摘要:
A light-emitting element includes a light amplification unit and an external resonator. The light amplification unit has a function of amplifying light. The external resonator is connected to the light amplification unit. The external resonator includes a planar light waveguide and a stress application unit. The planar light waveguide is arranged inside the external resonator. The stress application unit applies stress directly or indirectly to at least a partial region of the planar light waveguide.
摘要:
An optical semiconductor device has an optical semiconductor element; and a mounting substrate unit on which the optical semiconductor element is mounted, wherein the optical semiconductor element has an element substrate 14 and an active layer 17 formed on a lower side surface of the element substrate, the mounting substrate unit has a mounting substrate 23 and a heater electrode 8 arranged on an upper side surface of the mounting substrate. The optical semiconductor element is arranged such that the lower side surface of the element substrate 14 on which the active layer 17 is formed faces the upper side surface of the mounting substrate 23 on which the heater electrode 8 is arranged, and the active layer 17 is to be heated due to the heat-generation by the heater electrode 8. A p-electrode 10 of the mounting substrate unit and a p-electrode 19 of the optical semiconductor element are bonded to each other using a conductive fusion bonding member 20.
摘要:
An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.
摘要翻译:具有凹陷,通道或台阶的电子级合成石英玻璃基板通过机械加工具有最多3nm / cm 3的最大双折射的合成石英玻璃基板的至少一个表面而制成,以形成凹槽,通道或台阶 ,并消除由于机械加工造成的残余应力。
摘要:
An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.
摘要:
Provided is a wavelength variable laser device wherein an SOA is simplified. The wavelength variable laser device includes: an optical filter formed on a PLC; an SOA that supplies light to the optical filter; a light reflecting section that returns the light transmitted through the optical filter to the SOA via the optical filter; optical waveguides which are formed on the PLC and connect the SOA, the optical filter, and the light reflecting section; a wavelength variable section that changes a wavelength of the light transmitting through the optical filter; and a phase variable section that changes a phase of the light propagated on the optical waveguides.
摘要:
An image forming apparatus, which appropriately performs a banding correction even if similar banding does not always occur at a same position of a recording medium, detects reflected light from a test patch image and obtains information on a density change caused by a periodically-uneven rotation of a rotation member, and performs a density correction at an arbitrary position of a print image based on the acquired information on the density change.
摘要:
A thermoplastic resin foam which has both high reflectance and superior shape-retention properties, suitable for use in backlights and illumination boxes for illumination signboards, lighting fixtures, displays and the like. The thermoplastic resin foam is manufactured by a manufacturing method including a procedure for holding a resin sheet composed of thermoplastic resin (A) and thermoplastic resin (B), which has a functional group having an affinity with thermoplastic resin (A), within a pressurized inert gas atmosphere to enable the resin sheet to contain inert gas, and a procedure for foaming by heating the resin sheet containing inert gas at a temperature higher than the softening temperature of thermoplastic resin, under normal pressure.
摘要:
A wavelength variable laser includes: a substrate on which an optical coupler is formed as a planar optical waveguide; a DFB array part arranged on the substrate and having DFB laser elements respectively supply optical signals to the optical coupler; and an SOA part arranged on the substrate and having an SOA element configured to amplify an optical signal outputted from the optical coupler. The DFB array part and the SOA part are respectively formed in chips having a same lamination structure to each other. A wavelength variable laser and a modulator integrated wavelength variable laser with high yield ratio can be provided.
摘要:
An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.
摘要翻译:具有凹陷,通道或台阶的电子级合成石英玻璃基板通过机械加工具有最多3nm / cm 3的最大双折射的合成石英玻璃基板的至少一个表面而制成,以形成凹槽,通道或台阶 ,并消除由于机械加工造成的残余应力。
摘要:
Provided is a double-side coating apparatus which can uniformly coat both surfaces of a substrate to be processed with a coating solution and form uniform coating films on both the surfaces of the substrate to be processed. A double-side coating apparatus (1) includes a holding mechanism (3a) which holds a substrate (2) to be processed so that the thickness direction of the substrate (2) to be processed is a horizontal direction; a rotational driving mechanism which rotates the substrate (2) to be processed in a circumferential direction; a first coating solution nozzle (18a) which jets a coating solution onto one main surface (2a) of the substrate (2) to be processed; and a second coating solution nozzle which jets the coating solution onto the other main surface (2b) of the substrate (2) to be processed. The first coating solution nozzle (18a) and the second coating solution nozzle are symmetrically arranged with respect to a thickness center surface of the substrate (2) to be processed. Provided is an edge rinsing apparatus which can accurately and stably rinse only a fixed width of an outer peripheral portion of the substrate and can easily control the width of the outer peripheral portion to be rinsed even if the width of the outer peripheral portion to be rinsed is small.