摘要:
[Object] To provide a propylene homopolymer suitable for capacitor films having high withstand voltage and a stretched film formed by stretching the propylene homopolymer.[Solution] A propylene homopolymer of the present invention for capacitors satisfies the following requirements (i) to (v) and (ix): (i) the MFR is 1 to 10 g/10 minutes; (ii) the meso pentad fraction (mmmm) measured by 13C-NMR is 0.940 to 0.995; (iii) the integrted amount of elution at 90° C. by CFC using o-dichlorobenzene is 0.5% by weight or less; (iv) the melting point measured using DSC is 152° C. or more; (v) the chlorine content is 2 ppm by weight or less; and (ix) in an elution temperature-elution volume curve measured by cross-fractionation chromatography (CFC) using o-dichlorobenzene, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and half width of 7.0° C. or less.
摘要:
[Object] To provide a propylene homopolymer suitable for capacitor films having high withstand voltage and a stretched film formed by stretching the propylene homopolymer.[Solution] A propylene homopolymer of the present invention for capacitors satisfies the following requirements (i) to (v) and (ix): (i) the MFR is 1 to 10 g/10 minutes; (ii) the meso pentad fraction (mmm) measured by 13C-NMR is 0.940 to 0.995; (iii) the integrted amount of elution at 90° C. by CFC using o-dichlorobenzene is 0.5% by weight or less; (iv) the melting point measured using DSC is 152° C. or more; (v) the chlorine content is 2 ppm by weight or less; and (ix) in an elution temperature-elution volume curve measured by cross-fractionation chromatography (CFC) using o-dichlorobenzene, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and half width of 7.0° C. or less.
摘要:
[Object] To provide a polypropylene resin composition for use in the formation of a microporous membrane having excellent heat resistance and low thermal shrinkage ratio.[Solution] A polypropylene resin composition for use in the formation of a microporous membrane according to the present invention comprises as an essential component a propylene homopolymer (A) that satisfies the following requirements (1) to (4) and (7): (1) the intrinsic viscosity [η] is 1 dl/g or more and less than 7 dl/g; (2) the mesopentad fraction ranges from 94.0% to 99.5%; (3) the integral elution volume during heating to 100° C. is 10% or less; (4) the melting point ranges from 153° C. to 167° C.; and (7) in an elution temperature-elution volume curve, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and a half-width of 7.0° C. or less.
摘要:
[Object] To provide a polypropylene resin composition for use in the formation of a microporous membrane having excellent heat resistance and low thermal shrinkage ratio.[Solution] A polypropylene resin composition for use in the formation of a microporous membrane according to the present invention comprises as an essential component a propylene homopolymer (A) that satisfies the following requirements (1) to (4) and (7): (1) the intrinsic viscosity [η] is 1 dl/g or more and less than 7 dl/g; (2) the mesopentad fraction ranges from 94.0% to 99.5%; (3) the integral elution volume during heating to 100° C. is 10% or less; (4) the melting point ranges from 153° C. to 167° C.; and (7) in an elution temperature-elution volume curve, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and a half-width of 7.0° C. or less.
摘要:
A polypropylene for a film capacitor or a polypropylene sheet for a film capacitor which exhibits excellent stretchability when stretched into a film and provides a film having high breakdown voltage and small thermal shrinkage ratio, and which is suitable for a polypropylene film for a film capacitor and a film capacitor comprising the film.The polypropylene for a film capacitor of the present invention is obtained by irradiating a propylene homopolymer with a radiation with an absorbed dose of 0.1 to 500 kGy, the propylene homopolymer having (1) a melt flow rate (MFR) within a range of 1 to 10 g/10 min as determined at 230° C. under a load of 2.16 kg in accordance with ASTM D1238, (2) an isotactic pentad fraction (mmmm fraction) of not less than 94% as determined using 13C-NMR, (3) an ash amount of not more than 30 ppm as obtained by completely burning the propylene homopolymer in air, and (4) a chlorine amount of not more than 10 ppm as determined by ion chromatography.
摘要:
According to one embodiment, a method controls an apparatus including a sensor which detects an open/close state of a cover, and an power manager which performs power management of the apparatus in accordance with a ordinary state and a power-saving state. The method includes notifying turning on the apparatus in order to change the apparatus to the ordinary state, if the power manager is notified a second notifying and the sensor detects that the cover is opened, and performing an power management corresponding to the power-saving state, if the power manager is notified a first notifying, or if the power manager is notified the second notifying and the sensor detects that the cover is closed.
摘要:
A nitride semiconductor laser device includes an active layer 106 made of a nitride semiconductor formed on a substrate and a current confining layer 109 formed above the active layer 106. The current confining layer has an opening 109a through which a current selectively flows into the active layer 106. The device satisfies 0.044
摘要翻译:氮化物半导体激光器件包括由形成在衬底上的氮化物半导体制成的有源层106和形成在有源层106上方的电流限制层109.电流限制层具有开口109a,电流选择性地流入有源层 该装置满足0.044 <&Dgr; n /&Ggr; v <0.062其中&Dgr; n是开口109a和电流限制层109之间的有效折射率差,&Ggr; v是作为垂直光限制因子的比例 限定在有源层106中的激光照射到在有源层106中发射的激光。
摘要:
A method for fabricating semiconductor devices forms a semiconductor layer containing a positive layer on a mother substrate and then forms a metal layer on the semiconductor layer. After forming the metal layer, the method separates the mother substrate from the semiconductor layer and then removes a desired region of the metal layer from the exposed surface of the semiconductor layer from which the mother substrate has been separated to form a plurality of mutually separated semiconductor devices each containing the semiconductor layer.
摘要:
According to one embodiment, an electronic device system includes a lock device including a hook portion which is rotatable between a lock position and an unlock position, and a rotation permission unit which permits rotation of the hook portion in a case where a permission signal is received, and an electronic device including a casing with a wall, a connection port which opens at the wall of the casing and to which the hook portion of the lock device is insertable, a detection unit which detects whether the lock device is inserted in the connection port, and a supply unit which supplies the permission signal to the rotation permission unit of the lock device in a case where the lock device is inserted in the connection port.
摘要:
Disclosed is a film or sheet of a polypropylene resin composition comprising the following components (A), (B) and (C): (A) 100 parts by weight of a polypropylene resin, (B) from 0.001 to 1 part by weight of a phenolic antioxidant such as 1,3,5-tris(4-t-butyl-3-hydroxy-2,6-dimethylbenzyl)isocyanurate or the like, and (C) from 0.05 to 5 parts by weight of a hindered amine-based light stabilizer. Provided are filmy or sheet moldings of the polypropylene resin composition which color little even when stored indoors at relatively high temperatures; and also the polypropylene resin composition for the moldings.