公开(公告)号：US20180065162A1

公开(公告)日：2018-03-08

申请号：US15786446

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko MIKAMI ,  Sumika TAMURA ,  Reiji TERADA ,  Masashi KURATA ,  Daisei FUJITO ,  Kiyoaki NISHITSUJI ,  Takehiro NISHI

IPC: B21B3/02 ,  B21B1/22 ,  C23C14/04 ,  C23C16/04 ,  C23F1/28 ,  C23F1/40 ,  B32B15/01 ,  B32B15/04 ,  H01L51/00

CPC classification number: B21B3/02 ,  B21B1/227 ,  B21B2261/04 ,  B32B15/015 ,  B32B15/04 ,  C23C14/042 ,  C23C16/042 ,  C23F1/28 ,  C23F1/40 ,  H01L51/0015

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US20210355586A1

公开(公告)日：2021-11-18

申请号：US17390579

申请日：2021-07-30

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko MIKAMI ,  Sumika TAMURA ,  Reiji TERADA ,  Masashi KURATA ,  Daisei FUJITO ,  Kiyoaki NISHITSUJI ,  Takehiro NISHI

IPC: C23F1/28 ,  B21B1/22 ,  B21B3/02 ,  B32B15/01 ,  B32B15/04 ,  C23C14/04 ,  C23C14/34 ,  C23C16/04 ,  C23F1/16 ,  C23F1/40 ,  H01L51/00 ,  C23C14/24

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US20200274068A1

公开(公告)日：2020-08-27

申请号：US16870716

申请日：2020-05-08

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mikio SHINNO ,  Masashi KURATA ,  Naoko MIKAMI

IPC: H01L51/00 ,  C23C14/04 ,  C25D1/04 ,  C25D1/10 ,  C25D3/56 ,  C25D5/50 ,  H01L51/56

Abstract: A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface. An absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %). A value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value. The standard value is less than or equal to 0.05 (mass %/μm).

公开(公告)号：US20180312979A1

公开(公告)日：2018-11-01

申请号：US16025857

申请日：2018-07-02

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mikio SHINNO ,  Reiji TERADA ,  Kiyoaki NISHITSUJI ,  Masashi KURATA ,  Kenta TAKEDA ,  Naoko MIKAMI ,  Sumika AKIYAMA

IPC: C23F1/02 ,  C23F1/16 ,  B21B1/38

Abstract: The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10−5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10−5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.

公开(公告)号：US20180066352A1

公开(公告)日：2018-03-08

申请号：US15786463

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Sumika TAMURA ,  Naoko MIKAMI ,  Daisei FUJITO ,  Kiyoaki NISHITSUJI ,  Takehiro NISHI

IPC: C23C14/04 ,  C23C14/02 ,  C23C14/08 ,  C23C14/22 ,  C23F1/44 ,  G01N21/55 ,  H01L51/00 ,  H01L51/50 ,  H01L51/52

CPC classification number: C23C14/042 ,  C23C14/024 ,  C23C14/028 ,  C23C14/085 ,  C23C14/12 ,  C23C14/225 ,  C23F1/02 ,  C23F1/14 ,  C23F1/44 ,  G01N21/55 ,  H01L51/0011 ,  H01L51/5012 ,  H01L51/5271

Abstract: A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.

公开(公告)号：US20180038002A1

公开(公告)日：2018-02-08

申请号：US15786455

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Sumika TAMURA ,  Mikio SHINNO ,  Daisei FUJITO ,  Kiyoaki NISHITSUJI ,  Takehiro NISHI ,  Naoko MIKAMI

IPC: C25B11/04 ,  C25C7/08 ,  C25D1/10 ,  C25C1/08 ,  C25D11/34 ,  C25D5/16

CPC classification number: C25B11/041 ,  C23C14/042 ,  C25C1/08 ,  C25C7/08 ,  C25D1/04 ,  C25D1/10 ,  C25D3/562 ,  C25D5/16 ,  C25D11/34 ,  H01L51/0011

Abstract: A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.