Microelectromechanical device with signal routing through a protective cap

    公开(公告)号:US11274036B2

    公开(公告)日:2022-03-15

    申请号:US16815883

    申请日:2020-03-11

    IPC分类号: B81B7/00 B81B7/02 B81C1/00

    摘要: A microelectromechanical device includes: a body accommodating a microelectromechanical structure; and a cap bonded to the body and electrically coupled to the microelectromechanical structure through conductive bonding regions. The cap including a selection module, which has first selection terminals coupled to the microelectromechanical structure, second selection terminals, and at least one control terminal, and which can be controlled through the control terminal to couple the second selection terminals to respective first selection terminals according, selectively, to one of a plurality of coupling configurations corresponding to respective operating conditions.

    MEMS device formed by at least two bonded structural layers and manufacturing process thereof

    公开(公告)号:US10227233B2

    公开(公告)日:2019-03-12

    申请号:US15379091

    申请日:2016-12-14

    IPC分类号: B81C1/00 B81B3/00 B81C3/00

    摘要: A microelectromechanical device having a first substrate of semiconductor material and a second substrate of semiconductor material having a bonding recess delimited by projecting portions, monolithic therewith. The bonding recess forms a closed cavity with the first substrate. A bonding structure is arranged within the closed cavity and is bonded to the first and second substrates. A microelectromechanical structure is formed in a substrate chosen between the first and second substrates. The device is manufactured by forming the bonding recess in a first wafer; depositing a bonding mass in the bonding recess, the bonding mass having a greater depth than the bonding recess; and bonding the two wafers.

    Oscillator device and manufacturing process of the same
    4.
    发明授权
    Oscillator device and manufacturing process of the same 有权
    振荡器和制造工艺相同

    公开(公告)号:US08988155B2

    公开(公告)日:2015-03-24

    申请号:US13689430

    申请日:2012-11-29

    摘要: An oscillator device includes: a structural layer extending over a first side of a semiconductor substrate; a semiconductor cap set on the structural layer; a coupling region extending between and hermetically sealing the structural layer and the cap and forming a cavity within the oscillator device; first and second conductive paths extending between the substrate and the structural layer; first and second conductive pads housed in the cavity and electrically coupled to first terminal portions of the first and second conductive paths by first and second connection regions, respectively, which extend through and are insulated from the structural layer; a piezoelectric resonator having first and second ends electrically coupled, respectively, to the first and second conductive pads, and extending in the cavity; and third and fourth conductive pads positioned outside the cavity and electrically coupled to second terminal portions of the first and second conductive paths.

    摘要翻译: 振荡器装置包括:在半导体衬底的第一侧上延伸的结构层; 设置在结构层上的半导体盖; 耦合区域,其在所述结构层和所述盖之间延伸并且密封所述结构层和所述盖并在所述振荡器装置内形成空腔; 在基板和结构层之间延伸的第一和第二导电路径; 第一和第二导电焊盘,其容纳在所述空腔中,并且分别通过延伸穿过所述第一和第二导电路径并与所述结构层绝缘的第一和第二连接区域电连接到所述第一和第二导电路径的第一端子部分; 压电谐振器,其具有分别电耦合到第一和第二导电焊盘并且在空腔中延伸的第一和第二端; 以及第三和第四导电焊盘,其位于腔的外部并电耦合到第一和第二导电路径的第二端子部分。

    MEMS device formed by at least two bonded structural layers and manufacturing process thereof

    公开(公告)号:US10570009B2

    公开(公告)日:2020-02-25

    申请号:US16283254

    申请日:2019-02-22

    IPC分类号: B81C1/00 B81C3/00 B81B3/00

    摘要: A microelectromechanical device having a first substrate of semiconductor material and a second substrate of semiconductor material having a bonding recess delimited by projecting portions, monolithic therewith. The bonding recess forms a closed cavity with the first substrate. A bonding structure is arranged within the closed cavity and is bonded to the first and second substrates. A microelectromechanical structure is formed in a substrate chosen between the first and second substrates. The device is manufactured by forming the bonding recess in a first wafer; depositing a bonding mass in the bonding recess, the bonding mass having a greater depth than the bonding recess; and bonding the two wafers.