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1.发明授权公开(公告)号：US11267932B2
公开(公告)日：2022-03-08
申请号：US16047508
申请日：2018-07-27
发明人： Kazuya Someya , Issei Suzuki , Koichi Misumi , Dai Shiota
IPC分类号： C08G59/40 , C08G59/24 , C09D163/00 , H01L27/32 , H01L51/00 , H01L51/56 , C08G59/32 , C08G59/68 , C08G59/30 , C08G75/08 , H01L51/52
摘要： A curable composition which is capable of forming a cured product having satisfactory heat resistance and adhesion to a base material, and has satisfactory curability, a cured film obtained from a cured product of the curable composition, a display panel or an OLED light provided with the cured film, and a method for producing a cured product using the curable composition. The composition includes a curable compound and a cationic polymerization initiator, and contains a cationic polymerizable compound having, as the main skeleton, a fused ring in which three or more rings including an aromatic ring are fused, and a salt including a gallium-containing anion as the cationic polymerization initiator.
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公开(公告)号：US10241406B2
公开(公告)日：2019-03-26
申请号：US15629035
申请日：2017-06-21
发明人： Masahito Yahagi , Issei Suzuki , Yuki Fukumura , Toshikazu Takayama , Takashi Kamizono , Tatsuya Fujii
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C307/02 , C07C309/06 , C07C309/07
摘要： A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va1 is a divalent hydrocarbon group. na1 represents an integer of 0 to 2. Ra′12 and Ra′13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group. Yb1 represents a divalent linking group containing an ester bond. Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mm+ is an m-valent organic cation.
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公开(公告)号：US11718587B2
公开(公告)日：2023-08-08
申请号：US16648585
申请日：2018-09-26
发明人： Kunihiro Noda , Hiroki Chisaka , Issei Suzuki , Jiro Hikida , Dai Shiota , Kieko Hanano , Kyohei Ishida , Tsutomu Watanabe , Kazuhiro Uehara
IPC分类号： C07D233/60 , C07D233/58
CPC分类号： C07D233/60 , C07D233/58
摘要： A novel compound suitable as an epoxy curing catalyst; an epoxy curing catalyst using the compound; and a method for producing the compound. A compound represented by formula (1) in which Xm+ represents an m valent counter cation, R1 represents an aromatic group which may have a substituent; R2 represents an alkylene group which may have a substituent; R3 represents a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonic acid ester group, a phosphino group, a phosphinyl group, a phosphonic acid ester group or an organic group; m represents an integer of 1 or more; n represents an integer of 0-3; and R2 may bond with R1 to form a cyclic structure.
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公开(公告)号：US11204551B2
公开(公告)日：2021-12-21
申请号：US15631499
申请日：2017-06-23
发明人： Masahito Yahagi , Issei Suzuki , Yuki Fukumura , Toshikazu Takayama , Takashi Kamizono , Tatsuya Fujii
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039 , C09D125/18 , C08F12/24 , C08F212/14 , C08F220/26 , C08L51/08 , C08L53/00 , C08L67/04 , C08L87/00 , C08F220/58 , C08F220/38 , C08F220/40 , C08F220/30 , C08F220/28 , G03F7/32
摘要： A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va1 is a divalent hydrocarbon group, na1 represents an integer of 0 to 2, Ya0 is a carbon atom, Xa0 is a group forming a monocyclic aliphatic hydrocarbon group together with Ya0, and Ra00 is an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group, Yb1 represents a divalent linking group containing an ester bond, Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, and Mm+ is an m-valent organic cation.
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5.发明授权公开(公告)号：US09776208B2
公开(公告)日：2017-10-03
申请号：US14957922
申请日：2015-12-03
发明人： Masahito Yahagi , Takaya Maehashi , Akiya Kawaue , Issei Suzuki , Tasuku Matsumiya , Tsuyoshi Kurosawa , Hitoshi Yamano
IPC分类号： B05D1/38 , B05D7/00 , C09D153/00 , B05D3/02 , G03F7/00
CPC分类号： B05D1/38 , B05D3/0254 , B05D7/52 , C09D153/00 , G03F7/0002
摘要： A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.
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公开(公告)号：US11099479B2
公开(公告)日：2021-08-24
申请号：US16334302
申请日：2017-10-04
发明人： Takashi Nagamine , Hideto Nito , Masafumi Fujisaki , Tatsuya Fujii , Yuki Fukumura , Takahiro Kojima , Issei Suzuki , Takuya Ikeda , KhanhTin Nguyen
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
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公开(公告)号：US09045398B2
公开(公告)日：2015-06-02
申请号：US14289686
申请日：2014-05-29
发明人： Issei Suzuki , Takuya Ikeda , Yusaku Takashima , Takeshi Furuta , Yoshitaka Komuro , Yoshiyuki Utsumi , Takaaki Kaiho , Toshiaki Hato
IPC分类号： C07C281/12 , C07C309/06 , C07C309/19 , C07C311/48 , C07C317/04 , C07C381/12
CPC分类号： C07C309/06 , C07C309/19 , C07C311/48 , C07C317/04 , C07C381/12 , C07C2602/42
摘要： Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. wherein R1 represents an electron withdrawing group; R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and X−represents a monovalent counter anion.
摘要翻译： 提供了一种在溶剂中具有高溶解度并对具有高于深UV（254nm）的波长的光，特别是具有不长于深UV（254nm）的光的光的高灵敏度的新型锍盐和包含锍盐的新型光酸产生剂。 本发明涉及由以下通式（1）表示的锍盐和包含锍盐的新型光酸产生剂。 其中R1表示吸电子基团; R2和R3各自独立地表示碳原子数1〜5的烷基，烷氧基，酰基，卤代烷基，卤素原子，羟基，氰基或硝基。 p和q各自独立地表示0〜5的整数， 并且X代表一价抗衡阴离子。
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公开(公告)号：US20220017455A1
公开(公告)日：2022-01-20
申请号：US17304445
申请日：2021-06-21
发明人： Natsumi Okawa , Makoto Sato , Issei Suzuki , Jun Iioka
IPC分类号： C07C259/06 , C09D5/00 , C07C259/10 , C23C16/02 , C23C16/455 , C23C16/04
摘要： A surface treatment agent used for treating a substrate which has a surface having two or more regions made of materials that are different from each other, the agent including a compound (H) represented by Formula (H-1). In the formula, R1 represents a linear or branched alkyl group having 1 to 30 carbon atoms, a linear or branched fluorinated alkyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group, or a cycloalkyl group having 3 to 12 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1 to 8 carbon atoms, or a cycloalkyl group having 3 to 12 carbon atoms)
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公开(公告)号：US10394122B2
公开(公告)日：2019-08-27
申请号：US15631592
申请日：2017-06-23
发明人： Issei Suzuki , Masahito Yahagi , Yuki Fukumura , Kazuaki Ebisawa , Yoshitaka Komuro , Toshikazu Takayama , Takashi Kamizono , Tatsuya Fujii
IPC分类号： G03F7/004 , G03F7/38 , C08F220/22 , C08F220/18 , C08F220/20 , C08F220/30 , C07C381/12 , H01L21/027 , C08L51/08 , C08L53/00 , C08L67/04 , C08L87/00 , G03F7/039
摘要： A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rb1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yb1 represents a divalent linking group containing an ester bond (—C(═O)—O— or —O—C(═O)—), Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mm+ represents an m-valent organic cation. Rb1—Yb1—Vb1—CF2—SO3−(Mm+)1/m (b1)
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公开(公告)号：US20140357896A1
公开(公告)日：2014-12-04
申请号：US14289686
申请日：2014-05-29
发明人： Issei Suzuki , Takuya Ikeda , Yusaku Takashima , Takeshi Furuta , Yoshitaka Komuro , Yoshiyuki Utsumi , Takaaki Kaiho , Toshiaki Hato
IPC分类号： C07C323/09 , C07C311/09 , C07C301/02 , C07C301/00
CPC分类号： C07C309/06 , C07C309/19 , C07C311/48 , C07C317/04 , C07C381/12 , C07C2602/42
摘要： Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. wherein R1 represents an electron withdrawing group; R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and X− represents a monovalent counter anion.
摘要翻译： 提供了一种在溶剂中具有高溶解度并对具有高于深UV（254nm）的波长的光，特别是具有不长于深UV（254nm）的光的光的高灵敏度的新型锍盐和包含锍盐的新型光酸产生剂。 本发明涉及由以下通式（1）表示的锍盐和包含锍盐的新型光酸产生剂。 其中R1表示吸电子基团; R2和R3各自独立地表示碳原子数1〜5的烷基，烷氧基，酰基，卤代烷基，卤素原子，羟基，氰基或硝基。 p和q各自独立地表示0〜5的整数， X-表示一价抗衡阴离子。
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