Abstract:
The present disclosure relates to an internal pressure control apparatus capable of uniformly processing an upper surface of a semiconductor substrate and a substrate processing apparatus including the same. The substrate processing apparatus comprising a chamber housing including an exhaust hole for exhausting a process gas flowing thereinto, a substrate support unit inside the chamber housing, supporting a semiconductor substrate, a process gas supply unit providing the process gas to the inside of the chamber housing, a plasma generating unit generating plasma inside the chamber housing by using the process gas, and a ring body installed around the substrate support unit and provided as one body, and further comprising an internal pressure control apparatus controlling an internal pressure of the chamber housing, wherein the internal pressure control apparatus controls a posture of the ring body to control an exhaust amount of the process gas flowing into the chamber housing.
Abstract:
To operate a memory device including a plurality of NAND strings, an unselected NAND string among a plurality of NAND strings is floated when a voltage of a selected word line is increased such that a channel voltage of the unselected NAND string is boosted. The channel voltage of the unselected NAND string may be discharged when the voltage of the selected word line is decreased. The load when the voltage of the selected word line increases may be reduced by floating the unselected NAND string to boost the channel voltage of the unselected NAND string together with the increase of the voltage of the selected word line. The load when the voltage of the selected word line is decreased may be reduced by discharging the boosted channel voltage of the unselected NAND string when the voltage of the selected word line is decreased. Through such reduction of the load of the selected word line, a voltage setup time may be reduced and an operation speed of the memory device may be enhanced.
Abstract:
A plasma confinement ring includes a lower ring, an upper ring on the lower ring, and a connection ring extended to connect the lower ring to the upper ring. The lower ring includes a lower center hole vertically penetrating the lower ring at a center of the lower ring and at least one slit penetrating the lower ring in a region outside the lower center hole. The slit is structured to pass a more amount of air or gas at a first portion closer to the center of the lower ring than at a second portion farther from the center of the lower ring.
Abstract:
A position adjusting unit according to some example embodiments includes a base; a mounting part, a driving unit, and a locking part on the base. The mounting part may be movably installed on the base and configured to have an optical element mounted thereto. The driving unit may include a plurality of actuators connected between the base and the mounting part. The driving unit may be configured to move the mounting part with respect to the base. The locking part may be configured to provide a fixing force for fixing a position of the mounting part. The locking part may be configured to release the fixing force when electricity is supplied to the locking part.
Abstract:
A method of providing information according to a gait posture and an electronic device for the same are provided. The method includes collecting sensor values detected using a plurality of sensors located at the surrounding of a user's feet, determining a user's gait posture by using the detected sensor values, and outputting at least one of information on the user's gait posture, information on muscle fatigue of the user according to the gait, information on joint fatigue of the user according to the gait, and information on a recommended exercise for the user based on the determined user's gait posture.