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公开(公告)号：US10214808B2
公开(公告)日：2019-02-26
申请号：US15492941
申请日：2017-04-20
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myung-Soo Huh , Suk-Won Jung , Jeong-Ho Yi , Sang-Hyuk Hong , Yong-Suk Lee
IPC: H01L27/00 , C23C16/04 , C23C16/458 , H01L21/68 , H01L27/32 , H01L21/687 , C23C16/44 , C23C16/50 , C23C16/52 , H01L51/00 , H01L51/56
Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.
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公开(公告)号：US20140179041A1
公开(公告)日：2014-06-26
申请号：US13973954
申请日：2013-08-22
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Jeong-Ho Yi , Yong-Suk Lee
IPC: H01L33/52
CPC classification number: H01L33/52 , B05D1/60 , B05D1/62 , H01L21/67207 , H01L51/5253 , H01L51/5256 , H01L51/56
Abstract: An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.
Abstract translation: 一种用于制造薄膜封装的装置和方法包括：第一簇，其被配置为使用溅射工艺在显示基板上形成第一无机层; 第二簇，其被配置为使用单体沉积工艺在所述显示基板上的所述第一无机层上形成第一有机层; 以及第三簇，其被配置为使用化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在所述显示衬底上的所述第一有机层上形成第二无机层。
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公开(公告)号：US20150144062A1
公开(公告)日：2015-05-28
申请号：US14590491
申请日：2015-01-06
Applicant: Samsung Display Co., Ltd.
Inventor： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
IPC: C23C16/46 , C23C16/458 , C23C16/455
CPC classification number: C23C16/46 , C23C16/45551 , C23C16/45563 , C23C16/4583
Abstract: A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.
Abstract translation: 蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置 相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。
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公开(公告)号：US20140161966A1
公开(公告)日：2014-06-12
申请号：US14010769
申请日：2013-08-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Yong-Suk Lee , Myung-Soo Huh , Suk-Won Jung , Jeong-Ho Yi , Mi-Ra An
IPC: C23C16/52
CPC classification number: C23C14/543 , B05D1/60 , C23C14/12 , C23C14/246 , C23C14/544 , C23C16/4481
Abstract: A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.
Abstract translation: 公开了一种单体蒸发装置及其控制方法。 单体蒸发装置包括：第一蒸发器和第二蒸发器，其分别接收吹扫气体并蒸发第一单体和第二单体; 第一流管和第二流管，其连接到相应的蒸发器并允许由各蒸发器蒸发的第一单体和第二单体流过其中; 过渡管，其连接到所述第一流管和所述第二流管，并且将至少一个所述第一单体和所述第二单体供应到沉积室; 以及调节单体流入沉积室的控制阀装置。 该装置有助于将单体平滑且不间断地应用于沉积室的内部。
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公开(公告)号：US09673265B2
公开(公告)日：2017-06-06
申请号：US14020849
申请日：2013-09-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myung-Soo Huh , Suk-Won Jung , Jeong-Ho Yi , Sang-Hyuk Hong , Yong-Suk Lee
IPC: H01L21/68 , H01L27/32 , C23C16/04 , C23C16/458 , H01L21/687
CPC classification number: C23C16/042 , C23C16/4405 , C23C16/4585 , C23C16/50 , C23C16/52 , H01L21/681 , H01L21/682 , H01L21/68735 , H01L21/68742 , H01L27/3244 , H01L51/0012 , H01L51/56
Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.
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Patent Agency Ranking
公开(公告)号：US09153795B2
公开(公告)日：2015-10-06
申请号：US14298795
申请日：2014-06-06
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myung-Soo Huh , Tae-Seung Yoon , Jeong-Ho Yi
CPC classification number: C23C14/34 , C23C14/541 , C23C14/568 , C23C16/042 , C23C16/463 , C23C16/54 , H01L51/001 , H01L51/5253 , H01L51/56
Abstract: A thin film encapsulation manufacturing apparatus includes a first cluster configured to form a first inorganic layer on a first substrate, on which an emission unit is formed, by a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the first substrate conveyed from the first cluster by an organic deposition process; a first connection module configured to connect the first cluster and the second cluster, configured to convey the first substrate on which the first inorganic layer is formed from the first cluster to the second cluster, and configured to cool the first substrate in a non-contact manner; and a third cluster configured to form a second inorganic layer on the first organic layer on the first substrate conveyed from the second cluster by a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.
Abstract translation: 一种薄膜封装制造装置，包括：第一簇，被配置为通过溅射工艺在其上形成发光单元的第一基板上形成第一无机层; 第二簇，被配置为通过有机沉积工艺从所述第一簇输送的所述第一基板上的所述第一无机层上形成第一有机层; 第一连接模块，被配置为连接所述第一集群和所述第二集群，所述第一连接模块被配置为将其上形成有所述第一无机层的所述第一基板从所述第一集群传送到所述第二集群，并且被配置为以非接触方式冷却所述第一衬底 方式; 以及第三簇，其被配置为通过化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在由第二簇传送的第一有机层上的第一有机层上形成第二无机层。
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7.发明申请DEPOSITION SOURCE, DEPOSITION APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 审中-公开沉积源，沉积装置和制造有机发光显示装置的方法公开(公告)号：US20150267290A1
公开(公告)日：2015-09-24
申请号：US14727168
申请日：2015-06-01
Applicant: Samsung Display Co., Ltd.
Inventor： Tae-Wook Kang , Jeong-Ho Yi
CPC classification number: C23C14/58 , B05D1/60 , B05D3/067 , C23C14/12 , C23C14/243
Abstract: A deposition source for depositing a deposition material on a substrate, the deposition source including: a nozzle disposed to face the substrate and discharge the deposition material toward the substrate; and a hardening portion disposed to at least one side of the nozzle for immediately hardening the deposition material discharged via the nozzle when the deposition material reaches the substrate. The deposition source being part of a deposition apparatus for manufacturing an organic light-emitting display having improved characteristics of a deposited film and encapsulation characteristics.
Abstract translation: 一种用于在基板上沉积沉积材料的沉积源，所述沉积源包括：设置成面对所述衬底并将所述沉积材料排向所述衬底的喷嘴; 以及设置在所述喷嘴的至少一侧的硬化部，用于当所述沉积材料到达所述基板时立即硬化经由所述喷嘴排出的沉积材料。 沉积源是用于制造具有改进的沉积膜特性和封装特性的有机发光显示器的沉积设备的一部分。
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公开(公告)号：US20140302626A1
公开(公告)日：2014-10-09
申请号：US13964020
申请日：2013-08-09
Applicant: Samsung Display Co., Ltd.
Inventor： Cheol-Rae Jo , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jeong-Ho Yi
IPC: H01L51/56
CPC classification number: H01L51/0011 , H01L2251/566
Abstract: Provided are a method of manufacturing a display that may reduce deposition nonuniformity while concurrently manufacturing a plurality of displays, and a deposition apparatus that may be used in the method, wherein the method includes: preparing a mother substrate having a plurality of regions in a matrix pattern, the mother substrate being for forming a plurality of display units corresponding to the plurality of regions; inserting the mother substrate into a deposition chamber, wherein a deposition source is in the deposition chamber; depositing a material on the mother substrate by using a mask including a plurality of parallel stripe-shaped masking sheets extending in a first direction; and cutting the mother substrate along a periphery of each of the plurality of display units to obtain the plurality of displays.
Abstract translation: 提供一种制造可以减少沉积不均匀性同时制造多个显示器的显示器的方法，以及可用于该方法的沉积设备，其中该方法包括：制备具有矩阵中多个区域的母基板 所述母体衬底用于形成对应于所述多个区域的多个显示单元; 将母基板插入沉积室，其中沉积源在沉积室中; 通过使用包括沿第一方向延伸的多个平行的条状掩模片的掩模将材料沉积在母体衬底上; 以及沿着所述多个显示单元中的每一个的周边切割所述母体基板以获得所述多个显示器。
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公开(公告)号：US10266941B2
公开(公告)日：2019-04-23
申请号：US15261629
申请日：2016-09-09
Applicant: Samsung Display Co., Ltd.
Inventor： Yong-Suk Lee , Myung-Soo Huh , Suk-Won Jung , Jeong-Ho Yi , Mi-Ra An
Abstract: A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.
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10.发明申请公开(公告)号：US20180305809A1
公开(公告)日：2018-10-25
申请号：US16024626
申请日：2018-06-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Sun-Ho Kim , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Hyun-Woo Joo , Yong-Suk Lee
CPC classification number: C23C14/564 , C23C14/24 , C23C16/4412 , H01L21/56 , H01L51/0008
Abstract: A deposition apparatus configured to perform a deposition process on a substrate, the deposition apparatus including a chamber having an exhaust opening in a surface, a deposition source in the chamber configured to eject one or more deposition materials toward the substrate, a cooling plate corresponding to an inner surface of the chamber, at which the exhaust opening is formed, a refrigerator contacting the cooling plate, and a pump coupled to the exhaust opening.
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