Non-volatile memory device and method for manufacturing the same
    2.
    发明授权
    Non-volatile memory device and method for manufacturing the same 失效
    非易失性存储器件及其制造方法

    公开(公告)号:US08698228B2

    公开(公告)日:2014-04-15

    申请号:US12886202

    申请日:2010-09-20

    IPC分类号: H01L29/792

    摘要: According to one embodiment, a non-volatile memory device includes a stacked structure and a voltage application portion. The stacked structure includes a memory portion, and an electrode stacked with the memory portion and having a surface having a portion facing the memory portion. The voltage application portion applies a voltage to the memory portion to cause a change in a resistance in the memory portion to store information. The surface includes a first region and a second region. The first region contains at least one of a metallic element, Si, Ga, and As. The first region is conductive. The second region contains at least one of the metallic element, Si, Ga, and As, and has a content ratio of nonmetallic element higher than a content ratio of nonmetallic element in the first region. At least one of the first region and the second region has an anisotropic shape on the surface.

    摘要翻译: 根据一个实施例,非易失性存储器件包括堆叠结构和电压施加部分。 堆叠结构包括存储部分和与存储器部分堆叠并具有面向存储部分的部分的表面的电极。 电压施加部分向存储器部分施加电压以引起存储器部分中的电阻的变化以存储信息。 表面包括第一区域和第二区域。 第一区域包含金属元素Si,Ga和As中的至少一种。 第一个区域是导电的。 第二区域包含金属元素Si,Ga和As中的至少一种,并且具有高于第一区域中的非金属元素的含量比的非金属元素的含量比。 第一区域和第二区域中的至少一个在表面上具有各向异性的形状。