公开(公告)号：US07601971B2

公开(公告)日：2009-10-13

申请号：US11954401

申请日：2007-12-12

Applicant: Takeshi Tanaka ,  Hiroyasu Kaga

Inventor： Takeshi Tanaka ,  Hiroyasu Kaga

IPC: H01J37/073 ,  H01J49/08 ,  H01J49/10

CPC classification number: G01N23/2251 ,  H01J37/065 ,  H01J37/073 ,  H01J2237/006 ,  H01J2237/038 ,  H01J2237/06341

Abstract: The present invention provides a highly reliable charged beam gun designed in consideration for environmental protection, which prevents faulty insulation in a high-voltage connection. An insulating liquid is present in a gap formed between a connecting bushing and a receiving-side flange placed in a vacuum container, and the connecting bushing includes first piping and valve that provide communication between the gap and atmospheric air, and second piping and valve that provide communication between the gap and the atmospheric air, whereby the gap is cut off from the atmospheric air.

Abstract translation: 本发明提供了一种考虑到环境保护设计的高度可靠的带电束枪，其防止高压连接中的故障绝缘。 绝缘液体存在于布置在真空容器中的连接衬套和接收侧凸缘之间的间隙中，并且连接衬套包括提供间隙和大气之间的连通的第一管道和阀，以及第二管道和阀， 提供间隙和大气之间的通信，由此间隙与大气隔离。

公开(公告)号：US20080135756A1

公开(公告)日：2008-06-12

申请号：US11954401

申请日：2007-12-12

Applicant: Takeshi Tanaka ,  Hiroyasu Kaga

Inventor： Takeshi Tanaka ,  Hiroyasu Kaga

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/065 ,  H01J37/073 ,  H01J2237/006 ,  H01J2237/038 ,  H01J2237/06341

Abstract: The present invention provides a highly reliable charged beam gun designed in consideration for environmental protection, which prevents faulty insulation in a high-voltage connection. An insulating liquid is present in a gap formed between a connecting bushing and a receiving-side flange placed in a vacuum container, and the connecting bushing includes first piping and valve that provide communication between the gap and atmospheric air, and second piping and valve that provide communication between the gap and the atmospheric air, whereby the gap is cut off from the atmospheric air.

Abstract translation: 本发明提供了一种考虑到环境保护设计的高度可靠的带电束枪，其防止高压连接中的故障绝缘。 绝缘液体存在于布置在真空容器中的连接衬套和接收侧凸缘之间的间隙中，并且连接衬套包括提供间隙和大气之间的连通的第一管道和阀，以及第二管道和阀， 提供间隙和大气之间的通信，由此间隙与大气隔离。

公开(公告)号：US07705329B2

公开(公告)日：2010-04-27

申请号：US12124776

申请日：2008-05-21

Applicant: Hiroyasu Kaga

Inventor： Hiroyasu Kaga

IPC: H01J37/26

CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J2237/31745

Abstract: In view of the fact that in line processing, when processing is performed to a certain depth, the processing does not advance with the passage of a further processing time, a processing apparatus is provided which can appropriately control the depth of grooves in linear groove processing and perform the processing at high speed. A line width and line depth are calculated so as to minimize a processing time of processing on a line to a required depth and processing is performed using the width and line depth as set values of processing. Furthermore, processing is performed with the area in which the beam is actually irradiated superimposed on the scanned image of a focused ion beam and displayed on a screen. In the case of an ion beam inclined with respect to the sample surface, processing is also performed by displaying the area where the beam is actually irradiated by taking the inclination of the sample with respect to the beam into consideration.

Abstract translation: 考虑到在线处理中，当进行一定深度的处理时，处理不会随着另外的处理时间而前进，提供了可以适当地控制线性凹槽处理中的凹槽的深度的处理装置 并高速进行处理。 计算线宽和线深度，以便将处理线的处理时间最小化为所需的深度，并且使用宽度和线深度作为处理的设定值来执行处理。 此外，用激光束实际照射的区域叠加在聚焦离子束的扫描图像上并在屏幕上进行处理。 在相对于样品表面倾斜的离子束的情况下，通过考虑样品相对于光束的倾斜来显示实际照射光束的区域，也进行处理。

公开(公告)号：US20070257200A1

公开(公告)日：2007-11-08

申请号：US11730803

申请日：2007-04-04

Applicant: Hiroyasu Kaga ,  Yuichi Madokoro ,  Shigeru Izawa ,  Tohru Ishitani ,  Kaoru Umemura

Inventor： Hiroyasu Kaga ,  Yuichi Madokoro ,  Shigeru Izawa ,  Tohru Ishitani ,  Kaoru Umemura

IPC: H01J27/02

CPC classification number: H01J27/02 ,  H01J27/22 ,  H01J37/08 ,  H01J2237/0805

Abstract: An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.

公开(公告)号：US08581484B2

公开(公告)日：2013-11-12

申请号：US13375147

申请日：2010-05-14

Applicant: Hiroyasu Kaga ,  Kanehiro Nagao ,  Motohide Ukiana

Inventor： Hiroyasu Kaga ,  Kanehiro Nagao ,  Motohide Ukiana

IPC: H01J27/02 ,  G01N23/00 ,  G21G5/00

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J2237/061 ,  H01J2237/0805 ,  H01J2237/31749

Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.

Abstract translation: 液体金属离子枪3包括液体金属离子源31和束限制孔33.液体金属离子源31包括储存器36和​​发射器35.储存器36由钨（W）制成并保持液态金属镓 （Ga）。 发射器35由W制成。限流孔33由放置在由W制成的基座46上的由Ga制成的液态金属构件44形成，具有能够从液态金属离子源中提取离子束2的开口41 31限制了离子束2的直径。光束限制孔33具有凹槽结构45，其使液体金属44聚集到位于开口41周围的区域中。光束限制孔径的寿命 并且可以长时间保持稳定的发射并且可再现地恢复到稳定状态。

公开(公告)号：US20120126684A1

公开(公告)日：2012-05-24

申请号：US13375147

申请日：2010-05-14

Applicant: Hiroyasu Kaga ,  Kanehiro Nagao ,  Motohide Ukiana

Inventor： Hiroyasu Kaga ,  Kanehiro Nagao ,  Motohide Ukiana

IPC: H01J27/02

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J2237/061 ,  H01J2237/0805 ,  H01J2237/31749

Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.

Abstract translation: 液体金属离子枪3包括液体金属离子源31和束限制孔33.液体金属离子源31包括储存器36和​​发射器35.储存器36由钨（W）制成并保持液态金属镓 （Ga）。 发射器35由W制成。限流孔33由放置在由W制成的基座46上的由Ga制成的液态金属构件44形成，具有能够从液态金属离子源中提取离子束2的开口41 31限制了离子束2的直径。光束限制孔33具有凹槽结构45，其使液体金属44聚集到位于开口41周围的区域中。光束限制孔径的寿命 并且可以长时间保持稳定的发射并且可再现地恢复到稳定状态。

公开(公告)号：US07956336B2

公开(公告)日：2011-06-07

申请号：US12417308

申请日：2009-04-02

Applicant: Hiroyasu Kaga

Inventor： Hiroyasu Kaga

IPC: H01J37/317

CPC classification number: H01J37/12 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/0805 ,  H01J2237/31745

Abstract: An object of the present invention is to provide a focused ion beam apparatus that is capable of obtaining a much larger beam current and forming a focused ion beam with smaller aberration than a conventional focused ion beam apparatus no matter whether the level of acceleration is high or low. The focused ion beam apparatus according to the present invention includes a liquid metal ion source, an extraction electrode for extracting an ion beam from the liquid metal ion source, an acceleration (ground) electrode for accelerating an ion beam, and an electrostatic lens for converging an ion beam. When the acceleration voltage applied to the liquid metal ion source is lower than an emission threshold voltage of the liquid metal ion source, the voltage of the extraction electrode is at a lower potential than the voltage of the acceleration (ground) electrode. The polarity of a voltage applied to the electrostatic lens changes in accordance with the polarity of a voltage applied to the extraction electrode. The present invention makes it possible to exercise a deceleration mode focusing method at a high acceleration voltage from the dielectric strength voltage of an electrostatic lens and exercise an acceleration mode focusing method at a low acceleration voltage with an electrostatic lens having the same focal length as for the deceleration mode focusing method.

Abstract translation: 本发明的目的是提供一种聚焦离子束装置，其能够获得比常规聚焦离子束装置更小的像差的更大的束电流并形成具有更小像差的聚焦离子束，而不管加速度水平是高还是 低。 根据本发明的聚焦离子束装置包括液体金属离子源，用于从液体金属离子源提取离子束的提取电极，用于加速离子束的加速度（接地）电极和用于会聚的静电透镜 离子束。 当施加到液体金属离子源的加速电压低于液体金属离子源的发射阈值电压时，提取电极的电压低于加速度（接地）电极的电压。 施加到静电透镜的电压的极性根据施加到引出电极的电压的极性而变化。 本发明使得可以根据静电透镜的介电强度电压来执行高加速电压的减速模式聚焦方法，并且在具有相同焦距的静电透镜的情况下以低加速度电压锻炼加速模式聚焦方法 减速模式聚焦法。

公开(公告)号：US07323697B2

公开(公告)日：2008-01-29

申请号：US11258939

申请日：2005-10-27

Applicant: Hiroyasu Kaga ,  Hiroyuki Suzuki ,  Yutaka Hojyo

Inventor： Hiroyasu Kaga ,  Hiroyuki Suzuki ,  Yutaka Hojyo

IPC: H01J37/28

CPC classification number: G01N23/225 ,  H01J2237/30438 ,  H01J2237/3045

Abstract: A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a mark 47 for aligning visual field alignment positioned in advance to the same horizontal and the same height as a stage plane as a reference point is arranged on a wafer holder. A height of an observation point on a sample is adjusted to the height of the mark 47 and the visual field of a gradient column is brought into conformity with the visual field of a vertical column by use of a known offset between the gradient column and the vertical column at that time.

Abstract translation: 提供了通过消除晶片表面内的翘曲的影响，能够高精度地移动到特定位置的梯度带电粒子束装置。 具有用于将预先定位在与作为参考点的平台相同的水平和相同高度的视野对准的标记47的部分46布置在晶片保持器上。 将样品上的观察点的高度调整为标记47的高度，并且通过使用梯度列和垂直列之间的已知偏移量使梯度列的视野与垂直列的视野一致 那时的立柱。

公开(公告)号：US08399863B2

公开(公告)日：2013-03-19

申请号：US13058137

申请日：2009-07-23

Applicant: Hiroyasu Kaga ,  Masashi Sasaki ,  Junzo Azuma

Inventor： Hiroyasu Kaga ,  Masashi Sasaki ,  Junzo Azuma

IPC: H01J27/26 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0473 ,  H01J2237/061 ,  H01J2237/0805 ,  H01J2237/31749

Abstract: A charged particle gun includes: a charged particle source; a first extracting electrode arranged in such a manner that a distance between the charged particle source and the first extracting electrode is fixed; a second extracting electrode located on the side opposite to the charged particle source with respect to the first extracting electrode, the electrode being arranged in such a manner that a distance between the first extracting electrode and the second extracting electrode is adjustable; and an earth electrode located on the side opposite to the first extracting electrode with respect to the second extracting electrode, the electrode being arranged in such a manner that a distance between the second extracting electrode and the earth electrode is fixed; wherein the first extracting electrode is equal in potential to the second extracting electrode.

Abstract translation: 带电粒子枪包括：带电粒子源; 第一提取电极，其被布置成使得带电粒子源和第一提取电极之间的距离是固定的; 相对于第一提取电极位于与带电粒子源相反的一侧的第二提取电极，电极以可调节第一提取电极和第二提取电极之间的距离的方式布置; 以及相对于所述第二提取电极位于与所述第一提取电极相对的一侧的接地电极，所述电极以使得所述第二提取电极和所述接地电极之间的距离固定的方式布置; 其中所述第一提取电极与所述第二提取电极的电位相等。

公开(公告)号：US07667209B2

公开(公告)日：2010-02-23

申请号：US11822380

申请日：2007-07-05

Applicant: Hiroyasu Kaga

Inventor： Hiroyasu Kaga

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/18 ,  H01J2237/186 ,  H01J2237/304 ,  H01J2237/31749

Abstract: It is an object of the present invention to provide a focused ion beam apparatus capable of prolonging a service life of an aperture, preventing contaminants from increasing when a column valve is closed, and being quickly restarted.A high-voltage power supply controller lowers an extraction voltage applied to an extraction electrode or lowers a control voltage applied to a control electrode to set an emission to 0 μA when a column valve is closed. The high-voltage power supply controller returns the extraction voltage applied to the extraction electrode to an original extraction voltage or returns the control voltage applied to the control electrode to an original control voltage when a column valve is opened.

Abstract translation: 本发明的目的是提供一种聚焦离子束装置，其能够延长孔的使用寿命，防止在柱阀关闭时污染物增加并迅速重新起动。 高压电源控制器降低施加到引出电极的提取电压或降低施加到控制电极的控制电压，以在柱阀关闭时将发射设置为0μA。 高压电源控制器将施加到引出电极的提取电压返回到原始提取电压，或者当打开柱阀时将施加到控制电极的控制电压返回到原始控制电压。