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    ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD
    1.
    发明申请
    ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD 有权

    公开(公告)号：US20080138517A1

    公开(公告)日：2008-06-12

    申请号：US11950606

    申请日：2007-12-05

    申请人： Seong Deok AHN ,  Seung Youl KANG ,  Chul Am KIM ,  Ji Young OH ,  In Kyu YOU ,  Gi Heon KIM ,  Kyu Ha BAEK ,  Kyung Soo SUH

    发明人： Seong Deok AHN ,  Seung Youl KANG ,  Chul Am KIM ,  Ji Young OH ,  In Kyu YOU ,  Gi Heon KIM ,  Kyu Ha BAEK ,  Kyung Soo SUH

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45523 ,  B05D1/60 ,  C23C16/4408

    摘要： Provided are a device for depositing an organic/inorganic thin film and a deposition method thereof. The method includes: i) heating a source vessel containing an organic material and an inorganic material to generate at least one deposition gas phase of the organic and inorganic materials; ii) transferring one of the deposition gas phases of the organic and inorganic materials to a process chamber through a transfer path maintaining a constant temperature so as to prevent the generated deposition gas phases of the organic/inorganic materials from being condensed; iii) distributing one of the deposition gas phases of the organic and inorganic materials transferred to the process chamber onto a substrate disposed in the process chamber to adsorb one of the organic and inorganic materials on the substrate; iv) purging the process chamber using a diluted gas and a transfer gas after one of the organic and inorganic materials is adsorbed on the substrate; v) heating an activating agent source vessel containing an activation heat initiator capable of activating a monomer of one of the deposition gas phases of the organic and inorganic materials to generate a heat initiator gas phase; vi) transferring the heat initiator gas phase to the process chamber through a transfer path maintaining a constant temperature so as to prevent the heat initiator gas phase from being condensed; vii) distributing the heat initiator gas phase transferred to the process chamber onto the organic or inorganic material monomer deposited on the substrate through the process chamber maintaining a constant temperature so as to prevent the heat initiator gas phase from being condensed in a shower head, and forming an organic/inorganic thin film; and viii) exhausting the heat initiator gas phase remaining after the organic/inorganic thin film is deposited on the substrate from the process chamber, and purging the process chamber using the diluted gas and the transfer gas. Therefore, according to the method of depositing the organic/inorganic thin film in a time-division manner, the thickness of the thin film can be accurately adjusted and the deposition can be uniformly performed when the thin film is deposited on a large-scale substrate.

    ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD
    2.
    发明申请
    ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD 审中-公开
    有机/无机薄膜沉积装置和沉积方法

    公开(公告)号：US20100300360A1

    公开(公告)日：2010-12-02

    申请号：US12856004

    申请日：2010-08-13

    申请人： Seong Deok AHN ,  Seung Youl KANG ,  Chul Am KIM ,  Ji Young OH ,  In Kyu YOU ,  Gi Heon KIM ,  Kyu Ha BAEK ,  Kyung Soo SUH

    发明人： Seong Deok AHN ,  Seung Youl KANG ,  Chul Am KIM ,  Ji Young OH ,  In Kyu YOU ,  Gi Heon KIM ,  Kyu Ha BAEK ,  Kyung Soo SUH

    IPC分类号： C23C16/46

    CPC分类号： C23C16/45523 ,  B05D1/60 ,  C23C16/4408

    摘要： Provided is a method for depositing an organic/inorganic thin film. The method includes: i) heating a source vessel containing an organic material and an inorganic material; ii) transferring a deposition gas to a process chamber; iii) distributing the deposition gas onto a substrate disposed in the process chamber; iv) purging the process chamber; v) heating an activating agent source vessel; vi) transferring a heat initiator gas phase to the process chamber; vii) distributing the heat initiator gas phase onto the organic or inorganic material monomer deposited on the substrate through the process chamber, and forming an organic/inorganic thin film; and viii) exhausting the heat initiator gas phase and purging the process chamber. Depositing the organic/inorganic thin film in a time-division manner, the thickness of the thin film can be accurately adjusted and the deposition can be uniformly performed when the thin film is deposited on a large-scale substrate.

    摘要翻译： 提供一种沉积有机/无机薄膜的方法。 该方法包括：i）加热含有机材料和无机材料的源容器; ii）将沉积气体转移到处理室; iii）将沉积气体分配到设置在处理室中的基板上; iv）清洗处理室; v）加热活化剂源容器; vi）将热引发剂气相转移到所述处理室; vii）通过处理室将热引发剂气相分配到沉积在基材上的有机或无机材料单体上，形成有机/无机薄膜; 和viii）排出热引发剂气相并清洗处理室。 以时分方式沉积有机/无机薄膜，可以精确地调节薄膜的厚度，并且当薄膜沉积在大型基底上时能够均匀地进行沉积。