公开(公告)号：US06087614A

公开(公告)日：2000-07-11

申请号：US101668

申请日：1998-10-29

申请人： Shuichi Ishizuka ,  Risa Nakase ,  Takeshi Aoki

发明人： Shuichi Ishizuka ,  Risa Nakase ,  Takeshi Aoki

IPC分类号： H01L21/31 ,  H01J37/32 ,  B23K9/00

CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32284

摘要： The invention is intended to produce a plasma of uniform density in a wide region and to achieve plasma processing of a surface of a wafer (W) highly uniformly. A transmission window (23) which transmits a microwave is held on an upper wall of a vacuum vessel (2) having a plasma chamber (21) and a film forming chamber (22), and a waveguide (4) for guiding the microwave of 2.45 GHz for propagation into the vacuum vessel (2) in a TM mode is joined to the outer surface of the transmission window (23). The waveguide (4) has a rectangular waveguide section (41) a cylindrical waveguide section (42) serving as a TM converter, and a conical waveguide section (43) having an exit end connected to the outer surface of the transmission window (23). The microwave is propagated in a TM mode into the vacuum vessel (2) and a magnetic field is created in the vacuum vessel (2). A plasma can be formed in uniform density in the plasma chamber (21) if the inside diameter (A) of the exit end of the conical waveguide section is in the range of 130 to 160 mm, so that the highly uniform plasma processing of the surface of a wafer (W) of, for example, 8 in. in diameter can be achieved.

摘要翻译： PCT No.PCT / JP97 / 04225 Sec。 371日期：1998年10月29日第 102（e）日期1998年10月29日PCT 1997年11月20日PCT公布。 公开号WO98 / 22977 日期1998年5月28日本发明旨在产生在宽范围内具有均匀密度的等离子体，并且能够高度均匀地实现晶片表面（W）的等离子体处理。 透射微波的透射窗（23）保持在具有等离子体室（21）和成膜室（22）的真空容器（2）的上壁上，以及用于引导微波的波导 以TM模式传播到真空容器（2）中的2.45GHz接合到透射窗（23）的外表面。 波导管（4）具有矩形波导部分（41），用作TM转换器的圆柱形波导部分（42）和具有连接到透射窗（23）的外表面的出射端的锥形波导部分（43） 。 微波以TM模式传播到真空容器（2）中，并且在真空容器（2）中产生磁场。 如果锥形波导部分的出口端的内径（A）在130至160mm的范围内，则可以在等离子体室（21）中以均匀的密度形成等离子体，使得高度均匀的等离子体处理 可以实现例如8英寸直径的晶片（W）的表面。

公开(公告)号：US06355902B2

公开(公告)日：2002-03-12

申请号：US09750683

申请日：2001-01-02

申请人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： B23K1000

CPC分类号： H01L21/0212 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801 ,  H01L21/7682 ,  H01L21/76837

摘要： Microwave is introduced into a plasma chamber of a plasma processing apparatus and magnetic field is applied thereto to allow plasma generation gas to be placed in plasma state by the electron cyclotron resonance. This plasma is introduced into a film forming chamber of the plasma processing apparatus to allow film forming gas including compound gas of carbon and fluorine or compound gas of carbon, fluorine and hydrogen, and hydro carbon gas to be placed in plasma state. In addition, an insulating film consisting of fluorine added carbon film is formed by the film forming gas placed in plasma state.

摘要翻译： 将微波引入到等离子体处理装置的等离子体室中，并施加磁场以使等离子体产生气体通过电子回旋共振被置于等离子体状态。 该等离子体被引入到等离子体处理装置的成膜室中，以允许包括碳和氟的复合气体或碳，氟和氢的复合气体以及碳氢气体的成膜气体处于等离子体状态。 此外，通过以等离子体状态放置的成膜气体形成由氟添加碳膜构成的绝缘膜。

公开(公告)号：US06215087B1

公开(公告)日：2001-04-10

申请号：US09101516

申请日：1998-07-10

申请人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Masaki Tozawa ,  Yoko Naito ,  Risa Nakase ,  Osamu Yokoyama ,  Shuichi Ishizuka ,  Shunichi Endo ,  Masahide Saito ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： B23K1000

CPC分类号： H01L21/0212 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801 ,  H01L21/7682 ,  H01L21/76837

摘要： Microwave is introduced into a plasma chamber of a plasma processing apparatus and magnetic field is applied thereto to allow plasma generation gas to be placed in plasma state by the electron cyclotron resonance. This plasma is introduced into a film forming chamber of the plasma processing apparatus to allow film forming gas including compound gas of carbon and fluorine or compound gas of carbon, fluorine and hydrogen, and hydro carbon gas to be placed in plasma state. In addition, an insulating film consisting of fluorine added carbon film is formed by the film forming gas placed in plasma state.

摘要翻译： 将微波引入到等离子体处理装置的等离子体室中，并施加磁场以使等离子体产生气体通过电子回旋共振被置于等离子体状态。 该等离子体被引入到等离子体处理装置的成膜室中，以允许包括碳和氟的复合气体或碳，氟和氢的复合气体以及碳氢气体的成膜气体处于等离子体状态。 此外，通过以等离子体状态放置的成膜气体形成由氟添加碳膜构成的绝缘膜。

公开(公告)号：US06770332B2

公开(公告)日：2004-08-03

申请号：US09573412

申请日：2000-05-18

申请人： Risa Nakase ,  Takeshi Aoki ,  Akira Suzuki ,  Yoshihiro Kato

发明人： Risa Nakase ,  Takeshi Aoki ,  Akira Suzuki ,  Yoshihiro Kato

IPC分类号： H05H146

CPC分类号： H01L21/0212 ,  C23C16/26 ,  C23C16/30 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3127 ,  H01L21/76801

摘要： In a case where a CF film is used as an interlayer dielectric file for a semiconductor device, when a wiring of tungsten is formed, the CF film is heated to a temperature of, e g., about 400 to 450° C. At this time, F containing gases are emitted from the CF film, so that there are various disadvantages due to the corrosion of the wiring and the decrease of film thickness. In order to prevent this, it is required to enhance thermostability. A compound gas of C and F, e.g., C4F8 gas, a hydrocarbon gas, e.g., C2H4 gas, and CO gas are used as thin film deposition gases. These gases are activated to deposit a CF film on a semiconductor wafer 10 at a process temperature of 400° C. using active species thereof. Since the number of diamond-like bonds are greater than the number of graphite-like bonds by the addition of CO gas, the bonds are strengthened and difficult to be cut even at a high temperature, so that thermostability is enhanced.

摘要翻译： 在将CF膜用作半导体器件的层间电介质文件的情况下，当形成钨的布线时，将CF膜加热至例如约400〜450℃的温度。在此 时间，从CF膜发射含F气体，由于布线的腐蚀和膜厚度的降低，存在各种缺点。 为了防止这种情况，需要提高热稳定性。使用C和F的复合气体，例如C 4 F 8气体，烃气体例如C 2 H 4气体和CO气体作为薄膜沉积气体。 这些气体被激活，以使其活性物质在400℃的处理温度下在半导体晶片10上沉积CF膜。 由于通过添加CO气体，类金刚石键的数量大于石墨状键的数量，所以即使在高温下也会使键强化，难以切断，从而提高热稳定性。

公开(公告)号：US06727182B2

公开(公告)日：2004-04-27

申请号：US09101308

申请日：1998-10-15

申请人： Takashi Akahori ,  Shuichi Ishizuka ,  Shunichi Endo ,  Takeshi Aoki ,  Tadashi Hirata

发明人： Takashi Akahori ,  Shuichi Ishizuka ,  Shunichi Endo ,  Takeshi Aoki ,  Tadashi Hirata

IPC分类号： H01L21302

CPC分类号： H01L21/31144 ,  H01L21/31138 ,  H01L21/76802 ,  H01L23/5226 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： It is an object of the present invention to provide a process for a fluorine containing carbon film (a CF film), which can put an interlayer insulator film of a fluorine containing carbon film into practice. A conductive film, e.g., a TiN film 41, is formed on a CF film 4. After a pattern of a resist film 42 is formed thereon, the TiN film 41 is etched with, e.g., BCl3 gas. Thereafter, when the surface of the wafer is irradiated with O2 plasma, the CF film is chemically etched, and the resist film 42 is also etched. However, since the TiN film 41 functions as a mask, a predetermined hole can be formed. Although an interconnection layer of aluminum or the like is formed on the surface of the CF film 4, the TiN film 41 functions as an adhesion layer for adhering the interconnection layer to the CF film 4 and serves as a part of the interconnection layer. As the mask, an insulator film of SiO2 or the like may be substituted for the film.

摘要翻译： 本发明的目的是提供一种可以将含氟碳膜的层间绝缘膜实际应用的含氟碳膜（CF膜）的方法。 在CF膜4上形成例如TiN膜41的导电膜。在其上形成抗蚀剂膜42的图案之后，用例如BCl 3气体蚀刻TiN膜41。 此后，当用O 2等离子体照射晶片的表面时，对CF膜进行化学蚀刻，并且还蚀刻抗蚀剂膜42。 然而，由于TiN膜41用作掩模，因此可以形成预定的孔。 尽管在CF膜4的表面上形成了铝等的互连层，但是TiN膜41用作将互连层粘附到CF膜4并用作互连层的一部分的粘附层。 作为掩模，可以用SiO 2等的绝缘膜代替膜。

公开(公告)号：US09348165B2

公开(公告)日：2016-05-24

申请号：US13085259

申请日：2011-04-12

申请人： Yoshiyuki Kurokawa ,  Takayuki Ikeda ,  Takeshi Aoki

发明人： Yoshiyuki Kurokawa ,  Takayuki Ikeda ,  Takeshi Aoki

IPC分类号： G02F1/1333 ,  G09G3/36 ,  G06F3/041 ,  G06F3/042 ,  G02F1/133 ,  G02F1/1334

CPC分类号： G02F1/13338 ,  G02F1/13318 ,  G02F1/1334 ,  G02F2001/13312 ,  G02F2001/133391 ,  G06F3/0412 ,  G06F3/042 ,  G09G3/3648 ,  G09G2360/142 ,  G09G2380/14

摘要： It is an object to provide a display device exhibiting high visibility and having a touch recognition function. The display device includes a display portion and a sensor portion. The display portion includes a first liquid crystal element including a polymer-scattered liquid crystal. The sensor portion includes a light-receiving element and a second liquid crystal element including a polymer-dispersed liquid crystal provided over the light-receiving element. The first liquid crystal element and the second liquid crystal element are driven independently from each other. The light-receiving element receives light transmitting through the second liquid crystal element.

摘要翻译： 本发明的目的是提供具有高可见度并具有触摸识别功能的显示装置。 显示装置包括显示部分和传感器部分。 显示部分包括包含聚合物散射液晶的第一液晶元件。 传感器部分包括光接收元件和设置在光接收元件上的聚合物分散液晶的第二液晶元件。 第一液晶元件和第二液晶元件彼此独立地驱动。 光接收元件接收透过第二液晶元件的光。

公开(公告)号：US08416475B2

公开(公告)日：2013-04-09

申请号：US12914496

申请日：2010-10-28

申请人： Takeshi Aoki ,  Ryo Honma

发明人： Takeshi Aoki ,  Ryo Honma

IPC分类号： H04N1/04 ,  B41J15/00 ,  B41J11/00 ,  B41J13/00 ,  B41J13/08

CPC分类号： B41J13/0045 ,  B41J3/60 ,  B65H5/26 ,  B65H2301/33312 ,  B65H2403/421 ,  B65H2403/422 ,  B65H2403/481 ,  B65H2801/06 ,  H04N1/00572 ,  H04N1/00578 ,  H04N1/0058 ,  H04N1/00602 ,  H04N1/00702 ,  H04N1/00732 ,  H04N1/00745 ,  H04N1/12 ,  H04N1/1235 ,  H04N1/193 ,  H04N2201/0081

摘要： In a state where a second power transmission path of transmitting power from the second planetary gear to the cam driving gear through the intermediate gear is selected, when the intermediate gear is opposed to the non-tooth portion for the release position of the cam driving gear, the rotation direction of the driving motor is changed to select a first power transmission path of directly transmitting power from the first planetary gear to the cam driving gear, the non-tooth portion for the release position deviates from the opposed position of the intermediate gear, and the rotation direction of the driving motor is changed again to select the second power transmission path.

摘要翻译： 在选择从第二行星齿轮传递动力到凸轮驱动齿轮的第二动力传递路径的状态下，当中间齿轮与用于凸轮驱动齿轮的释放位置的非齿部相对时 改变驱动电机的旋转方向，选择从第一行星齿轮直接传递动力到凸轮驱动齿轮的第一动力传递路径，用于释放位置的非齿部分偏离中间齿轮的相对位置 并且再次改变驱动电动机的旋转方向以选择第二动力传递路径。

公开(公告)号：US08339076B2

公开(公告)日：2012-12-25

申请号：US12662882

申请日：2010-05-10

申请人： Takeshi Aoki ,  Subrata Saha

发明人： Takeshi Aoki ,  Subrata Saha

IPC分类号： H02P6/16

CPC分类号： H02P6/16 ,  G01D5/24452 ,  H02P6/15

摘要： An electric motor drive control apparatus includes a detection angle obtaining section that obtains the detection angle of the resolver; a correction information storage section that stores correction information for correcting the detection angle, in association with a modulation ratio that is a ratio of an effective value of a fundamental wave component of the AC voltage to the system voltage; and a detection angle correcting section that obtains the correction information from the correction information storage section, based on the modulation ratio at the time the detection angle obtaining section obtains the detection.

摘要翻译： 一种电动机驱动控制装置，包括获取旋转变压器的检测角度的检测角取得部， 校正信息存储部分，其与作为交流电压的基波分量的有效值与系统电压的比率的调制比相关联地存储用于校正检测角度的校正信息; 以及检测角度校正部，其基于检测角度获取部获取检测时的调制率，从校正信息存储部获取校正信息。

公开(公告)号：US08208352B2

公开(公告)日：2012-06-26

申请号：US12625477

申请日：2009-11-24

申请人： Takeshi Aoki ,  Takashi Miyamoto

发明人： Takeshi Aoki ,  Takashi Miyamoto

IPC分类号： G11B7/00

CPC分类号： G11B7/08582

摘要： An optical disc apparatus comprising: a spindle motor configured to drive a turntable on which an optical disc is loaded to rotate; a first substrate on which a first support member rotatably supporting a rotation shaft of the spindle motor is fixed, and on which a second support member is formed at a position adjacent to the spindle motor; a second substrate; an optical pickup device; and a guide member configured to guide the optical pickup device in a radial direction of the optical disc loaded on the turntable, one end of the guide member being supported by the second support member on the first substrate and fixed to a fixing member on the second substrate, and the other end of the guide member being fixed to the fixing member on the second substrate.

摘要翻译： 一种光盘装置，包括：主轴电动机，被配置为驱动其上装载有光盘的转盘; 第一基板，固定有可旋转地支撑所述主轴电动机的旋转轴的第一支撑构件，并且在与所述主轴电动机相邻的位置处形成有第二支撑构件; 第二基板; 光拾取装置; 以及引导构件，其构造成沿着装载在所述转台上的光盘的径向方向引导所述光学拾取装置，所述引导构件的一端由所述第二支撑构件支撑在所述第一基板上，并且固定到所述第二基板上的固定构件 基板，并且引导构件的另一端固定到第二基板上的固定构件。

公开(公告)号：US08117959B2

公开(公告)日：2012-02-21

申请号：US11694696

申请日：2007-03-30

申请人： Tomohiro Wakita ,  Mitsuyo Ishikawa ,  Jun Kondo ,  Takeshi Aoki ,  Shinichi Sato ,  Shinsuke Asou ,  Masashi Oda ,  Kazushige Murao

发明人： Tomohiro Wakita ,  Mitsuyo Ishikawa ,  Jun Kondo ,  Takeshi Aoki ,  Shinichi Sato ,  Shinsuke Asou ,  Masashi Oda ,  Kazushige Murao

IPC分类号： F04B1/12

CPC分类号： F04B27/1018

摘要： A swash plate includes a boss, which is mounted on the drive shaft, and a plate portion, which extends from the boss to be inclined with respect to the drive shaft. A rotary valve includes a suction passage, which sequentially connects cylinder bores in a suction stroke via an associated guide passage. An introduction guide communicates with the shaft bore to introduce the refrigerant gas in the swash plate chamber to the rotary valve. The introduction guide faces the boss and extends in the radial direction from the shaft bore beyond the boss. Therefore, suction efficiency of refrigerant gas from the swash plate chamber to the cylinder bore has improved.

摘要翻译： 旋转斜盘包括安装在驱动轴上的凸台和从凸台延伸以相对于驱动轴倾斜的板部。 旋转阀包括抽吸通道，该抽吸通道经由相关联的引导通道在吸入行程中依次连接气缸孔。 引导引导件与轴孔连通，以将旋转斜盘室中的制冷剂气体引入旋转阀。 引导引导件面向凸台并且在径向方向上从轴孔延伸超过凸台。 因此，从斜盘室到气缸孔的制冷剂气体的吸入效率提高。