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1.发明申请公开(公告)号：US20210036213A1
公开(公告)日：2021-02-04
申请号：US16942813
申请日：2020-07-30
IPC分类号： H01L41/187 , H01L41/27 , H01L41/08 , H01L41/314
摘要： There is provided a piezoelectric stack, including: a substrate; an electrode film; and a piezoelectric film which is comprised of alkali niobium oxide of a perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0
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2.发明公开公开(公告)号：US20240206342A1
公开(公告)日：2024-06-20
申请号：US17908899
申请日：2021-02-24
IPC分类号： H10N30/853 , C30B28/12 , C30B29/02 , C30B29/30 , C30B29/68 , H10N30/076
CPC分类号： H10N30/8542 , C30B28/12 , C30B29/02 , C30B29/30 , C30B29/68 , H10N30/076
摘要： There is provided a piezoelectric film, being a polycrystalline film comprised of potassium sodium niobate; containing at least one metal element selected from a group consisting of Cu and Mn; and having 1.0 or less ratio of a concentration B of the metal element at grain boundaries of crystals, with respect to a concentration A of the metal element in a matrix phase of the crystals.
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3.发明公开公开(公告)号：US20240099143A1
公开(公告)日：2024-03-21
申请号：US18264318
申请日：2022-01-12
IPC分类号： H10N30/03 , H10N30/00 , H10N30/063 , H10N30/076 , H10N30/077 , H10N30/87 , H10N30/88
CPC分类号： H10N30/03 , H10N30/063 , H10N30/076 , H10N30/077 , H10N30/1051 , H10N30/87 , H10N30/883
摘要： There is provided a piezoelectric stack including: a substrate (1); a bottom electrode film (2) on the substrate; a piezoelectric film (3) on the bottom electrode film, having a planar area smaller than a planar area of the bottom electrode film; a top electrode film (4) on the piezoelectric film; and an insulating film (5) provided from the top electrode film to the bottom electrode film and covering at least a part of a side surface of the piezoelectric film, wherein the insulating film has a slope (9a) filling a step between a top surface of the top electrode film and a top surface of the bottom electrode film, and the slope has a shape alleviating the step.
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4.发明公开公开(公告)号：US20230142065A1
公开(公告)日：2023-05-11
申请号：US17917055
申请日：2021-02-24
CPC分类号： B06B1/0622 , B06B1/0261
摘要： There is provided a piezoelectric stack, including: a substrate; an output-side bottom electrode film on the substrate; an output-side piezoelectric film, being an oxide film, on the output-side bottom electrode film; an output-side top electrode film on the output-side piezoelectric film; an input-side bottom electrode film on the substrate; an input-side piezoelectric film, being a nitride film, on the input-side bottom electrode film; an input-side top electrode film on the input-side piezoelectric film; and an ultrasonic output part and ultrasonic input part placed in such a manner as not overlapping each other when viewed from a top surface of the substrate, the ultrasonic output part comprising a stacked part of the output-side bottom electrode film, the output-side piezoelectric film, and the output-side top electrode film, the ultrasonic input part comprising a stacked part of the input-side bottom electrode film, the input-side piezoelectric film, and the input-side top electrode film.
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5.发明公开公开(公告)号：US20230270013A1
公开(公告)日：2023-08-24
申请号：US18012920
申请日：2021-03-16
IPC分类号： H10N30/853 , H10N30/00 , H10N30/076 , H10N30/079 , C01G9/03 , C01G33/00 , C23C14/08 , C23C14/16 , C23C14/35 , C23C14/02
CPC分类号： H10N30/8542 , H10N30/10516 , H10N30/076 , H10N30/079 , C01G9/03 , C01G33/006 , C23C14/086 , C23C14/165 , C23C14/35 , C23C14/025 , C23C14/083 , C01P2002/34 , C01P2002/50 , C01P2006/40
摘要： There is provided a piezoelectric stack, including: a substrate; an oxide film on the substrate, containing zinc and oxygen as main elements; an electrode film on the oxide film; and a piezoelectric film on the electrode film, being an alkali niobium oxide film containing potassium, sodium, niobium, and oxygen and having a perovskite structure.
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6.发明申请公开(公告)号：US20210036214A1
公开(公告)日：2021-02-04
申请号：US16942815
申请日：2020-07-30
IPC分类号： H01L41/187 , H01L41/332 , H01L41/27 , H01L41/08 , H01L41/314
摘要： There is provided a piezoelectric stack, including: a substrate; an electrode film; and a piezoelectric film which is comprised of alkali niobium oxide of a perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0
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公开(公告)号：US20180286646A1
公开(公告)日：2018-10-04
申请号：US15935605
申请日：2018-03-26
发明人： Toshiaki KURODA , Mikio TAKIGAWA
摘要： A sputtering target comprising a target material, wherein a sputtering face of the target material has a ramp provided to reduce a thickness of the target material at a position where erosion concentrates most intensively during sputtering.
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公开(公告)号：US20220254988A1
公开(公告)日：2022-08-11
申请号：US17624555
申请日：2020-07-02
IPC分类号： H01L41/187 , H01L41/316 , H01L41/08
摘要： A piezoelectric stack including: a substrate; an electrode film; and a piezoelectric film as a poly-crystal film comprising an alkali niobium oxide of a perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0
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公开(公告)号：US20210036212A1
公开(公告)日：2021-02-04
申请号：US16942808
申请日：2020-07-30
IPC分类号： H01L41/187 , H01L41/08 , H01L41/27 , H01L41/047
摘要： There is provided a piezoelectric laminate, including: a substrate; an electrode film formed on the substrate; a layer comprised of lanthanum nickel oxide and formed on the electrode film; and a piezoelectric film formed on the layer comprised of lanthanum nickel oxide, and comprised of alkali niobium oxide of a perovskite structure represented by a composition formula of (K1−xNax)NbO3 (0
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公开(公告)号：US20160343551A1
公开(公告)日：2016-11-24
申请号：US15112242
申请日：2015-01-20
发明人： Mikio TAKIGAWA , Toshiaki KURODA
摘要： Objects of the present invention consist in achievement of both of elongation of life of a sputtering target as well as uniformity of a thickness of a resulting thin coating layer formed on a substrate during the period. The present invention provides a sputtering target comprising a target material, which is characterized in that the target material has a sputtering surface having a first area placed at the center, which is circular and flat; and a second area placed outside of the first area and concentrically with the first area, which has a ring shape, wherein the first area is positioned at a location lower than that of the second area by 15% of thickness of the second area at most, and the first area has a diameter which is ranging from 60% to 80% of a circumferential diameter of the sputtering surface.
摘要翻译： 本发明的目的在于实现溅射靶的寿命延长和在此期间形成在基底上的所得薄涂层的厚度均匀性。 本发明提供一种包含目标材料的溅射靶，其特征在于，所述靶材料具有溅射表面，所述溅射表面具有放置在中心的第一区域，该第一区域是圆形且平坦的; 以及设置在所述第一区域的外部并与所述第一区域同心的第二区域，所述第一区域具有环形形状，其中所述第一区域位于比所述第二区域的位置低至少所述第二区域的厚度的15％ 第一区域的直径为溅射面的周向直径的60％〜80％。
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