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公开(公告)号：US20130283858A1
公开(公告)日：2013-10-31
申请号：US13920628
申请日：2013-06-18
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
IPC分类号： G03F7/20
CPC分类号： G03F7/2008 , B82Y10/00 , B82Y40/00 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/36 , C03C3/06 , C03C2201/06 , G03F1/24
摘要： Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.
摘要翻译： 用于选择在900℃热处理100小时时氧化铝基团浓度小于或等于100ppm的掺杂二氧化钛的石英玻璃作为EUV光刻元件的合适材料的方法。
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公开(公告)号：US20120258389A1
公开(公告)日：2012-10-11
申请号：US13442550
申请日：2012-04-09
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
CPC分类号： G03F1/24 , C03B19/1415 , C03B19/1423 , C03B2201/42 , C03B2207/64 , C03C3/06 , C03C4/0085 , C03C4/08 , C03C2201/42 , C03C2203/42 , G03F1/50
摘要： On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
摘要翻译： 在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。
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公开(公告)号：US20110159413A1
公开(公告)日：2011-06-30
申请号：US12967175
申请日：2010-12-14
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
CPC分类号： G03F7/2008 , B82Y10/00 , B82Y40/00 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/36 , C03C3/06 , C03C2201/06 , G03F1/24
摘要： A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.
摘要翻译： 在900℃热处理100小时时，OH基浓度小于或等于100ppm的二氧化钛掺杂石英玻璃适合作为EUV光刻元件。
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公开(公告)号：US09296636B2
公开(公告)日：2016-03-29
申请号：US13442550
申请日：2012-04-09
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
CPC分类号： G03F1/24 , C03B19/1415 , C03B19/1423 , C03B2201/42 , C03B2207/64 , C03C3/06 , C03C4/0085 , C03C4/08 , C03C2201/42 , C03C2203/42 , G03F1/50
摘要： On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
摘要翻译： 在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。
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5.发明授权Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same 有权含铜石英玻璃及其制造方法以及使用其的氙闪光灯公开(公告)号：US08635886B2
公开(公告)日：2014-01-28
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译： 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。
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6.发明申请COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 有权二氧化硅铜玻璃及其制造方法及使用其的氙气灯公开(公告)号：US20120291488A1
公开(公告)日：2012-11-22
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译： 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。
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7.发明申请COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 审中-公开二氧化硅铜玻璃及其制造方法及使用其的氙气灯公开(公告)号：US20100109509A1
公开(公告)日：2010-05-06
申请号：US12595605
申请日：2008-04-28
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use.The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译： 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。
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8.发明授权Synthetic quartz glass for optical use, heat treatment method and heat treatment apparatus for the same 失效用于光学用途的合成石英玻璃，热处理方法和热处理装置公开(公告)号：US06578382B2
公开(公告)日：2003-06-17
申请号：US09821352
申请日：2001-03-28
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
IPC分类号： C03C1500
CPC分类号： C03B19/1453 , C03B32/00 , C03B2201/21 , C03C23/007 , Y10S65/08 , Y10S65/90
摘要： A method for heat treating a synthetic quartz glass for optical use in a heating furnace, that comprises covering the surroundings of a synthetic quartz glass body with a SiO2 powder having a mean dissolved hydrogen molecule concentration of 1×1019 molecules/cm3 or higher, and then heat treating the body.
摘要翻译： 一种用于热处理在加热炉中用于光学的合成石英玻璃的方法，其包括用平均溶解氢分子浓度为1×1019分/ cm 3或更高的SiO 2粉末覆盖合成石英玻璃体的周围，然后加热 治疗身体。
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公开(公告)号：US06689705B2
公开(公告)日：2004-02-10
申请号：US10048309
申请日：2002-01-29
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
IPC分类号： C03C306
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.
摘要翻译： 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性 对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。 上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。
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10.发明授权
公开(公告)号：US5790732A
公开(公告)日：1998-08-04
申请号：US774423
申请日：1996-12-30
申请人： Tetsuji Ueda
发明人： Tetsuji Ueda
CPC分类号： G02B6/3835 , G02B6/3854 , G02B6/3869
摘要： An optical connector has a ferrule for accommodating an optical fiber. The ferrule includes a glass capillary and a coating. The glass capillary is formed at the distal end portion of the ferrule and is inserted in a ceramic sleeve that performs optical connection. The glass cylinder has a first through hole at the central axis portion thereof to accommodate a bare optical fiber. The coating is made of a material having a higher hardness than that of the sleeve, and coats an entire outer circumferential surface of the glass capillary. A method of manufacturing an optical connector is also disclosed.
摘要翻译： 光连接器具有用于容纳光纤的套圈。 套圈包括玻璃毛细管和涂层。 玻璃毛细管形成在套圈的远端部分，并插入进行光学连接的陶瓷套筒中。 玻璃圆筒在其中心轴部分具有第一通孔以容纳裸光纤。 该涂层由具有比套筒硬度更高的硬度的材料制成，并且涂覆玻璃毛细管的整个外圆周表面。 还公开了一种制造光连接器的方法。
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