公开(公告)号：US5523191A

公开(公告)日：1996-06-04

申请号：US379190

申请日：1995-01-27

申请人： Seong-Ju Kim ,  Ki-Dae Kim ,  Hosull Lee ,  Dae Y. Lee

发明人： Seong-Ju Kim ,  Ki-Dae Kim ,  Hosull Lee ,  Dae Y. Lee

IPC分类号： C07F9/6593 ,  G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0226 ,  C07F9/65815

摘要： There are disclosed novel photoresist compositions employing phosphazene compounds as ballast, unabsorbent of light at a band of i-line and g-line and superior in thermal resistance and sensitivity as well as resolution, characterized by introducing photosensitive groups into phosphazene type ballast represented by the following formula I: ##STR1##

摘要翻译： 公开了使用磷腈化合物作为镇流器的新型光刻胶组合物，在i线和g线的带上不吸收光，并且具有优异的耐热性和灵敏度以及分辨率，其特征在于将光敏基团引入磷酸盐型镇流器 以下公式I：（I）

公开(公告)号：US5851728A

公开(公告)日：1998-12-22

申请号：US728771

申请日：1996-10-09

申请人： Seong-Ju Kim ,  Joo-Hyeon Park ,  Ki-Dae Kim ,  Dong-Chui Seo

发明人： Seong-Ju Kim ,  Joo-Hyeon Park ,  Ki-Dae Kim ,  Dong-Chui Seo

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  Y10S430/106

摘要： A three-component chemical amplified photoresist composition, comprising: an alkali soluble resin; a dissolution inhibitor of aromatic polyhydroxy compound substituted by at least two acid-decomposable radicals; and a photo acid generating agent of an onium salt, which is capable of forming good profiles when exposed to light with a short wavelength and is superior in heat resistance and storage stability.

摘要翻译： 一种三组分化学放大光致抗蚀剂组合物，包括：碱溶性树脂; 由至少两个酸可分解基团取代的芳族多羟基化合物的溶解抑制剂; 以及一种鎓盐的光酸生成剂，其能够在短波长的光下曝光时能够形成良好的轮廓，并且耐热性和储存稳定性优异。

公开(公告)号：US5989775A

公开(公告)日：1999-11-23

申请号：US998546

申请日：1997-12-26

申请人： Joo-Hyeon Park ,  Ji-Hong Kim ,  Ki-Dae Kim ,  Sun-Yi Park ,  Seong-Ju Kim

发明人： Joo-Hyeon Park ,  Ji-Hong Kim ,  Ki-Dae Kim ,  Sun-Yi Park ,  Seong-Ju Kim

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

摘要： A copolymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition having the copolymer and a photoacid generator. The photoresist can allow for a good pattern shape even though a post-baking is taken in a somewhat delayed time and for a use of any radiation, such as uv light, deep uv light and charged particle beam. Also, it is superior in storage stability and resolution so that it is useful for the high integration of semiconductor devices. The polymer ranges, in polystyrene-reduced average molecular weight, from 1,000 to 1,000,000. The polymer is represented by the following repeating pattern: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a methyl; R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen; 1, m, n each is a repeating number satisfying the condition that 0.3

摘要翻译： 具有由以下通式I表示的重复单元的共聚物和具有共聚物和光致酸发生剂的化学扩增正性光致抗蚀剂组合物。 即使在稍微延迟的时间内进行后烘烤并且使用诸如紫外光，深紫外光和带电粒子束的任何辐射，光致抗蚀剂可以允许良好的图案形状。 此外，它在存储稳定性和分辨率方面是优异的，因此它对于半导体器件的高集成是有用的。 聚苯乙烯换算的聚合物的平均分子量为1,000至1,000,000。 聚合物由以下重复图案表示：其中，R1，R2和R3独立地表示氢原子或甲基; R4，R5和R6独立地表示氢原子，烷基，烷氧基或卤素; 1，m，n分别为满足0.3 <1 /（m + n）<0.9,0.1

公开(公告)号：US5962185A

公开(公告)日：1999-10-05

申请号：US938925

申请日：1997-09-26

申请人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ji-Hong Kim ,  Ki-Dae Kim

发明人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ji-Hong Kim ,  Ki-Dae Kim

IPC分类号： C08F212/04 ,  C07C69/736 ,  C08F216/10 ,  C08F220/30 ,  G03C1/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  C08F220/30 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

摘要： A positive chemical amplified photoresist composition having as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit of Formula (I) is: ##STR1## wherein, R.sub.2, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5 is functions as an acid-labile protective group and is selected from a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and 1, m and n each represent a mole ratio, satisfying the condition of l+m+n=1 where 0

摘要翻译： 一种正性化学放大光致抗蚀剂组合物，其具有作为基质树脂的具有式（I）的重复单元的聚合物和光酸产生剂。 聚苯乙烯换算的重均分子量范围为约2,000至1,000,000。 光致抗蚀剂组合物可以在碱中显影，并且除了具有优异的储存保存性之外，对深紫外光具有优异的灵敏度，分辨率和透射率。 式（I）的重复单元是：其中R2，R2和R3独立地由氢原子或甲基表示; R4是氢原子，烷基或烷氧基; R5用作酸不稳定保护基，选自叔丁基，四氢吡喃基或烷氧基亚甲基; j为1-8的整数; k是0-8的整数; 和1，m和n各自表示摩尔比，满足条件1 + m + n = 1，其中0 <1 <0.4。

公开(公告)号：US5882835A

公开(公告)日：1999-03-16

申请号：US932415

申请日：1997-09-17

申请人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ki-Dae Kim ,  Sun-Yi Park

发明人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Ki-Dae Kim ,  Sun-Yi Park

IPC分类号： C08F8/00 ,  C08F12/22 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C08F16/02 ,  C08F16/12

CPC分类号： G03F7/039 ,  C08F8/00 ,  G03F7/0045 ,  Y10S430/106

摘要： A chemical amplified positive photoresist composition including a resin having the repeating unit of Formula I and a photoacid generator. The resin ranges, in polystyrene-reduced molecular weight, from about 2,000 to 1,000,000. In Formula I, k and l each represent a mole ratio satisfying the condition of k+l=l. R.sub.1 is a hydrogen atom or a methyl group. R.sub.2 and R.sub.3 are independently either a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group. R.sub.4 is an acetate group, a t-butoxycarbonyl group, a benzyl group, a trialkylsilyl group or an alkyl group. The photoacid generator which generates an acid by radiation. ##STR1##

摘要翻译： 一种化学放大型正性光致抗蚀剂组合物，其包含具有式I的重复单元的树脂和光酸产生剂。 树脂的聚苯乙烯缩小分子量范围为约2,000至1,000,000。 在式I中，k和l各自表示满足条件k + l = 1的摩尔比。 R1是氢原子或甲基。 R2和R3独立地为氢原子，卤素原子，烷基或烷氧基。 R4是乙酸基，叔丁氧基羰基，苄基，三烷基甲硅烷基或烷基。 通过辐射产生酸的光酸产生剂。 （一）

公开(公告)号：US5665841A

公开(公告)日：1997-09-09

申请号：US744738

申请日：1996-10-30

申请人： Ji-Hong Kim ,  Sun-Yi Park ,  Seong-Ju Kim ,  Joo-Hyeon Park

发明人： Ji-Hong Kim ,  Sun-Yi Park ,  Seong-Ju Kim ,  Joo-Hyeon Park

IPC分类号： C08F12/14 ,  C08F8/00 ,  C08F12/22 ,  C08F112/14 ,  C08F212/14 ,  C08L25/18 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  C08F24/00

CPC分类号： C08F212/14 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/11

摘要： There are provided acetal group-containing alkoxy-styrene polymers represented by the following formula I: ##STR1## wherein R.sub.1 and R.sub.3 may be the same or different, and represent a hydrogen atom or a methylene group; R.sub.2 represents ##STR2## wherein R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 may be the same or different, and independently represent a hydrogen atom, an alkyl group or an aryl group; m+n=1; k is an integer of 1-5; and l is an integer of 0-5; and an acid-generating agent, and chemical amplified negative photoresist composition comprising the same. It shows excellent transparency and sensitivity to deep UV in addition to being resistant to dry etching and alkali-developable.

摘要翻译： 提供由下式I表示的含缩醛基的烷氧基 - 苯乙烯聚合物：其中R 1和R 3可以相同或不同，表示氢原子或亚甲基; R 2可以相同或不同，独立地表示氢原子，烷基或芳基; m + n = 1; k为1-5的整数; l为0-5的整数; 和酸产生剂，以及包含其的化学放大型负性光致抗蚀剂组合物。 除了耐干蚀刻和耐碱显影外，它还具有优异的透明度和对深紫外线的敏感性。

公开(公告)号：US08999085B2

公开(公告)日：2015-04-07

申请号：US12158731

申请日：2006-12-22

申请人： Seong-Ju Kim ,  Kwang-Geun Chin ,  Hyun-Gyu Hwang ,  Sung-Kyu Kim ,  Il-Ryoung Sohn ,  Young-Kook Lee ,  Oh-Yeon Lee

发明人： Seong-Ju Kim ,  Kwang-Geun Chin ,  Hyun-Gyu Hwang ,  Sung-Kyu Kim ,  Il-Ryoung Sohn ,  Young-Kook Lee ,  Oh-Yeon Lee

IPC分类号： C23C14/34 ,  C25D7/00 ,  C25D9/00 ,  C25D11/00 ,  B22D17/00 ,  C21D1/84 ,  C21D5/00 ,  C21D8/04 ,  C21D9/00 ,  C21D8/02 ,  C21D6/00 ,  C21D8/00 ,  C21D6/02 ,  C22C38/02 ,  C21D9/48 ,  C22C38/00 ,  C22C38/04 ,  C22C38/06 ,  C22C38/28 ,  C22C38/32

CPC分类号： B62D29/007 ,  B32B15/013 ,  C21D6/002 ,  C21D6/004 ,  C21D6/005 ,  C21D6/008 ,  C21D8/0226 ,  C21D8/0247 ,  C21D8/04 ,  C21D8/0405 ,  C21D9/48 ,  C21D9/52 ,  C22C38/002 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/14 ,  C22C38/28 ,  C22C38/32 ,  C22C38/38 ,  C23C2/06 ,  C25D7/0614 ,  Y10T428/12799

摘要： A high-ductility, high-strength and high Mn steel strip used for steel strips of automobiles requiring superior formability and high strength, a plated steel strip produced by using the same, and a manufacturing method thereof are disclosed. The high Mn steel strip comprises, by weight %, 0.2˜1.5% of C, 10˜25% of Mn, 0.01˜3.0% of Al, 0.005˜2.0% of Si, 0.03% or less of P, 0.03% or less of S, 0.040% or less of N, and the balance of Fe and other unavoidable impurities. The high-ductility, high-strength and high Mn steel strip, and the plated steel strip produced by using the same have superior surface properties and plating characteristics.

摘要翻译： 公开了一种用于需要优异成形性和高强度的汽车用钢带的高延展性，高强度和高Mn钢带，使用该钢带制造的镀覆钢带及其制造方法。 高Mn钢带以重量％计含有0.2〜1.5％的C，10〜25％的Mn，0.01〜3.0％的Al，0.005〜2.0％的Si，0.03％以下的P，0.03％以下 的S，0.040％以下的N，余量为Fe等不可避免的杂质。 高延展性，高强度和高Mn钢带以及使用该钢带的电镀钢带具有优异的表面性能和电镀特性。

公开(公告)号：US06369143B1

公开(公告)日：2002-04-09

申请号：US09337437

申请日：1999-06-21

申请人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Dong-Chul Seo ,  Sun-Yi Park

发明人： Joo-Hyeon Park ,  Seong-Ju Kim ,  Dong-Chul Seo ,  Sun-Yi Park

IPC分类号： C08J541

CPC分类号： G03F7/039 ,  C08G61/08 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115

摘要： A radiation-sensitive polymer and a chemical amplification resist composition based on the polymer, which can be easily controlled in sensitivity by regulating the content and kind of the carboxylic acid-grafted norbornene derivatives in the matrix polymer and is superior in adherence to substrate and dry etch resistance, so that it can be formed into resist patterns improved in transparency, photosensitivity and resolution by use of KrF or ArF excimer lasers. The polymer is represented by the formula I: wherein, X is an acid-dissociable grafted norbornene derivative selected from the group consisting of the formulas II and III; Y is a carboxylic acid-grafted norbornene derivative represented by the formula IV, and l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=l and 0.4≦o≦0.5:

摘要翻译： 基于聚合物的辐射敏感聚合物和化学扩增抗蚀剂组合物，其可以通过调节基质聚合物中羧酸接枝的降冰片烯衍生物的含量和种类而容易地控制灵敏度，并且在对基材和干燥的粘附性方面优异 因此可以通过使用KrF或ArF准分子激光器将其形成为提高透明度，光敏性和分辨率的抗蚀剂图案。 聚合物由式I表示：其中X是选自式II和III的酸解离的接枝的降冰片烯衍生物; Y是由式Ⅳ表示的羧酸接枝的降冰片烯衍生物，l，m，n和o各自为不大于0.5的重复数，满足1 + m + n + o = 1和0.4 <= o <= 0.5：

公开(公告)号：US06146810A

公开(公告)日：2000-11-14

申请号：US337438

申请日：1999-06-21

申请人： Dong-Chul Seo ,  Sun-Yi Park ,  Joo-Hyeon Park ,  Seong-Ju Kim

发明人： Dong-Chul Seo ,  Sun-Yi Park ,  Joo-Hyeon Park ,  Seong-Ju Kim

IPC分类号： C08F222/06 ,  C08F232/08 ,  C08G63/54 ,  C08L35/02 ,  G03F7/004 ,  G03F7/039 ,  C08F10/00

CPC分类号： G03F7/039 ,  C08F222/06 ,  C08F232/08 ,  G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

摘要： A copolymer represented by the formula I and a chemical amplification resist containing the copolymer, which can be easily controlled in sensitivity by regulating the content and kind of the norbornene derivatives in the matrix polymers in addition to being superior in adherence to substrate and dry etch resistance: ##STR1## wherein, X is selected from the group consisting of the following general formulas II, III and IV; and, l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=1 and 0.4.ltoreq.o.ltoreq.0.5: ##STR2##

摘要翻译： 由式I表示的共聚物和含有该共聚物的化学扩增抗蚀剂，其可以通过调节基质聚合物中降冰片烯衍生物的含量和种类以及对基材的粘附性和耐干蚀刻性而优异的灵敏度 其中，X选自下列通式II，III和IV; 并且，l，m，n和o各自为不大于0.5的重复数，满足l + m + n + o = 1和0.4≤0.0= 0.5的条件：

公开(公告)号：US09580786B2

公开(公告)日：2017-02-28

申请号：US12097543

申请日：2006-12-20

申请人： Il-Ryoung Sohn ,  Kwang-Geun Chin ,  Seong-Ju Kim ,  Myung-Soo Kim ,  Sung-Kyu Kim

发明人： Il-Ryoung Sohn ,  Kwang-Geun Chin ,  Seong-Ju Kim ,  Myung-Soo Kim ,  Sung-Kyu Kim

IPC分类号： C22C38/04 ,  C22C38/06 ,  B32B15/01 ,  C23C2/06 ,  C23C2/28 ,  C22C18/00 ,  C22C38/60 ,  C21D6/00 ,  C21D8/02

CPC分类号： C23C2/06 ,  B32B15/012 ,  C21D6/005 ,  C21D8/0236 ,  C21D8/0273 ,  C21D8/0284 ,  C22C18/00 ,  C22C38/04 ,  C22C38/60 ,  C23C2/28 ,  Y10T428/12799

摘要： A high-manganese hot-dip coated steel sheet is disclosed which provides high corrosion resistance, high ductility and high strength, mainly used for inner and outer panels of automobiles, and a method of manufacturing the same. The high-manganese hot-dip coated steel sheet includes a substrate steel sheet having a composition of (in weight %) 0.1 to 1.5% of C, 5 to 35% of Mn, and the remainder includes Fe and other unavoidable impurities, and a hot-dip zinc coating layer formed on the substrate steel sheet, the hot-dip zinc coating layer having a composition of (in weight %) 0.1 to 10% of Mn, 5 to 15% of Fe, and the remainder including Zn and other unavoidable impurities.

摘要翻译： 公开了一种主要用于汽车内外板的高耐腐蚀性，高延展性和高强度的高锰热浸镀锌钢板及其制造方法。 高锰热浸镀钢板包括：组成为（重量％）为C：0.1〜1.5％，Mn为5〜35％的基材钢，其余为Fe等不可避免的杂质， 形成在基材钢板上的热浸镀锌层，热浸镀锌层的组成为（重量％）为Mn的0.1〜10％，Fe为5〜15％，其余为Zn等 不可避免的杂质。