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    Method of fabricating patterned substrate
    1.
    发明授权
    Method of fabricating patterned substrate 有权
    制作图案化基片的方法

    公开(公告)号：US08927310B2

    公开(公告)日：2015-01-06

    申请号：US14048772

    申请日：2013-10-08

    申请人： Samsung Corning Precision Materials Co., Ltd.

    发明人： Jeong Woo Park ,  Yoon Young Kwon ,  Kyungwook Park ,  Young Zo Yoo

    IPC分类号： H01L21/302 ,  H01L21/461 ,  H01L51/00 ,  H01L51/44 ,  H01L51/52

    CPC分类号： H01L21/302 ,  H01L51/0017 ,  H01L51/0023 ,  H01L51/0096 ,  H01L51/447 ,  H01L51/5268 ,  Y02E10/549

    摘要： A method of fabricating a patterned substrate, with which the optical performance of a photovoltaic cell including an organic solar cell and an organic light-emitting diode (OLED) can be improved. The method includes generating electrostatic force on a surface of a substrate by treating the substrate with electrolytes, causing nano-particles to be adsorbed on the surface of the substrate, etching the surface of the substrate using the nano-particles as an etching mask, and removing the nano-particles residing on the surface of the substrate.

    摘要翻译： 可以提高制造图案化衬底的方法，通过该方法可以改善包括有机太阳能电池和有机发光二极管（OLED）的光伏电池的光学性能。 该方法包括通过用电解质处理衬底来在衬底的表面上产生静电力，使得纳米颗粒被吸附在衬底的表面上，使用纳米颗粒作为蚀刻掩模蚀刻衬底的表面，以及 去除驻留在基底表面上的纳米颗粒。

    Substrate For OLED And Method Of Manufacturing The Same
    2.
    发明申请
    Substrate For OLED And Method Of Manufacturing The Same 审中-公开
    OLED基板及其制造方法

    公开(公告)号：US20130341605A1

    公开(公告)日：2013-12-26

    申请号：US13921294

    申请日：2013-06-19

    申请人： Samsung Corning Precision Materials Co., Ltd.

    发明人： Young Zo Yoo ,  June Hyoung Park ,  Seo Hyun Kim ,  Jeong Woo Park ,  Joo Young Lee

    IPC分类号： H01L51/52 ,  H01L51/56

    CPC分类号： H01L51/52 ,  H01L51/5268 ,  H01L51/56

    摘要： A substrate for an organic light-emitting device (OLED) and a method of manufacturing the same, in which the light extraction efficiency and process efficiency of the OLED can be improved. The substrate for an OLED that includes a base substrate, a first metal oxide thin film coating one surface of the base substrate, the first metal oxide thin film having a first texture on a surface thereof, a second metal oxide thin film coating the other surface of the base substrate, and a third metal oxide thin film coating a surface of the second metal oxide thin film.

    摘要翻译： 用于有机发光器件（OLED）的衬底及其制造方法，其中可提高OLED的光提取效率和工艺效率。 一种OLED基板，包括基底基板，涂覆基底基板的一个表面的第一金属氧化物薄膜，其表面上具有第一纹理的第一金属氧化物薄膜，涂覆另一表面的第二金属氧化物薄膜 以及涂覆在第二金属氧化物薄膜的表面上的第三金属氧化物薄膜。

    METHOD OF FABRICATING ZINC OXIDE THIN FILM
    5.
    发明申请
    METHOD OF FABRICATING ZINC OXIDE THIN FILM 审中-公开
    氧化锌薄膜的制备方法

    公开(公告)号：US20140144770A1

    公开(公告)日：2014-05-29

    申请号：US14089080

    申请日：2013-11-25

    申请人： SAMSUNG CORNING PRECISION MATERIALS CO., LTD.

    发明人： Gun Sang Yoon ,  Seo Hyun Kim ,  Hyunhee Lee ,  Young Zo Yoo

    IPC分类号： C23C14/00

    CPC分类号： C23C14/0036 ,  C23C16/407 ,  C23C16/44

    摘要： A method of fabricating a zinc oxide (ZnO) thin film in which the surface shape of the ZnO thin film can be controlled during deposition of the ZnO thin film. The method includes depositing the ZnO thin film on a substrate by chemical vapor deposition (CVD). The CVD feeds an etching gas that etches the ZnO thin film concurrently with a source gas and an oxidizer gas, thereby controlling the surface shape of the ZnO thin film that is being deposited.

    摘要翻译： 一种制造氧化锌（ZnO）薄膜的方法，其中可以在ZnO薄膜沉积期间控制ZnO薄膜的表面形状。 该方法包括通过化学气相沉积（CVD）将ZnO薄膜沉积在衬底上。 CVD将蚀刻气体与源气体和氧化剂气体同时蚀刻ZnO薄膜，从而控制正在沉积的ZnO薄膜的表面形状。

    Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same
    7.
    发明授权
    Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same 有权
    含有烷基锌卤化物的氧化锌前体和使用其的沉积氧化锌基薄膜的方法

    公开(公告)号：US08858694B2

    公开(公告)日：2014-10-14

    申请号：US13681108

    申请日：2012-11-19

    申请人： Samsung Corning Precision Materials Co., Ltd.

    发明人： Sooho Park ,  Seohyun Kim ,  Jeongwoo Park ,  Taejung Park ,  Young Zo Yoo ,  GunSang Yoon ,  Eun-Ho Choi ,  Myong Woon Kim ,  Bogyeong Kim ,  Hyung Soo Shin ,  Seung Ho Yoo ,  Sang Do Lee ,  Sang Ick Lee ,  Sang Jun Yim

    IPC分类号： C07F3/06 ,  C03C17/27 ,  C23C16/00 ,  C23C16/40 ,  C23C16/08

    CPC分类号： C07F3/06 ,  C23C16/08 ,  C23C16/407

    摘要： A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains an alkyl zinc halide having the following formula: R—Zn—X, where R is an alkyl group CnH2n+1, and X is a halogen group. The n is a number ranging from 1 to 4, and the alkyl group is one selected from among a methyl group, an ethyl group, an i-propyl group and a t-butyl group. The halogen group contains one selected from among F, Br, Cl and I. A method of depositing a zinc oxide-based thin film includes loading a substrate into a deposition chamber; and supplying the zinc oxide precursor which contains the above-described alkyl zinc halide and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. The zinc oxide-based thin film is deposited on the substrate via atmospheric pressure chemical vapor deposition.

    摘要翻译： 用于沉积氧化锌基薄膜的氧化锌前体包含具有下式的烷基卤化锌：R-Zn-X，其中R是烷基C n H 2n + 1，X是卤素基团。 n为1〜4的数，烷基为甲基，乙基，异丙基，叔丁基等。 卤素基团包含选自F，Br，Cl和I中的一种。沉积氧化锌基薄膜的方法包括将衬底加载到沉积室中; 并将含有上述烷基卤化锌和氧化剂的氧化锌前体供给到沉积室中，并通过化学气相沉积在衬底上形成氧化锌基薄膜。 氧化锌基薄膜通过大气压化学气相沉积沉积在基板上。

    Light Extraction Substrate For OLED And Method Of Fabricating The Same
    8.
    发明申请
    Light Extraction Substrate For OLED And Method Of Fabricating The Same 有权
    用于OLED的光提取衬底及其制造方法

    公开(公告)号：US20130330505A1

    公开(公告)日：2013-12-12

    申请号：US13914916

    申请日：2013-06-11

    申请人： Samsung Corning Precision Materials Co., Ltd.

    发明人： June Hyoung Park ,  Young Zo Yoo ,  Tae Jung Park ,  Seo Hyun Kim ,  Il Hee Baek ,  Gun Sang Yoon ,  Eun Ho Choi

    IPC分类号： H01L51/52

    CPC分类号： H01L51/5268 ,  B32B3/30 ,  B32B5/145 ,  B32B7/005 ,  Y10T428/24273 ,  Y10T428/24355 ,  Y10T428/24521 ,  Y10T428/24545 ,  Y10T428/24595 ,  Y10T428/24612 ,  Y10T428/2462

    摘要： A light extraction substrate for an organic light-emitting device (OLED) which can improve the brightness of a display or an illumination system to which an OLED is applied by improving light extraction efficiency and a method of manufacturing the same. The light extraction substrate for an OLED includes an oxide or nitride thin film formed on a substrate body. The oxide or nitride thin film includes a base layer formed on the substrate body, a first texture formed on the base layer, the first texture having a plurality of first protrusions which protrude continuously or discontinuously from the base layer, and a second texture having a plurality of second protrusions which protrude continuously or discontinuously from each outer surface of the first protrusions.

    摘要翻译： 一种用于有机发光器件（OLED）的光提取衬底，其可以通过提高光提取效率来提高应用OLED的显示器或照明系统的亮度及其制造方法。 用于OLED的光提取基板包括形成在基板主体上的氧化物或氮化物薄膜。 氧化物或氮化物薄膜包括在基体上形成的基底层，形成在基底层上的第一纹理，第一纹理具有从基底层连续地或不连续突出的多个第一突起，以及具有 从第一突起的每个外表面连续地或不连续突出的多个第二突起。