公开(公告)号：US20110069298A1

公开(公告)日：2011-03-24

申请号：US12886965

申请日：2010-09-21

申请人： Sjoerd Nicolaas Lambertus DONDERS ,  Noud Jan Gilissen

发明人： Sjoerd Nicolaas Lambertus DONDERS ,  Noud Jan Gilissen

IPC分类号： G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/7095

摘要： A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm3, preferably between 1 and 100 mg/cm3 and most preferably between 1 and 10 mg/cm3. The aerogel may be made from a silica gel. The aerogel made from silica gel may have a density of 1.9 mg/cm3 and if the air out of the aerogel is evacuated even 1 mg/cm3.

摘要翻译： 衬底台或图案形成装置支架包括气凝胶。 气凝胶可以非常轻的重量，例如气凝胶的密度可以在0.5-500mg / cm3之间，优选在1-10mg / cm3之间，最优选在1-10mg / cm3之间。 气凝胶可以由硅胶制成。 由硅胶制成的气凝胶的密度可以为1.9mg / cm 3，如果气凝胶中的空气甚至排出1mg / cm3。

公开(公告)号：US20130135595A1

公开(公告)日：2013-05-30

申请号：US13685410

申请日：2012-11-26

申请人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US20120013870A1

公开(公告)日：2012-01-19

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

发明人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US20120008119A1

公开(公告)日：2012-01-12

申请号：US13242401

申请日：2011-09-23

申请人： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Jahannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

发明人： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Jahannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US20110183257A1

公开(公告)日：2011-07-28

申请号：US13083327

申请日：2011-04-08

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20110025995A1

公开(公告)日：2011-02-03

申请号：US12904617

申请日：2010-10-14

申请人： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER

发明人： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.

摘要翻译： 在基板保持器和边缘结构之间形成毛细通道。 沿着毛细通道布置有多个电极，当被带电时，它们变成液晶。 电极可用于分离液体液滴并沿着毛细通道泵送液体。

公开(公告)号：US20160282727A1

公开(公告)日：2016-09-29

申请号：US15178522

申请日：2016-06-09

申请人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

发明人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US20120013871A1

公开(公告)日：2012-01-19

申请号：US13240946

申请日：2011-09-22

申请人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Michel RIEPEN

发明人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Michel RIEPEN

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20110116061A1

公开(公告)日：2011-05-19

申请号：US13012303

申请日：2011-01-24

申请人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

发明人： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Felix Godfried Peter PEETERS ,  Bob STREEFKERK ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Helmar VAN SANTEN

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

公开(公告)号：US20110025994A1

公开(公告)日：2011-02-03

申请号：US12901939

申请日：2010-10-11

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

摘要： A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

摘要翻译： 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。