Process for manufacturing a micro-electro-mechanical device, and MEMS device

    公开(公告)号:US11945712B2

    公开(公告)日:2024-04-02

    申请号:US17320993

    申请日:2021-05-14

    IPC分类号: B81B3/00 B81C1/00

    摘要: A process for manufacturing a MEMS device includes forming a first structural layer of a first thickness on a substrate. First trenches are formed through the first structural layer, and masking regions separated by first openings are formed on the first structural layer. A second structural layer of a second thickness is formed on the first structural layer in direct contact with the first structural layer at the first openings and forms, together with the first structural layer, thick structural regions having a third thickness equal to the sum of the first and the second thicknesses. A plurality of second trenches are formed through the second structural layer, over the masking regions, and third trenches are formed through the first and the second structural layers by removing selective portions of the thick structural regions.

    Semiconductor device including a microelectromechanical structure and an associated integrated electronic circuit

    公开(公告)号:US10934158B2

    公开(公告)日:2021-03-02

    申请号:US16240415

    申请日:2019-01-04

    IPC分类号: B81B7/00 B81C1/00

    摘要: An integrated semiconductor device includes: a MEMS structure; an ASIC electronic circuit; and conductive interconnection structures electrically coupling the MEMS structure to the ASIC electronic circuit. The MEMS structure and the ASIC electronic circuit are integrated starting from a same substrate including semiconductor material; wherein the MEMS structure is formed at a first surface of the substrate, and the ASIC electronic circuit is formed at a second surface of the substrate, vertically opposite to the first surface in a direction transverse to a horizontal plane of extension of the first surface and of the second surface.

    Microelectromechanical device with signal routing through a protective cap

    公开(公告)号:US11274036B2

    公开(公告)日:2022-03-15

    申请号:US16815883

    申请日:2020-03-11

    IPC分类号: B81B7/00 B81B7/02 B81C1/00

    摘要: A microelectromechanical device includes: a body accommodating a microelectromechanical structure; and a cap bonded to the body and electrically coupled to the microelectromechanical structure through conductive bonding regions. The cap including a selection module, which has first selection terminals coupled to the microelectromechanical structure, second selection terminals, and at least one control terminal, and which can be controlled through the control terminal to couple the second selection terminals to respective first selection terminals according, selectively, to one of a plurality of coupling configurations corresponding to respective operating conditions.