利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.032 秒)

    Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same
    2.
    发明授权
    Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same 失效
    用于曝光的基材的防水组合物，抗蚀剂图案的形成方法，通过形成方法制造的电子装置，用于赋予待暴露的基板的拒水性的处理方法，待曝光的基板的防水组和用于赋予水的处理方法 对使用其曝光的基板的排斥性

    公开(公告)号：US08178983B2

    公开(公告)日：2012-05-15

    申请号：US12867670

    申请日：2009-02-20

    申请人： Takeo Ishibashi ,  Miwako Ishibashi, legal representative ,  Mamoru Terai ,  Takuya Hagiwara ,  Osamu Yokokoji ,  Yoko Takebe

    发明人： Takeo Ishibashi ,  Mamoru Terai ,  Takuya Hagiwara ,  Osamu Yokokoji ,  Yoko Takebe

    IPC分类号： H01L23/29 ,  B05D3/02

    CPC分类号： G03F7/16 ,  G03F7/11 ,  G03F7/2041

    摘要： It is an object of the present invention to provide a water repellant composition for a substrate to be exposed which inhibits the back side of a substrate to be exposed from being contaminated by an immersion liquid, can improve adhesion between a film to be processed and an organic film directly overlying that film to inhibit film peeling, and has excellent workability, a method for forming a resist pattern, an electronic device produced by the formation method, a treatment method for imparting water repellency to a substrate to be exposed, a water repellent set for a substrate to be exposed, and a treatment method for imparting water repellency to a substrate to be exposed using the same. A water repellent composition for a substrate to be exposed including at least an organosilicon compound represented by the following general formula (1) and a solvent is used. In the formula, R1 is a monovalent organic group having 14 to 30 carbon atoms, each R2, R3, and R4 is independently a monovalent organic group or a hydrolyzable group having 1 to 10 carbon atoms, and at least one of R2, R3, and R4 is a hydrolyzable group.

    摘要翻译： 本发明的目的是提供一种抑制待暴露基板的背面被浸没液体污染的待曝光基材的防水组合物，可提高被处理膜与 有机膜直接覆盖该膜以抑制膜剥离，并且具有优异的可加工性，形成抗蚀剂图案的方法，通过形成方法制造的电子器件，对待暴露的基底赋予拒水性的处理方法，防水剂 设置为要暴露的基底，以及用于使用其进行曝光的基底赋予拒水性的处理方法。 使用至少包含由以下通式（1）表示的有机硅化合物和溶剂的待曝光底物用防水组合物。 式中，R1为碳原子数为14〜30的一价有机基团，R2，R3，R4分别独立为1价有机基团或碳原子数1〜10的可水解基团，R2，R3， R4是可水解基团。

    Fluorinated compound, fluoropolymer and process for its production
    4.
    发明授权
    Fluorinated compound, fluoropolymer and process for its production 失效
    氟化合物，含氟聚合物及其生产工艺

    公开(公告)号：US07015366B2

    公开(公告)日：2006-03-21

    申请号：US11218472

    申请日：2005-09-06

    申请人： Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

    发明人： Shun-ichi Kodama ,  Isamu Kaneko ,  Osamu Yokokoji ,  Shinji Okada ,  Yoko Takebe ,  Yasuhide Kawaguchi

    IPC分类号： C07C41/00 ,  C07C43/00 ,  C07C407/00 ,  C07C409/00 ,  C08F136/16

    CPC分类号： C08F36/20 ,  C08F36/16 ,  C08F214/18 ,  C08F2/60

    摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2—Q—CR3═CHR4   (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

    摘要翻译： 提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。 具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子， 具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代， 烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

    Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film
    7.
    发明授权
    Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film 失效
    氟化合物，含氟聚合物，抗蚀剂组合物和抗蚀剂保护膜的组合物

    公开(公告)号：US07498393B2

    公开(公告)日：2009-03-03

    申请号：US11626913

    申请日：2007-01-25

    申请人： Yoko Takebe ,  Masataka Eda ,  Osamu Yokokoji ,  Takashi Sasaki

    发明人： Yoko Takebe ,  Masataka Eda ,  Osamu Yokokoji ,  Takashi Sasaki

    IPC分类号： C08F136/16

    CPC分类号： C07C43/30 ,  C07C33/423 ,  C07C43/17 ,  C08F36/20 ,  C08F214/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/11 ,  Y10S430/115 ,  Y10S430/146

    摘要： A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3  (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.

    摘要翻译： 提供具有官能团并且在宽波长范围内具有高透明度的含氟聚合物，以及抗蚀剂组合物和用于抗蚀剂保护膜的组合物，其包含含氟聚合物，其中所述含氟聚合物具有通过氟代二烯表示的氟化二烯的环化聚合形成的单体单元 CF2-CFCF2C（CF3）（OR1） - （CH2）nCR2-CHR3（1）<α-in-line-formula description =“In-line formula”end =“lead” line-formula description =“In-line Formulas”end =“tail”？>其中R1是氢原子，最多20个碳原子的烷基或（CH2）aCOOR4（其中a是0或1，R4 是氢原子或具有至多20个碳原子的烷基），R 2和R 3各自独立地为氢原子或至多12个碳原子的烷基，n为0或2 条件是当n为0时，R 1，R 2和R 3中的至少一个不是氢原子。

    FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM
    8.
    发明申请
    FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM 失效
    氟化合物，氟聚合物，耐腐蚀组合物和耐腐蚀膜的组合物

    公开(公告)号：US20070154844A1

    公开(公告)日：2007-07-05

    申请号：US11626913

    申请日：2007-01-25

    申请人： Yoko TAKEBE ,  Masataka Eda ,  Osamu Yokokoji ,  Takashi Sasaki

    发明人： Yoko TAKEBE ,  Masataka Eda ,  Osamu Yokokoji ,  Takashi Sasaki

    IPC分类号： C07C57/18 ,  G03C5/00 ,  C07C21/18 ,  C08F18/20

    CPC分类号： C07C43/30 ,  C07C33/423 ,  C07C43/17 ,  C08F36/20 ,  C08F214/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/11 ,  Y10S430/115 ,  Y10S430/146

    摘要： To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength range, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer. A fluoropolymer having monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3  (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.

    摘要翻译： 提供具有官能团并且在宽波长范围内具有高透明度的含氟聚合物，以及包含含氟聚合物的抗蚀剂组合物和抗蚀剂保护膜用组合物。 具有由式（1）表示的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→> CF 2 CFCF 2 C（CF 3）（OR 1） - （CH 2）n（n） （1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 1是氢原子，具有至多20个碳原子的烷基，或（CH 2 CH 2）n CO 2， （其中a为0或1，R 4为氢原子或至多为20个碳原子的烷基），R 2和R 2各自为氢， 彼此独立的氢原子是氢原子或至多12个碳原子的烷基，n为0或2，条件是当n为0时，R“ SUP> 1，R 2和R 3不同于氢原子。

    COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS
    9.
    发明申请
    COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS 审中-公开
    用于液体浸渍曝光装置，层压材料，形成层压材料的方法和液体浸入式曝光装置的涂料组合物

    公开(公告)号：US20120156504A1

    公开(公告)日：2012-06-21

    申请号：US13408963

    申请日：2012-02-29

    申请人： Yoko TAKEBE ,  Osamu Yokokoji

    发明人： Yoko TAKEBE ,  Osamu Yokokoji

    IPC分类号： B32B27/00 ,  C09D127/18 ,  B05D3/00 ,  C09D127/12

    CPC分类号： G03F9/7096 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/7095 ,  G03F7/70958 ,  Y10T428/3154

    摘要： The present invention relates to a coating material composition for a liquid immersion exposure apparatus, which is used for the purpose of forming a lyophobic layer on a surface of a component member of the liquid immersion exposure apparatus which performs a light exposure of a substrate by irradiating with an exposure beam through a liquid, in which the composition contains a fluorine-containing polymer which has, in the main chain, a repeating unit that has a fluorine-containing aliphatic ring structure containing two or three etheric oxygen atoms which are not adjacent to each other, in the ring structure.

    摘要翻译： 本发明涉及一种用于浸液曝光装置的涂料组合物，其用于在浸液曝光装置的构件的表面上形成疏液层，其通过照射进行基板的曝光 其中曝光束通过液体，其中组合物含有在主链中具有含有两个或三个醚性氧原子的含氟脂肪族环结构的重复单元的含氟聚合物，该含氟脂族环结构不邻近 彼此，在环结构。