Structure and Method of Fabricating a CZTS Photovoltaic Device by Electrodeposition
    2.
    发明申请
    Structure and Method of Fabricating a CZTS Photovoltaic Device by Electrodeposition 有权
    通过电沉积制造CZTS光伏器件的结构和方法

    公开(公告)号:US20120061790A1

    公开(公告)日:2012-03-15

    申请号:US12878746

    申请日:2010-09-09

    IPC分类号: H01L31/032 H01L31/18

    摘要: Techniques for using electrodeposition to form absorber layers in diodes (e.g., solar cells) are provided. In one aspect, a method for fabricating a diode is provided. The method includes the following steps. A substrate is provided. A backside electrode is formed on the substrate. One or more layers are electrodeposited on the backside electrode, wherein at least one of the layers comprises copper, at least one of the layers comprises zinc and at least one of the layers comprises tin. The layers are annealed in an environment containing a sulfur source to form a p-type CZTS absorber layer on the backside electrode. An n-type semiconductor layer is formed on the CZTS absorber layer. A transparent conductive layer is formed on the n-type semiconductor layer. A diode is also provided.

    摘要翻译: 提供了使用电沉积在二极管(如太阳能电池)中形成吸收层的技术。 在一个方面,提供了制造二极管的方法。 该方法包括以下步骤。 提供基板。 在基板上形成背面电极。 一个或多个层电沉积在背面电极上,其中至少一个层包含铜,至少一个层包含锌,并且至少一层包括锡。 这些层在包含硫源的环境中退火,以在背面电极上形成p型CZTS吸收层。 在CZTS吸收层上形成n型半导体层。 在n型半导体层上形成透明导电层。 还提供二极管。

    OHMIC CONTACT OF THIN FILM SOLAR CELL
    4.
    发明申请
    OHMIC CONTACT OF THIN FILM SOLAR CELL 审中-公开
    薄膜太阳能电池的OHMIC接触

    公开(公告)号:US20140030843A1

    公开(公告)日:2014-01-30

    申请号:US13558383

    申请日:2012-07-26

    IPC分类号: H01L31/0264 B82Y40/00

    摘要: A chalcogen-resistant material including at least one of a carbon nanotube layer and a high work function material layer is deposited on a transition metal layer on a substrate. A semiconductor chalcogenide/kesterite material layer is deposited over the chalcogen-resistant material. The carbon nanotubes, if present, can reduce contact resistance by providing direct electrically conductive paths from the transition metal layer through the chalcogen-resistant material and to the semiconductor chalcogenide material. The high work function material layer, if present, can reduce contact resistance by reducing chalcogenization of the transition metal in the transition metal layer. Reduction of the contact resistance can enhance efficiency of a solar cell including the chalcogenide semiconductor material.

    摘要翻译: 包含碳纳米管层和高功函数材料层中的至少一种的耐硫属材料沉积在基板上的过渡金属层上。 半导体硫族化物/凯斯特石材料层沉积在抗硫属材料上。 碳纳米管(如果存在)可以通过提供从过渡金属层通过硫属元素抵抗材料和半导体硫族化物材料的直接导电路径来降低接触电阻。 如果存在高功函数材料层,则可以通过减少过渡金属层中的过渡金属的硫族化来降低接触电阻。 降低接触电阻可以提高包括硫族化物半导体材料的太阳能电池的效率。

    Plasma annealing of thin film solar cells
    6.
    发明授权
    Plasma annealing of thin film solar cells 有权
    薄膜太阳能电池的等离子体退火

    公开(公告)号:US08871560B2

    公开(公告)日:2014-10-28

    申请号:US13571048

    申请日:2012-08-09

    IPC分类号: H01L31/032 H01L31/0749

    摘要: Embodiments relate to a method for annealing a solar cell structure including forming an absorber layer on a molybdenum (Mo) layer of a solar cell base structure. The solar cell base structure includes a substrate and the Mo layer is located on the substrate. The absorber layer includes a semiconductor chalcogenide material. Annealing the solar cell base structure is performed by exposing an outer layer of the solar cell base structure to a plasma.

    摘要翻译: 实施例涉及一种用于退火太阳能电池结构的方法,包括在太阳能电池基底结构的钼(Mo)层上形成吸收层。 太阳能电池基体结构包括衬底,Mo层位于衬底上。 吸收层包括半导体硫族化物材料。 通过将太阳能电池基底结构的外层暴露于等离子体来进行太阳能电池基体结构的退火。

    ELECTRODEPOSITION METHODS OF GALLIUM AND GALLIUM ALLOY FILMS AND RELATED PHOTOVOLTAIC STRUCTURES
    7.
    发明申请
    ELECTRODEPOSITION METHODS OF GALLIUM AND GALLIUM ALLOY FILMS AND RELATED PHOTOVOLTAIC STRUCTURES 审中-公开
    镓和镓合金膜的电沉积方法和相关的光伏结构

    公开(公告)号:US20120055612A1

    公开(公告)日:2012-03-08

    申请号:US12874496

    申请日:2010-09-02

    IPC分类号: C25D7/12 B32B38/00 C25D5/10

    摘要: Photovoltaic devices and methods for preparing a p-type semiconductor layer for the photovoltaic devices generally include electroplating a layer of gallium or a gallium alloy onto a conductive layer by contacting the conductive layer with a plating bath free of complexing agents including a gallium salt, methane sulfonic acid or sodium sulfate and an organic additive comprising at least one nitrogen atom and/or at least one sulfur atom, and a solvent; adjusting a pH of the solution to be less than 2.6 or greater than 12.6. The photovoltaic device includes an impurity in the p-type semiconductor layer selected from the group consisting of arsenic, antimony, bismuth, and mixtures thereof. Various photovoltaic precursor layers for forming CIS, CGS and CIGS p-type semiconductor structures can be formed by electroplating the gallium or gallium alloys in this manner. Also disclosed are processes for forming a thermal interface of gallium or a gallium alloy with the electroplating process.

    摘要翻译: 用于制备用于光伏器件的p型半导体层的光伏器件和方法通常包括通过使导电层与不含络合剂的镀浴接触来将一层镓或镓合金电镀到导电层上,所述络合剂包括镓盐,甲烷 磺酸或硫酸钠和包含至少一个氮原子和/或至少一个硫原子的有机添加剂和溶剂; 调节溶液的pH值小于2.6或大于12.6。 光电器件包括选自砷,锑,铋及其混合物的p型半导体层中的杂质。 可以通过以这种方式电镀镓或镓合金来形成用于形成CIS,CGS和CIGS p型半导体结构的各种光伏前体层。 还公开了通过电镀工艺形成镓或镓合金的热界面的工艺。

    PLASMA ANNEALING OF THIN FILM SOLAR CELLS
    9.
    发明申请
    PLASMA ANNEALING OF THIN FILM SOLAR CELLS 有权
    薄膜太阳能电池的等离子体退火

    公开(公告)号:US20140045295A1

    公开(公告)日:2014-02-13

    申请号:US13571048

    申请日:2012-08-09

    IPC分类号: H01L31/18

    摘要: Embodiments relate to a method for annealing a solar cell structure including forming an absorber layer on a molybdenum (Mo) layer of a solar cell base structure. The solar cell base structure includes a substrate and the Mo layer is located on the substrate. The absorber layer includes a semiconductor chalcogenide material. Annealing the solar cell base structure is performed by exposing an outer layer of the solar cell base structure to a plasma.

    摘要翻译: 实施例涉及一种用于退火太阳能电池结构的方法,包括在太阳能电池基底结构的钼(Mo)层上形成吸收层。 太阳能电池基体结构包括衬底,Mo层位于衬底上。 吸收层包括半导体硫族化物材料。 通过将太阳能电池基底结构的外层暴露于等离子体来进行太阳能电池基体结构的退火。