts the TiSiN material layer. The present invention adopts annealing to increase the grain size of the electrode so as to reduce the overall resistance of the device and form a TiSiN material layer on the top of the lower electrode so as to reduce the effective operation region. The phase-change storage unit of the present invention is applied to a phase-change memory to achieve the advantages such as low power consumption, high density and high data retention performance.

    摘要翻译: 本发明提供一种含有TiSiN材料层的相变储存单元及其制备方法。 相变存储单元包括位于其下方的相变材料层和下电极,相变材料层和下电极通过TiSiN材料层连接,下电极包括底部和片侧连接 在底部,片侧垂直于底部以形成刀片结构,并且片侧的顶部接触TiSiN材料层。 本发明采用退火以增加电极的晶粒尺寸,从而降低器件的整体电阻,并在下电极的顶部形成TiSiN材料层,以减少有效的工作区域。 本发明的相变存储单元适用于相变存储器,以实现低功耗,高密度和高数据保存性能等优点。

    Read-out circuit and read-out method for three-dimensional memory

    公开(公告)号:US11568931B2

    公开(公告)日:2023-01-31

    申请号:US15739723

    申请日:2017-04-25

    IPC分类号: G11C11/00 G11C13/00

    摘要: A read-out circuit and a read-out method for a three-dimensional memory, comprises a read reference circuit and a sensitive amplifier, the read reference circuit produces read reference current capable of quickly distinguishing reading low-resistance state unit current and reading high-resistance state unit current. The read reference circuit comprises a reference unit, a bit line matching module, a word line matching module and a transmission gate parasitic parameter matching module. With respect to the parasitic effect and electric leakage of the three-dimensional memory in the plane and vertical directions, the present invention introduces the matching of bit line parasite parameters, leakage current and transmission gate parasitic parameters into the read reference current, and introduces the matching of parasitic parameters of current mirror into the read current, thereby eliminating the phenomenon of pseudo reading and reducing the read-out time.

    Phase-Change Storage Unit For Replacing DRAM And FLASH And Manufacturing Method Thereof
    10.
    发明申请
    Phase-Change Storage Unit For Replacing DRAM And FLASH And Manufacturing Method Thereof 有权
    相变存储单元,用于更换DRAM及其闪存及其制造方法

    公开(公告)号:US20150188041A1

    公开(公告)日:2015-07-02

    申请号:US14129955

    申请日:2012-12-26

    IPC分类号: H01L45/00

    摘要: The present invention provides a phase-change storage unit for replacing DRAM and FLASH and a manufacturing method thereof, and the phase-change storage unit includes a phase-change material layer and a cylindrical lower electrode being in contact with and located below the phase-change material layer, where the phase-change material layer is formed by connecting a side wall layer and a round bottom layer, forms a hollow cylinder or hollow inverted conical frustum having an opening at an upper part, and the hollow cylinder or hollow inverted conical frustum is internally filled with a medium layer. The present invention adopts the means of preparing a phase-change material layer with a vertical side wall layer and a phase-change material layer with a slant side wall layer, in which a medium material is filled, and adopts the means of a small electrode, so as to reduce the thickness of the phase-change material layer, thereby reducing the phase-change region during the operation, improving the heat stability and the phase-change speed of the phase-change material layer, and finally achieving purposes of reducing the operating power consumption, improving the device data holding capability, increasing the operating speed of the device, and increasing the number of times of cyclic operating of the device.

    摘要翻译: 本发明提供一种用于替换DRAM和闪存的相变存储单元及其制造方法,并且相变存储单元包括相变材料层和与相位变换材料层相接触并位于其上的圆柱形下电极, 改变材料层,其中通过连接侧壁层和圆底层形成相变材料层,形成在上部具有开口的中空圆柱体或中空倒圆锥形截头锥体,并且中空圆柱体或中空倒圆锥形 锥体内部填充有中等层。 本发明采用制备具有垂直侧壁层的相变材料层和具有倾斜侧壁层的相变材料层的方法,其中填充介质材料,并且采用小电极的装置 ,以减小相变材料层的厚度,由此减少操作期间的相变区域,提高相变材料层的热稳定性和相变速度,最终达到减少相变材料层的目的 操作功耗,提高设备数据保持能力,提高设备运行速度,增加设备循环运行次数。