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公开(公告)号:US11271038B2
公开(公告)日:2022-03-08
申请号:US17027980
申请日:2020-09-22
Applicant: Samsung Electronics Co., Ltd.
Inventor: Myoungsu Son , Seung Pil Ko , Jung Hyuk Lee , Shinhee Han , Gwan-Hyeob Koh , Yoonjong Song
IPC: H01L27/22 , H01L43/02 , H01L43/12 , H01L43/08 , H01L23/522
Abstract: A semiconductor device includes a gate structure on a substrate, source and drain contacts respectively on opposite sides of the gate structure and connected to the substrate, a magnetic tunnel junction connected to the drain contact, a first conductive line connected to the source contact, and a second conductive line connected to the first conductive line through a first via contact. The second conductive line is distal to the substrate in relation to the first conductive line. The first and second conductive lines extend in parallel along a first direction. The first and second conductive lines have widths in a second direction intersecting the first direction. The widths of the first and second conductive lines are the same. The first via contact is aligned with the source contact along a third direction perpendicular to a top surface of the substrate.
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公开(公告)号:US12035540B2
公开(公告)日:2024-07-09
申请号:US17380081
申请日:2021-07-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Boyoung Seo , Kangho Lee , Yoonjong Song , Junghyuk Lee
Abstract: A magnetic memory device includes a plurality of first bit lines and a plurality of second bit lines, a plurality of first source lines respectively corresponding to the plurality of first bit lines and a plurality of second source lines respectively corresponding to the plurality of second bit lines, a plurality of first memory cells connected between the plurality of first bit lines and the plurality of first source lines, respectively, in a first region, the plurality of first memory cells respectively including a first memory device and a first selection transistor, and a plurality of second memory cells connected between the plurality of second bit lines and the plurality of second source lines, respectively, in a second region, the plurality of second memory cells respectively including a second memory device and a second selection transistor.
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公开(公告)号:US20220028928A1
公开(公告)日:2022-01-27
申请号:US17380081
申请日:2021-07-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Boyoung Seo , Kangho Lee , Yoonjong Song , Junghyuk Lee
IPC: H01L27/22 , H01L27/112
Abstract: A magnetic memory device includes a plurality of first bit lines and a plurality of second bit lines, a plurality of first source lines respectively corresponding to the plurality of first bit lines and a plurality of second source lines respectively corresponding to the plurality of second bit lines, a plurality of first memory cells connected between the plurality of first bit lines and the plurality of first source lines, respectively, in a first region, the plurality of first memory cells respectively including a first memory device and a first selection transistor, and a plurality of second memory cells connected between the plurality of second bit lines and the plurality of second source lines, respectively, in a second region, the plurality of second memory cells respectively including a second memory device and a second selection transistor.
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公开(公告)号:US10897006B2
公开(公告)日:2021-01-19
申请号:US16286718
申请日:2019-02-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kilho Lee , Gwanhyeob Koh , Yongjae Kim , Yoonjong Song
Abstract: A magnetic memory device including a substrate including a cell region and a peripheral circuit region; a first interlayer insulating layer covering the cell region and the peripheral circuit region of the substrate; interconnection lines in the first interlayer insulating layer; a peripheral conductive line and a peripheral conductive contact on the first interlayer insulating layer on the peripheral circuit region, the peripheral conductive contact being between the peripheral conductive line and a corresponding one of the interconnection lines; a bottom electrode contact on the first interlayer insulating layer on the cell region and connected to a corresponding one of the interconnection lines; and a data storage pattern on the bottom electrode contact, wherein the peripheral conductive line is at a height between a top surface of the bottom electrode contact and a bottom surface of the bottom electrode contact.
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公开(公告)号:US10818727B2
公开(公告)日:2020-10-27
申请号:US16161370
申请日:2018-10-16
Applicant: Samsung Electronics Co., Ltd.
Inventor: Myoungsu Son , Seung Pil Ko , Jung Hyuk Lee , Shinhee Han , Gwan-Hyeob Koh , Yoonjong Song
IPC: H01L27/22 , H01L43/02 , H01L43/12 , H01L43/08 , H01L23/522
Abstract: A semiconductor device includes a gate structure on a substrate, source and drain contacts respectively on opposite sides of the gate structure and connected to the substrate, a magnetic tunnel junction connected to the drain contact, a first conductive line connected to the source contact, and a second conductive line connected to the first conductive line through a first via contact. The second conductive line is distal to the substrate in relation to the first conductive line. The first and second conductive lines extend in parallel along a first direction. The first and second conductive lines have widths in a second direction intersecting the first direction. The widths of the first and second conductive lines are the same. The first via contact is aligned with the source contact along a third direction perpendicular to a top surface of the substrate.
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公开(公告)号:US10693055B2
公开(公告)日:2020-06-23
申请号:US16202360
申请日:2018-11-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kilho Lee , Gwanhyeob Koh , Yoonjong Song
Abstract: Magnetic random access memory (MRAM) devices are provided. The MRAM devices may include a magnetic tunnel junction (MTJ) including a free layer and a pinned layer sequentially stacked in a vertical direction and a conductive layer adjacent to the free layer of the MTJ. The conductive layer may include a horizontal portion and first and second protruding portions that protrude away from the horizontal portion and are spaced apart from each other in a horizontal direction that is perpendicular to the vertical direction. A side of the free layer and a side of the horizontal portion may form a straight side.
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公开(公告)号:US09865800B2
公开(公告)日:2018-01-09
申请号:US15404325
申请日:2017-01-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Shinhee Han , Kilho Lee , Yoonjong Song
CPC classification number: H01L43/02 , G11C11/161 , H01L27/222 , H01L27/224 , H01L27/226 , H01L43/08 , H01L43/12
Abstract: Magnetic memory devices are provided. A magnetic memory device includes a Magnetic Tunnel Junction (MTJ) structure on a contact. Moreover, the magnetic memory device includes an insulating structure and an electrode between the MTJ structure and the contact. In some embodiments, a first contact area of the electrode with the MTJ structure is smaller than a second contact area of the insulating structure with the MTJ structure.
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公开(公告)号:US10672447B2
公开(公告)日:2020-06-02
申请号:US16262366
申请日:2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hyunsung Jung , Hyemin Shin , Yoonjong Song , Jung Hyuk Lee
Abstract: Disclosed is a memory device. The memory device includes a memory cell array that includes a target cell, a row decoder that drive a word line, and a write driver and sense amplifier that are configured to drive a bit line and a source line. The row decoder is configured to drive the word line in a first program operation and a second program operation. Between a start of the first program operation and an end of the second program operation, the write driver and sense amplifier are configured to continuously drive a bit line connected to the target cell with a second driving voltage or drive a source line connected to the target cell with a third driving voltage.
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公开(公告)号:US10103323B2
公开(公告)日:2018-10-16
申请号:US15704963
申请日:2017-09-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yong-Seok Chung , Yoonjong Song , Yongkyu Lee , Gwanhyeob Koh
IPC: H01L21/302 , H01L43/12 , H01L21/266 , H01L21/027 , H01L27/22
Abstract: The inventive concepts provide a method for forming a hard mask pattern. The method includes forming a hard mask layer on an etch target layer disposed on a substrate, forming a photoresist pattern having an opening exposing one region of the hard mask layer, performing an oxygen ion implantation process on the one region using the photoresist pattern as a mask to form an oxidized portion in the one region, and patterning the hard mask layer using the oxidized portion as an etch mask.
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