公开(公告)号：US4806987A

公开(公告)日：1989-02-21

申请号：US135377

申请日：1987-12-21

申请人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

发明人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70475

摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.

摘要翻译： 投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。 进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案 区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。 该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

公开(公告)号：US4965630A

公开(公告)日：1990-10-23

申请号：US451166

申请日：1989-12-15

申请人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

发明人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70241

摘要： The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.

摘要翻译： 本发明提供一种投影曝光装置，包括：标线片台; 照明光学系统，用于照亮标线片台上的掩模版; 支撑衬底的阶段; 以及具有预定数值孔径的投影光学系统，以将形成在标线上的图案投影并由照明光学系统照射到基板上，并且其中将关于在掩模版上形成的图案聚焦到基板上的纵向球面像差 被过度纠正。

公开(公告)号：US4734746A

公开(公告)日：1988-03-29

申请号：US51236

申请日：1987-05-12

申请人： Kazuo Ushida ,  Satoru Anzai ,  Kazuaki Suzuki ,  Toshio Matsuura ,  Kyoichi Suwa ,  Koichi Matsumoto

发明人： Kazuo Ushida ,  Satoru Anzai ,  Kazuaki Suzuki ,  Toshio Matsuura ,  Kyoichi Suwa ,  Koichi Matsumoto

IPC分类号： G03F7/20 ,  G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70066 ,  G03F7/2022 ,  G03F7/70241 ,  G03F7/70458

摘要： An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.

摘要翻译： 用于光刻的曝光方法包括以下步骤：通过使用包括具有缩小倍率1 /β1的第一成像光学系统和直径φ1的图像圆的第一曝光装置在基板上形成图案，并且形成 通过使用包括具有不同于缩小倍率1 /β1的缩小倍率1 /β2的第二成像光学系统的第二曝光装置和形成第一图案的图像圆的第二图案， 直径phi 2，其中当N是整数时，满足β1 phi 1 =β2 ph 2和ph 1 = N x ph 2的条件。

公开(公告)号：US10387028B2

公开(公告)日：2019-08-20

申请号：US14127661

申请日：2012-06-26

申请人： Koichi Matsumoto ,  Noriyo Inagaki ,  Naoe Kanetsuki

发明人： Koichi Matsumoto ,  Noriyo Inagaki ,  Naoe Kanetsuki

IPC分类号： G06F3/0488 ,  B60K35/00 ,  G06F3/0482 ,  B60H1/00

摘要： A vehicle operation device includes a touch operation display (10); a presentation display (20) that is arranged farther from a driver's seat than the touch operation display and that displays a plurality of information items; and a processing device (30) that, in response to a predetermined selection operation on the touch operation display (10), erases a display of one information item, selected from the plurality of information items displayed on the presentation display (20), from a screen on the presentation display (20) and that displays an operation screen, corresponding to the erased information item, on the touch operation display (10).

公开(公告)号：US09442900B2

公开(公告)日：2016-09-13

申请号：US13264100

申请日：2010-06-29

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： G06F17/21

CPC分类号： G06F17/217 ,  G06F17/211 ,  G06F17/212

摘要： An apparatus for arranging a plurality of elements includes a memory that stores a program and a processor that executes the program stored in the memory. The processor acquires a first element and a second element, each of which strides over a page partition position corresponding to a bottom of a first page in a vertical direction. The processor arranges the first element and the second element, so that the first element is divided, at a position of the first element corresponding to the page partition position over which the second element strides, into the first page and a second page, and a whole of the second element is arranged to the second page.

摘要翻译： 用于布置多个元件的装置包括存储程序的存储器和执行存储在存储器中的程序的处理器。 处理器获取第一元素和第二元素，每个元素和第二元素在垂直方向上跨过与第一页面的底部相对应的页面分隔位置。 所述处理器布置所述第一元件和所述第二元件，使得所述第一元件在与所述第二元件所跨越的页分隔位置相对应的所述第一元素的位置处被划分为所述第一页和第二页，并且 整个第二元素被布置到第二页。

公开(公告)号：US20140123064A1

公开(公告)日：2014-05-01

申请号：US14127661

申请日：2012-06-26

申请人： Koichi Matsumoto ,  Noriyo Inagaki ,  Naoe Kanetsuki

发明人： Koichi Matsumoto ,  Noriyo Inagaki ,  Naoe Kanetsuki

IPC分类号： G06F3/0482 ,  G06F3/0488

CPC分类号： G06F3/0488 ,  B60H1/00985 ,  B60K35/00 ,  B60K2370/1438 ,  B60K2370/184 ,  G06F3/0482 ,  G06F3/04886

摘要： A vehicle operation device includes a touch operation display (10); a presentation display (20) that is arranged farther from a driver's seat than the touch operation display and that displays a plurality of information items; and a processing device (30) that, in response to a predetermined selection operation on the touch operation display (10), erases a display of one information item, selected from the plurality of information items displayed on the presentation display (20), from a screen on the presentation display (20) and that displays an operation screen, corresponding to the erased information item, on the touch operation display (10).

摘要翻译： 车辆操作装置包括触摸操作显示器（10）; 演示显示器（20），其布置成比所述触摸操作显示器远离驾驶员座位并且显示多个信息项; 以及处理装置（30），其响应于所述触摸操作显示（10）上的预定选择操作，从显示在所述呈现显示（20）上的所述多个信息项中选择的一个信息项的显示从 在所述呈现显示器（20）上的屏幕，并且在所述触摸操作显示器（10）上显示与所擦除的信息项目相对应的操作屏幕。

公开(公告)号：US08669534B2

公开(公告)日：2014-03-11

申请号：US12934966

申请日：2009-03-23

申请人： Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi ,  Kyoko Onoguchi

发明人： Akira Onoguchi ,  Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi

IPC分类号： H01J37/12

CPC分类号： H01J37/12 ,  H01J2237/121 ,  H01J2237/28

摘要： Provided is an electrostatic lens for charged particle radiation with a lens performance relatively comparable to that of a magnetic type lens. A plurality of electrodes arranged on the incident side of charged particles form a first electric field area, wherein orbit radii of the charged particles are reduced without exceeding, on the way, the initial orbit radii that are orbit radii at the incident time, and a second electric field area, wherein force in the direction advancing in parallel with a central axis is applied to the charged particles that have passed through the first electric field area. A plurality of electrodes arranged on the projection side form a third electric field area, wherein the orbit radii of the charged particles do not exceed the initial orbit radii on the way and are curved to intersect with a central axis at angles larger than orbit angles defined with respect to the central axis of when the charged particles are projected from the second electric field area.

摘要翻译： 提供一种用于带电粒子辐射的静电透镜，其具有与磁性透镜相当的透镜性能。 布置在带电粒子的入射侧的多个电极形成第一电场区域，其中带电粒子的轨道半径减小而不超过在入射时为轨道半径的初始轨道半径， 第二电场区域，其中在与中心轴平行的方向上的力施加到已经通过第一电场区域的带电粒子。 布置在投影侧的多个电极形成第三电场区域，其中带电粒子的轨道半径在途中不超过初始轨道半径，并且弯曲成与中心轴相交，角度大于所定义的轨道角度 相对于带电粒子从第二电场区域突出时的中心轴线。

公开(公告)号：US20130009070A1

公开(公告)日：2013-01-10

申请号：US12934966

申请日：2009-03-23

申请人： Akira Onoguchi ,  Kyoko Onoguchi ,  Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi

发明人： Akira Onoguchi ,  Kyoko Onoguchi ,  Kenichi Obori ,  Koichi Matsumoto ,  Shogo Awata ,  Satoshi Ohashi

IPC分类号： H01J3/18

CPC分类号： H01J37/12 ,  H01J2237/121 ,  H01J2237/28

摘要： Provided is an electrostatic lens for charged particle radiation with a lens performance relatively comparable to that of a magnetic type lens. A plurality of electrodes arranged on the incident side of charged particles form a first electric field area, wherein orbit radii of the charged particles are reduced without exceeding, on the way, the initial orbit radii that are orbit radii at the incident time, and a second electric field area, wherein force in the direction advancing in parallel with a central axis is applied to the charged particles that have passed through the first electric field area. A plurality of electrodes arranged on the projection side form a third electric field area, wherein the orbit radii of the charged particles do not exceed the initial orbit radii on the way and are curved to intersect with a central axis at angles larger than orbit angles defined with respect to the central axis of when the charged particles are projected from the second electric field area.

摘要翻译： 提供一种用于带电粒子辐射的静电透镜，其具有与磁性透镜相当的透镜性能。 布置在带电粒子的入射侧的多个电极形成第一电场区域，其中带电粒子的轨道半径减小而不超过在入射时为轨道半径的初始轨道半径， 第二电场区域，其中在与中心轴平行的方向上的力施加到已经通过第一电场区域的带电粒子。 布置在投影侧的多个电极形成第三电场区域，其中带电粒子的轨道半径在途中不超过初始轨道半径，并且弯曲成与中心轴相交，角度大于所定义的轨道角度 相对于带电粒子从第二电场区域突出时的中心轴线。

公开(公告)号：US08173299B2

公开(公告)日：2012-05-08

申请号：US13038015

申请日：2011-03-01

申请人： Takakazu Hirose ,  Masayuki Iwama ,  Koichi Matsumoto ,  Isamu Konishiike ,  Kenichi Kawase

发明人： Takakazu Hirose ,  Masayuki Iwama ,  Koichi Matsumoto ,  Isamu Konishiike ,  Kenichi Kawase

IPC分类号： H01M4/58

CPC分类号： H01M4/38 ,  H01M4/0421 ,  H01M4/134 ,  H01M4/364 ,  H01M4/366 ,  H01M4/386 ,  H01M10/0525

摘要： An anode capable of relaxing the stress concentration and improving the characteristics and a battery using it are provided. The anode includes an anode current collector and an anode active material layer containing silicon (Si) as an element, wherein the anode active material layer has a metal element increasing and decreasing region in which a metal element is contained as an element, and a concentration of the metal element is increased and then decreased in a thickness direction.

摘要翻译： 提供能够缓和应力集中和提高特性的阳极和使用它的电池。 阳极包括阳极集电体和含有硅（Si）作为元素的负极活性物质层，其中负极活性物质层具有金属元素增加和减少的区域，其中含有金属元素作为元素，并且浓度 的金属元素增加，然后在厚度方向上减小。

公开(公告)号：US20120104509A1

公开(公告)日：2012-05-03

申请号：US13278809

申请日：2011-10-21

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： H01L27/092 ,  H01L21/20 ,  H01L21/28 ,  H01L29/772

CPC分类号： H01L27/0924 ,  H01L21/28079 ,  H01L21/28088 ,  H01L21/28097 ,  H01L21/823814 ,  H01L21/823821 ,  H01L21/823828 ,  H01L21/823842 ,  H01L21/82385 ,  H01L21/823864 ,  H01L27/092 ,  H01L27/0928 ,  H01L29/0649 ,  H01L29/0847 ,  H01L29/41783 ,  H01L29/42356 ,  H01L29/42376 ,  H01L29/4958 ,  H01L29/4966 ,  H01L29/4975 ,  H01L29/4983 ,  H01L29/517 ,  H01L29/66545 ,  H01L29/66553 ,  H01L29/6656

摘要： A semiconductor device includes: a first conductivity type transistor and a second conductivity type transistor, wherein each of the first conductivity type transistor and the second conductivity type includes a gate insulating film formed on a base, a metal gate electrode formed on the gate insulating film, and side wall spacers formed at side walls of the metal gate electrode, wherein the gate insulating film is made of a high dielectric constant material, and wherein offset spacers are formed between the side walls of the metal gate electrode and the inner walls of the side wall spacers in any one of the first conductivity type transistor and the second conductivity type transistor, or offset spacers having different thicknesses are formed in the first conductivity type transistor and the second conductivity type transistor.

摘要翻译： 半导体器件包括：第一导电型晶体管和第二导电型晶体管，其中第一导电型晶体管和第二导电类型中的每一个包括形成在基极上的栅极绝缘膜，形成在栅极绝缘膜上的金属栅电极 以及形成在所述金属栅电极的侧壁处的侧壁间隔物，其中所述栅极绝缘膜由高介电常数材料制成，并且其中在所述金属栅电极的侧壁和所述金属栅电极的内壁之间形成有偏置间隔物 在第一导电型晶体管和第二导电型晶体管中形成第一导电型晶体管和第二导电型晶体管中的任一个中的侧壁间隔物或具有不同厚度的偏移间隔物。