公开(公告)号：US08481960B2

公开(公告)日：2013-07-09

申请号：US13167399

申请日：2011-06-23

申请人： Svetlana Radovanov ,  Jason Schaller ,  Richard White ,  Kevin Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric Hermanson ,  Kevin Daniels

发明人： Svetlana Radovanov ,  Jason Schaller ,  Richard White ,  Kevin Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric Hermanson ,  Kevin Daniels

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC分类号： H01J37/12 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/032 ,  H01J2237/0475

摘要： A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.

摘要翻译： 公开了用于控制离子束的系统和方法。 公开了用于离子注入机的减速透镜。 透镜可以包括抑制电极，第一和第二聚焦电极以及第一和第二屏蔽。 屏蔽件可以位于抑制电极的上部和下部之间。 第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。 如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面不会沉积从所述离子束产生的回流颗粒。 在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。 通过调整聚焦电极的角度，可以控制离子束的平行度。 描述和要求保护其他实施例。

公开(公告)号：US20120001087A1

公开(公告)日：2012-01-05

申请号：US13167399

申请日：2011-06-23

申请人： Svetlana Radovanov ,  Jason Schaller ,  Richard M. White ,  Kevin R. Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric d. Hermanson ,  Kevin Daniels

发明人： Svetlana Radovanov ,  Jason Schaller ,  Richard M. White ,  Kevin R. Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric d. Hermanson ,  Kevin Daniels

IPC分类号： H01J3/14

CPC分类号： H01J37/12 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/032 ,  H01J2237/0475

摘要： A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.

摘要翻译： 公开了用于控制离子束的系统和方法。 公开了用于离子注入机的减速透镜。 透镜可以包括抑制电极，第一和第二聚焦电极以及第一和第二屏蔽。 屏蔽件可以位于抑制电极的上部和下部之间。 第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。 如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面不会沉积从所述离子束产生的回流颗粒。 在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。 通过调整聚焦电极的角度，可以控制离子束的平行度。 描述和要求保护其他实施例。

公开(公告)号：US20130108406A1

公开(公告)日：2013-05-02

申请号：US13470809

申请日：2012-05-14

申请人： Jason Schaller ,  Robert Vopat ,  Charles T. Carlson ,  Malcolm N. Daniel, JR. ,  Aaron Webb ,  William T. Weaver

发明人： Jason Schaller ,  Robert Vopat ,  Charles T. Carlson ,  Malcolm N. Daniel, JR. ,  Aaron Webb ,  William T. Weaver

IPC分类号： B66C17/00 ,  B66C1/42 ,  B66C1/02

CPC分类号： B65G49/00 ,  B65G47/918 ,  B65G49/061 ,  B65G2203/041 ,  H01L21/67213 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67754

摘要： A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.

摘要翻译： 公开了一种用于接收未加工的工件，移动它们，将它们定向并将它们放置在装载锁中或其它端点的系统和方法。 该系统包括用于将工件从传送系统移动到交换模块的台架模块。 交换模块用于从加载锁移除已处理工件的载体或矩阵，并将未加工工件的矩阵载体放置在其位置。 然后将经处理的工件通过台架模块移回到输送机。 台架模块可以具有X，Y，Z和旋转致动器，并且包括具有多个夹具的末端执行器。 还公开了一种使末端执行器上的多个工件对齐的方法，以便可以同时传送多个工件。

公开(公告)号：US09064920B2

公开(公告)日：2015-06-23

申请号：US13555168

申请日：2012-07-22

申请人： Jason Schaller ,  Robert Brent Vopat

发明人： Jason Schaller ,  Robert Brent Vopat

IPC分类号： H05F3/02 ,  B65G49/06 ,  H01L21/677 ,  B25J15/06

CPC分类号： H01L21/67706 ,  B25J11/0095 ,  B25J15/0616 ,  B65G49/06 ,  B65G2207/10 ,  B65G2812/16 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/67781 ,  H05F3/02

摘要： A manufacturing system includes a gantry module, having an end effector, for moving workpieces from a conveyor system to a working area, such as a swap module. The swap module removes a matrix of processed workpieces from a load lock and place a matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. Due to the speed of operation, the end effector may build up excessive electrostatic charge. To remove this built up charge, grounded electrically-conductive brushes are strategically positioned so that, as the end effector moves during normal operation, it comes in contact with these brushes. This removes this built up charge on the end effector, without affecting throughput. In another embodiment, the end effector moves over the brushes while the swap module is moving matrix to and from the load lock.

公开(公告)号：US08945308B2

公开(公告)日：2015-02-03

申请号：US13589631

申请日：2012-08-20

申请人： Jason Schaller

发明人： Jason Schaller

IPC分类号： C23C14/34 ,  C23C14/56 ,  H01L21/67 ,  H01L21/677

CPC分类号： C23C14/568 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67742

摘要： The present invention relates to a cluster tool for processing semiconductor substrates. One embodiment of the present invention provides a mainframe for a cluster tool comprising a transfer chamber having a substrate transferring robot disposed therein. The substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber. The mainframe further comprises a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber.

摘要翻译： 本发明涉及一种用于处理半导体衬底的簇工具。 本发明的一个实施例提供了一种用于集群工具的主机，其包括具有设置在其中的基板传送机器人的传送室。 基板传送机器人构造成在直接或间接连接到传送室的一个或多个处理室之间穿梭基板。 主机还包括快门盘架，其被配置为存储要由一个或多个处理室使用的一个或多个快门盘，其中快门盘架可接近基板传送机器人，使得基板传送机器人可以传送一个或多个 快门盘架与直接或间接连接到传送室的一个或多个处理室之间的更多快门盘。

公开(公告)号：US20100089315A1

公开(公告)日：2010-04-15

申请号：US12563531

申请日：2009-09-21

申请人： Karl M. Brown ,  Jason Schaller

发明人： Karl M. Brown ,  Jason Schaller

IPC分类号： B05C11/00

CPC分类号： H01L21/68785 ,  C23C14/50 ,  H01J37/32477 ,  H01L21/67069 ,  H01L21/6719 ,  H01L21/68707

摘要： A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.

摘要翻译： 提供了适用于在物理气相沉积室中屏蔽衬底支架的快门盘。 在一个实施例中，快门盘包括具有设置在顶表面和底表面之间的外径的盘形主体。 盘状体包括将底面与外径连接的双重步骤。

公开(公告)号：US20140023461A1

公开(公告)日：2014-01-23

申请号：US13555168

申请日：2012-07-22

申请人： Jason Schaller ,  Robert Brent Vopat

发明人： Jason Schaller ,  Robert Brent Vopat

IPC分类号： H01L21/677 ,  H05F3/02 ,  B25J11/00

CPC分类号： H01L21/67706 ,  B25J11/0095 ,  B25J15/0616 ,  B65G49/06 ,  B65G2207/10 ,  B65G2812/16 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/67781 ,  H05F3/02

摘要： A manufacturing system includes a gantry module, having an end effector, for moving workpieces from a conveyor system to a working area, such as a swap module. The swap module removes a matrix of processed workpieces from a load lock and place a matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. Due to the speed of operation, the end effector may build up excessive electrostatic charge. To remove this built up charge, grounded electrically-conductive brushes are strategically positioned so that, as the end effector moves during normal operation, it comes in contact with these brushes. This removes this built up charge on the end effector, without affecting throughput. In another embodiment, the end effector moves over the brushes while the swap module is moving matrix to and from the load lock.

摘要翻译： 制造系统包括具有末端执行器的台架模块，用于将工件从输送机系统移动到诸如交换模块的工作区域。 交换模块从加载锁中移除经处理的工件的矩阵，并将未加工的工件的矩阵放置在其位置。 然后将经处理的工件通过台架模块移回到输送机。 由于操作速度，末端执行器可能会积聚过多的静电电荷。 为了消除这种建立的电荷，接地的导电刷被有策略地定位，使得当正常操作中端部执行器移动时，它与这些刷子接触。 这可以消除末端执行器上的这种建立的电荷，而不会影响吞吐量。 在另一个实施例中，端部执行器在电刷上移动，而交换模块正在移动矩阵到和从加载锁定。

公开(公告)号：US20080276867A1

公开(公告)日：2008-11-13

申请号：US12117945

申请日：2008-05-09

申请人： Jason Schaller

发明人： Jason Schaller

IPC分类号： C23C16/00

CPC分类号： C23C14/568 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67742

摘要： The present invention relates to a cluster tool for processing semiconductor substrates. One embodiment of the present invention provides a mainframe for a cluster tool comprising a transfer chamber having a substrate transferring robot disposed therein. The substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber. The mainframe further comprises a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber.

摘要翻译： 本发明涉及一种用于处理半导体衬底的簇工具。 本发明的一个实施例提供了一种用于集群工具的主机，其包括具有设置在其中的基板传送机器人的传送室。 基板传送机器人构造成在直接或间接连接到传送室的一个或多个处理室之间穿梭基板。 主机还包括快门盘架，其被配置为存储要由一个或多个处理室使用的一个或多个快门盘，其中快门盘架可接近基板传送机器人，使得基板传送机器人可以传送一个或多个 快门盘架与直接或间接连接到传送室的一个或多个处理室之间的更多快门盘。

公开(公告)号：US08920103B2

公开(公告)日：2014-12-30

申请号：US13468134

申请日：2012-05-10

申请人： Jason Schaller ,  Robert Vopat

发明人： Jason Schaller ,  Robert Vopat

IPC分类号： B25J9/10 ,  B25J15/06 ,  B25J19/00 ,  H01L21/677 ,  H01L21/683

CPC分类号： B25J9/10 ,  B25J15/0616 ,  B25J19/0029 ,  B25J19/0041 ,  H01L21/67736 ,  H01L21/67754 ,  H01L21/6838

摘要： A rotary end effector for use for the high speed handling of workpieces, such as solar cells, is disclosed. The rotary end effector is capable of infinite rotation. The rotary end effector has a gripper bracket, capable of supporting a plurality of grippers, arranged in any configuration, such as a 4×1 linear array. Each gripper is in communication with a suction system, wherein, in some embodiments, each gripper can be selectively enabled and disabled. Provisions are also made to allow electrical components, such as proximity sensors, to be mounted on the rotating gripper bracket. In another embodiment, an end effector with multiple surfaces, each with a plurality of grippers, is used.

摘要翻译： 公开了一种用于工件的高速处理的旋转端部执行器，例如太阳能电池。 旋转末端执行器能够无限旋转。 旋转端部执行器具有能够支撑多个夹持器的夹持器托架，其以任何构造布置，例如4×1线性阵列。 每个夹具与抽吸系统连通，其中，在一些实施例中，可以选择性地启用和禁用每个夹持器。 还规定了允许诸如接近传感器的电气部件安装在旋转的夹具支架上。 在另一个实施例中，使用具有多个表面的端部执行器，每个具有多个夹持器。

公开(公告)号：US20130302126A1

公开(公告)日：2013-11-14

申请号：US13468134

申请日：2012-05-10

申请人： Jason Schaller ,  Robert Vopat

发明人： Jason Schaller ,  Robert Vopat

IPC分类号： B66C1/02 ,  B25J15/06

CPC分类号： B25J9/10 ,  B25J15/0616 ,  B25J19/0029 ,  B25J19/0041 ,  H01L21/67736 ,  H01L21/67754 ,  H01L21/6838

摘要： A rotary end effector for use for the high speed handling of workpieces, such as solar cells, is disclosed. The rotary end effector is capable of infinite rotation. The rotary end effector has a gripper bracket, capable of supporting a plurality of grippers, arranged in any configuration, such as a 4×1 linear array. Each gripper is in communication with a suction system, wherein, in some embodiments, each gripper can be selectively enabled and disabled. Provisions are also made to allow electrical components, such as proximity sensors, to be mounted on the rotating gripper bracket. In another embodiment, an end effector with multiple surfaces, each with a plurality of grippers, is used.

摘要翻译： 公开了一种用于工件的高速处理的旋转端部执行器，例如太阳能电池。 旋转末端执行器能够无限旋转。 旋转端部执行器具有能够支撑多个夹持器的夹持器托架，其以任何构造布置，例如4×1线性阵列。 每个夹具与抽吸系统连通，其中，在一些实施例中，可以选择性地启用和禁用每个夹持器。 还规定了允许诸如接近传感器的电气部件安装在旋转的夹具支架上。 在另一个实施例中，使用具有多个表面的端部执行器，每个具有多个夹持器。