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1.发明授权公开(公告)号：US09318535B2
公开(公告)日：2016-04-19
申请号：US13944847
申请日：2013-07-17
Applicant: Samsung Display Co., Ltd.
Inventor： Suk-Won Jung , Myung-Soo Huh , Choel-Min Jang
IPC: H01L27/32 , C23C16/455 , H01J37/32 , C23C16/44 , C23C16/452 , C23C16/50 , H05H1/24 , H01L51/56
CPC classification number: H01J37/32467 , C23C16/4401 , C23C16/452 , C23C16/45542 , C23C16/45551 , C23C16/50 , H01J37/32357 , H01J37/3244 , H01J37/32513 , H01J37/32541 , H01J37/32834 , H01L27/32 , H01L51/56 , H05H1/2406 , H05H2001/2418 , H05H2001/2431
Abstract: Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.
Abstract translation: 提供了一种蒸镀装置，其特征在于，包括：等离子体发生器，被配置为将第一原料气体的至少一部分变为自由基形式; 对应于等离子体发生器的对应表面; 等离子体发生器和相应表面之间的反应空间; 以及与等离子体发生器分离并围绕等离子体发生器的绝缘构件。
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公开(公告)号：US09057125B2
公开(公告)日：2015-06-16
申请号：US13710310
申请日：2012-12-10
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choel-Min Jang , Myung-Soo Huh , Suk-Won Jung , Sung-Yong Lee , Cheol-Rae Jo , In-Kyo Kim , Sung-Hun Key
IPC: B01F3/04 , C23C16/00 , C23C16/448
CPC classification number: C23C16/00 , B01F3/04 , C23C16/4481 , C23C16/4482
Abstract: A canister includes an accommodation portion for accommodating a liquid material; an outlet pipe that is connected to the accommodation portion so as to discharge a gas material obtained by vaporizing the liquid material; a blocking cover that is connected to an upper surface of the accommodation portion; and a plurality of baffle plates that are disposed in the accommodation portion and are spaced apart from each other. The canister further includes a restrictor including a main body member that is disposed between the plurality of baffle plates and the blocking cover and is connected to an internal surface of the accommodation portion, an extension member extending from the main body member, and a through portion that is formed through the main body member and the extension member. A deposition procedure using the canister is efficiently performed and characteristics of a deposition layer are easily improved.
Abstract translation: 罐包括用于容纳液体材料的容纳部分; 出口管，其连接到容纳部分，以排出通过汽化液体材料获得的气体材料; 阻挡盖，其连接到所述容纳部的上表面; 以及设置在容纳部分中并彼此间隔开的多个挡板。 所述罐还包括限制器，所述限制器包括主体部件，所述主体部件设置在所述多个挡板和所述阻挡盖之间，并且连接到所述容纳部的内表面，从所述主体部件延伸的延伸部件， 其通过主体构件和延伸构件形成。 可以有效地进行使用罐的沉积工序，容易地提高沉积层的特性。
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公开(公告)号：US20150027371A1
公开(公告)日：2015-01-29
申请号：US14161984
申请日：2014-01-23
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC: C23C16/455
CPC classification number: C23C16/45574 , C23C16/45536 , C23C16/45551
Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.
Abstract translation: 一种用于在基板上提供沉积膜的气相沉积设备，所述气相沉积设备包括多个第一喷嘴部分，其向所述基板注入第一原料; 多个第二喷嘴部，与所述多个第一喷嘴部交替地配置，向所述基板喷射第二原料; 扩散器单元，其将所述第二原料分配到所述多个第二喷嘴部分; 以及将第二原料供给到扩散器单元的供给单元。
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4.发明申请公开(公告)号：US20140235003A1
公开(公告)日：2014-08-21
申请号：US13944847
申请日：2013-07-17
Applicant: Samsung Display Co., Ltd.
Inventor： Suk-Won Jung , Myung-Soo Huh , Choel-Min Jang
CPC classification number: H01J37/32467 , C23C16/4401 , C23C16/452 , C23C16/45542 , C23C16/45551 , C23C16/50 , H01J37/32357 , H01J37/3244 , H01J37/32513 , H01J37/32541 , H01J37/32834 , H01L27/32 , H01L51/56 , H05H1/2406 , H05H2001/2418 , H05H2001/2431
Abstract: Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.
Abstract translation: 提供了一种蒸镀装置，其特征在于，包括：等离子体发生器，被配置为将第一原料气体的至少一部分变为自由基形式; 对应于等离子体发生器的对应表面; 等离子体发生器和相应表面之间的反应空间; 以及与等离子体发生器分离并围绕等离子体发生器的绝缘构件。
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公开(公告)号：US20190169747A1
公开(公告)日：2019-06-06
申请号：US16271189
申请日：2019-02-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC: C23C16/455
Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.
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Patent Agency Ranking
6.发明申请VAPOR DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS BY USING THE SAME 审中-公开蒸气沉积装置，沉积方法及使用其制造有机发光显示装置的方法公开(公告)号：US20160203954A1
公开(公告)日：2016-07-14
申请号：US15076488
申请日：2016-03-21
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Suk-Won Jung , Myung-Soo Huh , Choel-Min Jang
IPC: H01J37/32
CPC classification number: H01L27/32 , C23C16/4401 , C23C16/452 , C23C16/45542 , C23C16/45551 , C23C16/50 , H01J37/32357 , H01J37/3244 , H01J37/32467 , H01J37/32513 , H01J37/32541 , H01J37/32834 , H01L51/56 , H05H1/2406 , H05H2001/2418 , H05H2001/2431
Abstract: Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.
Abstract translation: 提供了一种蒸镀装置，其特征在于，包括：等离子体发生器，被配置为将第一原料气体的至少一部分变为自由基形式; 对应于等离子体发生器的对应表面; 等离子体发生器和相应表面之间的反应空间; 以及与等离子体发生器分离并围绕等离子体发生器的绝缘构件。
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7.发明授权公开(公告)号：US10038169B2
公开(公告)日：2018-07-31
申请号：US14020848
申请日：2013-09-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Myung-Soo Huh , Suk-Won Jung , Jin-Kwang Kim , In-Kyo Kim , Choel-Min Jang
IPC: H01J37/00 , H01L51/56 , C23C16/452 , H01J37/32
CPC classification number: H01L51/56 , C23C16/452 , H01J37/32357
Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.
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8.发明授权公开(公告)号：US09142415B2
公开(公告)日：2015-09-22
申请号：US14269175
申请日：2014-05-04
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Suk-Won Jung , Sung-Chul Kim , Sang-Hyuk Hong , Choel-Min Jang
IPC: H01L21/285 , H01L21/02 , H01L51/56 , H01L51/00
CPC classification number: H01L21/28506 , C23C16/452 , C23C16/45565 , C23C16/45578 , C23C16/458 , C23C16/509 , H01J37/32357 , H01J37/3244 , H01L21/02274 , H01L51/001 , H01L51/56
Abstract: A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.
Abstract translation: 用于在基板上进行沉积处理的沉积装置包括：注入单元，其包括等离子体产生元件，该等离子体产生元件接纳原料气体，并将原料气体以基本形式转化为沉积源材料; 以及等离子体处理器，其与所述注入单元相邻并且面向所述注入单元的一侧，其中所述等离子体处理器在面向所述基板的方向上执行等离子体处理。
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公开(公告)号：US20150144062A1
公开(公告)日：2015-05-28
申请号：US14590491
申请日：2015-01-06
Applicant: Samsung Display Co., Ltd.
Inventor： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
IPC: C23C16/46 , C23C16/458 , C23C16/455
CPC classification number: C23C16/46 , C23C16/45551 , C23C16/45563 , C23C16/4583
Abstract: A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.
Abstract translation: 蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置 相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。
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10.发明申请VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS 有权蒸气沉积装置，蒸气沉积方法及制造有机发光显示装置的方法公开(公告)号：US20150072453A1
公开(公告)日：2015-03-12
申请号：US14177180
申请日：2014-02-10
Applicant: Samsung Display Co., Ltd.
Inventor： Choel-Min Jang , Sung-Hun Key , In-Kyo Kim , Suk-Won Jung , Myung-Soo Huh
CPC classification number: C23C16/45551
Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.
Abstract translation: 一种用于在衬底上沉积薄膜的气相沉积设备包括：供给单元，包括多个线性供应构件，其被构造成供应至少一种气体; 以及喷嘴单元，其包括连接到所述多个供应构件并被配置为朝向所述基板供应所述至少一种气体的多个喷嘴构件，其中所述多个喷嘴构件中的两个相邻的喷嘴构件连接到至少一个共同的供应构件 的多个供应构件。
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