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    Apparatus for semiconductor processing
    1.
    发明授权
    Apparatus for semiconductor processing 有权
    半导体加工设备

    公开(公告)号：US08741096B2

    公开(公告)日：2014-06-03

    申请号：US11770117

    申请日：2007-06-28

    申请人： Sang-Jun Park ,  Ho-Young Lee ,  Chun-Woo Lee

    发明人： Sang-Jun Park ,  Ho-Young Lee ,  Chun-Woo Lee

    IPC分类号： C23F1/08 ,  C23C16/00 ,  H01L21/677

    CPC分类号： H01L21/67742 ,  H01L21/6719 ,  H01L21/67201

    摘要： An apparatus for semiconductor processing capable of performing semiconductor processing such as etching, depositing, etc. on a surface of a substrate such as a wafer. The apparatus for semiconductor processing, comprises: a reaction chamber having a gate through which a substrate to be processed is transferred; one or more shower heads disposed at an upper side of the reaction chamber, for spraying gas so as to perform semiconductor processing; one or more wafer supporting units disposed at an inner lower side of the reaction chamber in correspondence to each of the shower heads, for supporting the substrate; a processing space forming unit disposed in the reaction chamber, for forming a processing space for semiconductor processing by sealing the shower heads and the wafer supporting units; and an exhausting system connected to the processing space forming unit for controlling a pressure and air exhaustion inside the reaction chamber and the processing space formed by the processing space forming unit.

    摘要翻译： 一种用于半导体处理的装置，其能够在诸如晶片的基板的表面上执行诸如蚀刻，沉积等半导体处理。 用于半导体处理的装置包括：具有栅极的反应室，待处理的基板通过所述栅极传送; 一个或多个喷淋头，设置在反应室的上侧，用于喷射气体以进行半导体处理; 一个或多个晶片支撑单元，设置在与每个喷头相对应的反应室的内下侧，用于支撑基板; 处理空间形成单元，设置在所述反应室中，用于通过密封所述喷淋头和所述晶片支撑单元来形成用于半导体处理的处理空间; 以及连接到处理空间形成单元的排气系统，用于控制反应室内的压力和空气排出以及由处理空间形成单元形成的处理空间。

    APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME
    2.
    发明申请
    APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME 审中-公开
    装置，用于在薄膜上沉积薄膜的方法和使用该方法的填充玻璃的方法

    公开(公告)号：US20100190341A1

    公开(公告)日：2010-07-29

    申请号：US12669498

    申请日：2008-07-14

    申请人： Sang-Jun Park ,  Chang-Hee Han ,  Ho-Young Lee ,  Seong-Hoe Jeong

    发明人： Sang-Jun Park ,  Chang-Hee Han ,  Ho-Young Lee ,  Seong-Hoe Jeong

    IPC分类号： H01L21/465

    CPC分类号： C23C16/4584 ,  C23C16/045 ,  C23C16/4554 ,  C23C16/45548 ,  C23C16/45565 ,  C23C16/45574 ,  H01J37/3244 ,  H01J37/32449 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/31612

    摘要： Provided are an apparatus and method for depositing a thin film, and a method for gap-filling a trench in a semiconductor device. The thin film depositing apparatus includes a plurality of substrates provided on the same space inside a reactor, wherein deposition of the thin film and partial etching of the deposited thin film are repeated to form the thin film on the plurality of substrates by exposing the substrates to two or more source gases and an etching gas supplied together at predetermined time intervals while rotating the substrates. According to exemplary embodiments, it is possible to concurrently or alternatively perform deposition and etching of a thin film, so that a thin film with good gap-fill capability can be deposited.

    摘要翻译： 提供了一种用于沉积薄膜的装置和方法，以及用于在半导体器件中间隙填充沟槽的方法。 薄膜沉积设备包括设置在反应器内的相同空间上的多个基板，其中重复沉积薄膜和沉积的薄膜的部分蚀刻，以通过将基板暴露于多个基板而在多个基板上形成薄膜 在旋转基板的同时以预定的时间间隔一起供应两种或更多种源气体和蚀刻气体。 根据示例性实施例，可以同时或替代地执行薄膜的沉积和蚀刻，使得可以沉积具有良好间隙填充能力的薄膜。

    Vacuum cleaner
    3.
    发明授权
    Vacuum cleaner 有权
    吸尘器

    公开(公告)号：US08959706B2

    公开(公告)日：2015-02-24

    申请号：US13120672

    申请日：2009-02-12

    申请人： Seong-Ho Park ,  Hae-Seock Yang ,  Young-Min Hyun ,  Hyuk-Joo Kwon ,  Hyo-Churl Shin ,  Sang-Jun Park ,  Jin-Wook Seo

    发明人： Seong-Ho Park ,  Hae-Seock Yang ,  Young-Min Hyun ,  Hyuk-Joo Kwon ,  Hyo-Churl Shin ,  Sang-Jun Park ,  Jin-Wook Seo

    IPC分类号： A47L5/00 ,  A47L9/00 ,  A47L5/32 ,  A47L5/22 ,  A47L5/28

    CPC分类号： A47L5/32 ,  A47L5/225 ,  A47L5/28 ,  A47L9/0045 ,  A47L9/009

    摘要： A vacuum cleaner is provided. The vacuum cleaner includes a first suction unit, a main body, a second suction unit, a connection flow-tube, and a flow-passage switching device. The main body communicates with the first suction unit and includes a suction motor to generate a suction force. The second suction unit is configured to be selectively attached to the main body. The connection flow-tube is configured to selectively connect the first suction unit or the second suction unit to the suction motor. The flow-passage switching device is configured to connect the connection flow-tube to the first section unit or the second suction unit according to a disposition state of the second suction unit.

    摘要翻译： 提供吸尘器。 真空吸尘器包括第一吸入单元，主体，第二吸入单元，连接流动管和流路切换装置。 主体与第一抽吸单元连通并且包括产生抽吸力的抽吸马达。 第二抽吸单元构造成选择性地附接到主体。 连接流管被构造成选择性地将第一抽吸单元或第二抽吸单元连接到抽吸马达。 流路切换装置根据第二抽吸单元的配置状态将连接流管连接到第一部分单元或第二抽吸单元。

    VACUUM CLEANER
    6.
    发明申请
    VACUUM CLEANER 有权
    吸尘器

    公开(公告)号：US20110173771A1

    公开(公告)日：2011-07-21

    申请号：US13120672

    申请日：2009-02-12

    申请人： Seong-Ho Park ,  Hae-Seock Yang ,  Young-Min Hyun ,  Hyuk-joo Kwon ,  Hyo-Churl Shin ,  Sang-Jun Park ,  Jin-Wook Seo

    发明人： Seong-Ho Park ,  Hae-Seock Yang ,  Young-Min Hyun ,  Hyuk-joo Kwon ,  Hyo-Churl Shin ,  Sang-Jun Park ,  Jin-Wook Seo

    IPC分类号： A47L5/12 ,  A47L9/00

    CPC分类号： A47L5/32 ,  A47L5/225 ,  A47L5/28 ,  A47L9/0045 ,  A47L9/009

    摘要： A vacuum cleaner is provided. The vacuum cleaner includes a first suction unit, a main body, a second suction unit, a connection flow-tube, and a flow-passage switching device. The main body communicates with the first suction unit and includes a suction motor to generate a suction force. The second suction unit is configured to be selectively attached to the main body. The connection flow-tube is configured to selectively connect the first suction unit or the second suction unit to the suction motor. The flow-passage switching device is configured to connect the connection flow-tube to the first section unit or the second suction unit according to a disposition state of the second suction unit.

    摘要翻译： 提供吸尘器。 真空吸尘器包括第一吸入单元，主体，第二吸入单元，连接流动管和流路切换装置。 主体与第一抽吸单元连通并且包括产生抽吸力的抽吸马达。 第二抽吸单元构造成选择性地附接到主体。 连接流管被构造成选择性地将第一抽吸单元或第二抽吸单元连接到抽吸马达。 流路切换装置根据第二抽吸单元的配置状态将连接流管连接到第一部分单元或第二抽吸单元。

    Apparatus with touch screen and method for displaying information through external display device connected thereto
    8.
    发明授权
    Apparatus with touch screen and method for displaying information through external display device connected thereto 有权
    具有触摸屏的装置和通过与其连接的外部显示装置显示信息的方法

    公开(公告)号：US07199787B2

    公开(公告)日：2007-04-03

    申请号：US10209826

    申请日：2002-08-01

    申请人： Ju-Beam Lee ,  Sang-Jun Park

    发明人： Ju-Beam Lee ,  Sang-Jun Park

    IPC分类号： G09G5/00

    CPC分类号： G06F3/038 ,  G06F1/1632 ,  G06F3/0488

    摘要： There is provided an apparatus with a touch screen including a touch pad. The apparatus includes a connecter for connecting the apparatus to an external display device; a sensor for generating a sensing signal upon detecting connection between the apparatus and the external display device; a touch screen display driver for displaying data input from the touch pad on the touch screen; an external display driver for displaying data input from the touch pad on the external display device when the touch pad operates in a mouse pad mode; and a controller for upon receiving the sensing signal, disabling the touch screen display driver, enabling the external display driver, recognizing a point on the touch pad selected by a user, generating a coordinate value corresponding to the point, performing calculation for mapping the coordinate value with a screen display coordinate of the external display device, and determining a position of a pointer to be displayed on a screen of the external display device.

    摘要翻译： 提供了一种具有包括触摸板的触摸屏的设备。 该装置包括用于将装置连接到外部显示装置的连接器; 传感器，用于在检测到装置与外部显示装置之间的连接时产生感测信号; 触摸屏显示驱动器，用于显示从触摸屏上的触摸板输入的数据; 外部显示驱动器，用于当触摸板以鼠标垫模式操作时，在外部显示装置上显示从触摸板输入的数据; 以及控制器，用于在接收到所述感测信号时，禁用所述触摸屏显示驱动器，使所述外部显示驱动器识别由用户选择的所述触摸板上的点，生成与所述点对应的坐标值，执行用于映射所述坐标的计算 值，并且确定要在外部显示装置的屏幕上显示的指针的位置。