公开(公告)号：US20130001560A1

公开(公告)日：2013-01-03

申请号：US13612146

申请日：2012-09-12

申请人： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

发明人： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

IPC分类号： H01L29/786

CPC分类号： G02B5/201 ,  G03F7/0007 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3281 ,  H01L27/3295 ,  H01L29/66757 ,  H01L29/66765 ,  H01L51/56

摘要： The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.

公开(公告)号：US20090291552A1

公开(公告)日：2009-11-26

申请号：US12537005

申请日：2009-08-06

申请人： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

发明人： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

IPC分类号： H01L21/28 ,  H01L21/288

CPC分类号： G02B5/201 ,  G03F7/0007 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3281 ,  H01L27/3295 ,  H01L29/66757 ,  H01L29/66765 ,  H01L51/56

摘要： The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.

摘要翻译： 本发明通过简单的步骤提供了具有包括绝缘膜，半导体膜，导电膜等的膜图案的基板的制造方法，以及低成本，高生产率的半导体器件的制造方法， 产量。 根据本发明，在形成在基材上具有低润湿性的第一保护膜之后，在第一掩模图案的外边缘上施加或排出具有高润湿性的材料，从而形成膜图案和具有膜图案的基板 形成。

公开(公告)号：US20090148971A1

公开(公告)日：2009-06-11

申请号：US12368318

申请日：2009-02-10

申请人： Gen FUJII ,  Hiroko SHIROGUCHI

发明人： Gen FUJII ,  Hiroko SHIROGUCHI

IPC分类号： H01L51/56 ,  H01L21/20

CPC分类号： H01L29/42384 ,  H01L27/12 ,  H01L27/1292 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/66765

摘要： When forming a contact hole by a conventional manufacturing step of a semiconductor device, a resist is required to be formed on almost entire surface of a substrate so as to be applied on a film other than an area in which a contact hole is to be formed, leading to drastically reduced throughput. According to a forming method of a contact hole and a manufacturing method of a semiconductor device, an EL display device and a liquid crystal display device of the invention, an island shape organic film is selectively formed over a semiconductor layer, a conductive layer or an insulating layer, and an insulating film is formed around the island shape organic film to form a contact hole. Therefore, a conventional patterning using a resist is not required, and high throughput and low cost can be achieved.

摘要翻译： 当通过半导体器件的常规制造步骤形成接触孔时，需要在基板的几乎整个表面上形成抗蚀剂，以便施加在除了要形成接触孔的区域之外的膜上 ，导致吞吐量大幅降低。 根据本发明的接触孔的形成方法和半导体装置的制造方法，EL显示装置和液晶显示装置，在半导体层，导电层或导电层上选择性地形成岛状有机膜 绝缘层，并且在岛状有机膜周围形成绝缘膜以形成接触孔。 因此，不需要使用抗蚀剂的常规图案，可以实现高生产率和低成本。

公开(公告)号：US20090075476A1

公开(公告)日：2009-03-19

申请号：US12268039

申请日：2008-11-10

申请人： Gen FUJII ,  Masafumi MORISUE ,  Hironobu SHOJI ,  Junya MARUYAMA ,  Kouji DAIRIKI ,  Tomoyuki AOKI

发明人： Gen FUJII ,  Masafumi MORISUE ,  Hironobu SHOJI ,  Junya MARUYAMA ,  Kouji DAIRIKI ,  Tomoyuki AOKI

IPC分类号： H01L21/44

CPC分类号： H01L27/12 ,  H01L23/48 ,  H01L23/5227 ,  H01L24/11 ,  H01L27/0629 ,  H01L27/1266 ,  H01L27/1292 ,  H01L27/13 ,  H01L28/10 ,  H01L29/78621 ,  H01L2224/0554 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2924/00014 ,  H01L2924/07811 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15788 ,  H01L2924/3011 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： The manufacturing method of a substrate having a conductive layer has the steps of: forming an inorganic insulating layer over a substrate; forming an organic resin layer with a desired shape over the inorganic insulating layer; forming a low wettability layer with respect to a composition containing conductive particles on a first exposed portion of the inorganic insulating layer; removing the organic resin layer; and coating a second exposed portion of the inorganic insulating layer with a composition containing conductive particles and baking, thereby forming a conductive layer.

摘要翻译： 具有导电层的基板的制造方法具有以下步骤：在基板上形成无机绝缘层; 在无机绝缘层上形成具有所需形状的有机树脂层; 在无机绝缘层的第一暴露部分上相对于含有导电颗粒的组合物形成低润湿性层; 去除有机树脂层; 并用含有导电颗粒的组合物涂覆无机绝缘层的第二暴露部分并进行烘烤，由此形成导电层。

公开(公告)号：US20120182598A1

公开(公告)日：2012-07-19

申请号：US13431073

申请日：2012-03-27

申请人： Masafumi MORISUE ,  Yasuhiro JINBO ,  Gen FUJII ,  Hajime KIMURA

发明人： Masafumi MORISUE ,  Yasuhiro JINBO ,  Gen FUJII ,  Hajime KIMURA

IPC分类号： G02F1/167

CPC分类号： H01L27/1266 ,  G02F1/133305 ,  G02F1/133345 ,  G02F1/133711 ,  G02F1/133734 ,  G02F1/133784 ,  G02F1/13394 ,  G02F1/167 ,  H01L27/1214 ,  H01L27/1218 ,  H01L27/3244 ,  H01L27/3272 ,  H01L29/78603 ,  H01L29/78633 ,  H01L31/0392 ,  H01L31/03925 ,  H01L31/03926 ,  H01L31/1896 ,  H01L51/003 ,  H01L51/56 ,  H01L2227/326 ,  H01L2251/5338 ,  Y02E10/549 ,  Y02P70/521

摘要： A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.

摘要翻译： 一种制造半导体器件的方法包括：在具有透光性的基板上形成光催化层和与光催化层接触的有机化合物层; 在所述光催化层和所述有机化合物层之间与所述光催化层接触的具有透光性的基板上形成元件形成层; 并且在通过具有透光性的基板用光照射光催化层之后，将元件形成层与具有透光性的基板分离。

公开(公告)号：US20070190675A1

公开(公告)日：2007-08-16

申请号：US11671742

申请日：2007-02-06

申请人： Shunpei YAMAZAKI ,  Shinobu FURUKAWA ,  Masafumi MORISUE ,  Gen FUJII

发明人： Shunpei YAMAZAKI ,  Shinobu FURUKAWA ,  Masafumi MORISUE ,  Gen FUJII

IPC分类号： H01L21/00

CPC分类号： H01J9/2275 ,  G09G3/30 ,  G09G2300/0426

摘要： A highly functional and reliable display device with lower power consumption and higher light-emitting efficiency is provided. A light-emitting material is irradiated with light; the light-emitting material irradiated with light is dispersed in a solution containing a binder, and a solution containing the light-emitting material irradiated with light and the binder is formed; a first electrode layer is formed; the solution is applied on the first electrode layer, and a light-emitting layer containing the light-emitting material irradiated with light and the binder is formed; and a second electrode layer is formed over the light-emitting layer, and a light-emitting element is manufactured. An insulating layer may be provided between the first electrode layer and the light-emitting layer or between the second electrode layer and the light-emitting layer.

摘要翻译： 提供了具有较低功耗和较高发光效率的高功能可靠的显示装置。 用光照射发光材料; 用光照射的发光材料分散在含有粘合剂的溶液中，形成含有照射光的发光材料和粘合剂的溶液; 形成第一电极层; 将溶液施加在第一电极层上，形成含有照射光的发光材料和粘合剂的发光层; 并且在发光层上形成第二电极层，并且制造发光元件。 可以在第一电极层和发光层之间或第二电极层和发光层之间设置绝缘层。

公开(公告)号：US20110165741A1

公开(公告)日：2011-07-07

申请号：US13050117

申请日：2011-03-17

申请人： Shunpei YAMAZAKI ,  Osamu NAKAMURA ,  Shinji MAEKAWA ,  Gen FUJII ,  Toshiyuki ISA

发明人： Shunpei YAMAZAKI ,  Osamu NAKAMURA ,  Shinji MAEKAWA ,  Gen FUJII ,  Toshiyuki ISA

IPC分类号： H01L21/336

CPC分类号： H01L51/0022 ,  G09G3/3208 ,  G09G3/3225 ,  G09G2300/0842 ,  G09G2300/0861 ,  G09G2310/0251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3244 ,  H01L51/055 ,  H01L51/529

摘要： The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.

摘要翻译： 本发明提供一种显示装置及其制造方法，其通过有效地增加材料以及简化步骤来制造。 此外，本发明提供了一种用于形成用于形成显示装置的布线等图案以具有优异的可控性的预定形状的技术。 制造显示装置的方法包括以下步骤：形成疏液区域; 选择性地将激光束照射在疏液区域以形成亲液性区域; 选择性地将含有导电材料的组合物在亲液区域中排出以形成栅极电极层; 在栅电极层上形成栅极绝缘层和半导体层; 在半导体层上排出含有导电材料的组合物，以形成源电极层和漏电极层; 以及在源极或漏极电极层上形成像素电极层。

公开(公告)号：US20100311197A1

公开(公告)日：2010-12-09

申请号：US12857809

申请日：2010-08-17

申请人： Shunpei YAMAZAKI ,  Shinji MAEKAWA ,  Gen FUJII ,  Hideaki KUWABARA

发明人： Shunpei YAMAZAKI ,  Shinji MAEKAWA ,  Gen FUJII ,  Hideaki KUWABARA

IPC分类号： H01L21/336 ,  H01L33/00

CPC分类号： G02F1/13458 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/13415 ,  G02F2001/136295 ,  H01L27/1292

摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.

摘要翻译： 由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。 在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。 此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或 电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。

公开(公告)号：US20100221870A1

公开(公告)日：2010-09-02

申请号：US12776870

申请日：2010-05-10

申请人： Shinji MAEKAWA ,  Gen FUJII ,  Junya MARUYAMA ,  Toru TAKAYAMA ,  Yumiko FUKUMOTO ,  Yasuyuki ARAI

发明人： Shinji MAEKAWA ,  Gen FUJII ,  Junya MARUYAMA ,  Toru TAKAYAMA ,  Yumiko FUKUMOTO ,  Yasuyuki ARAI

IPC分类号： H01L21/50

CPC分类号： G06K19/07749 ,  H01L27/12 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/13 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/78684

摘要： An IC card is more expensive than a magnetic card, and an electronic tag is also more expensive as a substitute for bar codes. Therefore, the present invention provides an extremely thin integrated circuit that can be mass-produced at low cost unlike a chip of a conventional silicon wafer, and a manufacturing method thereof. One feature of the present invention is that a thin integrated circuit is formed by a formation method that can form a pattern selectively, on a glass substrate, a quartz substrate, a stainless substrate, a substrate made of synthetic resin having flexibility, such as acryl, or the like except for a bulk substrate. Further, another feature of the present invention is that an ID chip in which a thin film integrated circuit and an antenna according to the present invention are mounted is formed.

摘要翻译： IC卡比磁卡贵，电子标签也更昂贵代替条形码。 因此，本发明提供了与常规硅晶片的芯片相比可以以低成本批量生产的极薄的集成电路及其制造方法。 本发明的一个特征在于，通过可以在玻璃基板，石英基板，不锈钢基板，具有柔软性的合成树脂制成的基板（例如丙烯酸酯）上形成图案的形成方法形成薄的集成电路 ，或类似物，除了大量衬底。 此外，本发明的另一个特征是形成其中安装有根据本发明的薄膜集成电路和天线的ID芯片。

公开(公告)号：US20080012076A1

公开(公告)日：2008-01-17

申请号：US11857729

申请日：2007-09-19

申请人： Shunpei YAMAZAKI ,  Osamu NAKAMURA ,  Shinji MAEKAWA ,  Gen FUJII ,  Toshiyuki ISA

发明人： Shunpei YAMAZAKI ,  Osamu NAKAMURA ,  Shinji MAEKAWA ,  Gen FUJII ,  Toshiyuki ISA

IPC分类号： H01L29/786 ,  G03B13/00

CPC分类号： H01L51/0022 ,  G09G3/3208 ,  G09G3/3225 ,  G09G2300/0842 ,  G09G2300/0861 ,  G09G2310/0251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3244 ,  H01L51/055 ,  H01L51/529

摘要： The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.

摘要翻译： 本发明提供一种显示装置及其制造方法，其通过有效地增加材料以及简化步骤来制造。 此外，本发明提供了一种用于形成用于形成显示装置的布线等图案以具有优异的可控性的预定形状的技术。 制造显示装置的方法包括以下步骤：形成疏液区域; 选择性地将激光束照射在疏液区域以形成亲液性区域; 选择性地将含有导电材料的组合物在亲液区域中排出以形成栅极电极层; 在栅电极层上形成栅极绝缘层和半导体层; 在半导体层上排出含有导电材料的组合物，以形成源电极层和漏电极层; 以及在源极或漏极电极层上形成像素电极层。