摘要:
One embodiment of the invention includes a memory system. The system comprises a memory cell coupled to a bit-line node. The memory cell can be configured to generate a bit-line current on the bit-line node in response to a bias voltage during a read operation. The system further comprises a sense amplifier configured to maintain a substantially constant voltage magnitude of the bit-line node during a pre-charge phase and a sense phase of the read operation based on regulating current flow to and from the bit-line node, and to determine a memory value of the flash memory transistor during the read operation based on a magnitude of the bit-line current on the bit-line node.
摘要:
One embodiment of the invention includes a memory system. The system comprises a memory cell coupled to a bit-line node. The memory cell can be configured to generate a bit-line current on the bit-line node in response to a bias voltage during a read operation. The system further comprises a sense amplifier configured to maintain a substantially constant voltage magnitude of the bit-line node during a pre-charge phase and a sense phase of the read operation based on regulating current flow to and from the bit-line node, and to determine a memory value of the flash memory transistor during the read operation based on a magnitude of the bit-line current on the bit-line node.
摘要:
Methods are described for operating a FeRAM and other such memory devices in a manner that avoids over-voltage breakdown of the gate oxide in memory cells along dummy bit lines used at the edges of memory arrays, the methods comprising floating the dummy bit line during plate line pulsing activity. In one implementation of the present invention the method is applied to a FeRAM dummy cell having a plate line, a dummy bit line, a pass transistor, and a ferroelectric storage capacitor. The method comprises initially grounding the dummy bit line as a preferred pre-condition, however, this step may be considered an optional step if the storage node of the storage capacitor is otherwise grounded. The method then comprises floating the dummy bit line, activating a word line associated with the memory cell, and pulsing the plate line. Alternately, the method comprises applying a positive voltage bias to the dummy bit line in place of, or before floating the dummy bit line. The method may further optionally comprise grounding the dummy bit line after pulsing the plate line, and optionally disabling the word line after grounding the dummy bit line to precondition the cell for the next memory operation.
摘要:
An FeRAM memory array wherein the plate lines run in the direction of word lines is described that provides a reduced plate line resistance in arrays having a common plate line connection. The lower plate line resistance reduces the magnitude of negative spikes on the plate line to reduce the potential for FeCap depolarization. Two or more plate lines of a plurality of columns of memory cells are interconnected along a bit line direction. Some or all of the plate lines of one or more columns of dummy memory cells may also be interconnected to reduce the plate line resistance and minimize any increase in the bit line capacitance for the active cells of the array. The improved FeRAM array provides a reduced data error rate, particularly at fast memory cycle times.
摘要:
In a multi-sector nonvolatile memory array in which each memory cell has a drain coupled to a bitline, each memory cell of each sector has a source coupled to a common array-source line, each memory cell in a row of the first sector has a control gate coupled to a wordline and each memory cell of a row in another sector has a control gate coupled to that wordline, a method for programming a memory cell in one sector of said method includes connecting at least the second common array-source line to each bitline coupled to drains of columns of memory cells in the another sector, then biasing at a positive voltage both the common array-source line and the bitlines coupled to drains of memory cells in columns of the another sector, and then applying a programming voltage to the selected wordline coupled to the control gate of the selected cell in the first sector. An erasing method includes connecting the wordlines to a reference voltage, connecting at least one deselected common array-source line to each bitline coupled to drains of columns of memory cells in the deselected sector, then biasing at a positive voltage both the deselected common array-source line and said bitlines coupled to drains of memory cells in columns of the deselected sector, and then applying a positive erasing voltage to said common array-source line of the selected sector.
摘要:
A circuit for applying reading, programming and erasing voltages to a wordline in a floating-gate-type EEPROM cell array comprising a positive voltage switching circuit, a first isolating transistor, and a second isolating transistor. The positive voltage switching circuit may include an inverter with feedback transistor and a third isolating transistor. In one embodiment, the positive voltage switching circuit is capable of switching up to three positive voltage values and reference voltage to the wordline terminal.
摘要:
A method is described for programming an array of EEPROM cells. Programming occurs through a Fowler-Nordheim tunnel window (34) between a source bitline (24) and a floating gate conductor (42) of a selected cell. The voltages applied to the control gate and to the source are selected to differ sufficiently to cause electrons to be drawn through the tunnel window (34) from the source region (24) to the floating gate conductor (42). The non-selected bitlines have a voltage impressed thereon that is of sufficient value to prevent inadvertent programming of cells in the selected row. The non-selected wordlines (48) have a voltage impressed thereon that is of sufficient value to prevent erasing of programmed non-selected cells.
摘要:
An electrically-erasable, electrically-programmable, read-only memory cell array is formed in pairs at a face of a semiconductor substrate (11). Each memory cell includes a source region (14a) and a shaped drain region (16), with at corresponding channel region (18a) in between. A Fowler-Nordheim tunnel window subregion (15a) of the source region (14a) is located opposite the channel (18a). A floating gate conductor (FG) includes a channel section (32a) and a tunnel window section (34a). The floating gate conductor is formed in two stages, the first stage forming the channel section (32a) from a first-level polysilicon (P1A). This floating gate channel section (32a/P1A) is used as a self-alignment implant mask for the source (14a) and drain (16) regions, such that the channel junction edges are aligned with the coresponding edges of the channel section. A control gate conductor (CG) is disposed over the floating gate conductor (FG), insulated by an intervening interlevel dielectric (ILD). The memory cell is programmed by hot carrier injection from the channel (18a) to the floating-gate channel section (32a), and erased by Fowler-Nordheim tunneling from the floating-gate tunnel window section (34a) to the tunnel window subregion (15a).
摘要:
An electrically-erasable, electrically-programmable, read-only memory cell array is formed in pairs at a face of a semiconductor substrate (11). Each memory cell includes a source region (14a) and a shared drain region (16), with a corresponding channel region (18a) in between. A Fowler-Nordheim tunnel window subregion (15a) of the source region (14a) is located opposite the channel (18a). A floating gate conductor (FG) includes a channel section (32a) and a tunnel window section (34a). The floating gate conductor is formed in two stages, the first stage forming the channel section (32a) from a first-level polysilicon (PlA). This floating gate channel section (32a/PlA) is used as a self-alignment implant mask for the source (14a) and drain (16) regions, such that the channel junction edges are aligned with the corresponding edges of the channel section. A control gate conductor (CG) is disposed over the floating gate conductor (FG), insulated by an intervening interlevel dielectric (ILD). The memory cell is programmed by hot carrier injection from the channel (18a) to the floating-gate channel section (32a), and erased by Fowler-Nordheim tunneling from the floating-gate tunnel window section (34a) to the tunnel window subregion (15a).
摘要:
One aspect of the invention relates to a method for accessing a memory device. One embodiment relates to a method for accessing a memory device. In the method during a read operation, one data value is provided on a local IO line while complimentary local IO line that is associated with the local IO line is inactivated. During a write operation, another data value is provided on the local IO line and a complimentary data value is provided on the complimentary local IO line. Other systems and methods are also disclosed.