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1.发明授权
公开(公告)号：US5480754A
公开(公告)日：1996-01-02
申请号：US215644
申请日：1994-03-22
申请人： Tetsuya Takei , Yoshio Segi , Hiroyuki Katagiri
发明人： Tetsuya Takei , Yoshio Segi , Hiroyuki Katagiri
CPC分类号： G03G5/0525 , G03G5/08278 , G03G5/102
摘要： A method for manufacturing an electrophotographic photosensitive member capable of providing high quality even images, which are completely free from image defects and unevenness of image density, which comprises a step for forming a non-monocrystalline deposited film comprising silicon atoms and hydrogen atoms and/or fluorine atoms on an aluminum substrate containing a fine quantity of silicon atoms by a plasma CVD method, wherein the surface of the substrate is cleaned with water in which carbon dioxide has been dissolved before a process for forming the deposited film.
摘要翻译： 一种电子照相感光构件的制造方法，其能够提供完全没有图像缺陷和图像密度不均匀的高质量均匀图像，其包括用于形成包含硅原子和氢原子的非单晶沉积膜和/或 通过等离子体CVD法在含有微量硅原子的铝基板上的氟原子，其中在形成沉积膜的工艺之前，用二氧化碳溶解的水清洗基板的表面。
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2.发明授权公开(公告)号：US06318382B1
公开(公告)日：2001-11-20
申请号：US09467181
申请日：1999-12-20
IPC分类号： B08B102
CPC分类号： C23G1/24 , B08B3/10 , B08B3/12 , C11D11/0047 , C11D11/0064 , C11D11/007 , C23C16/0227 , G03G5/005 , G03G5/08214 , Y10S134/902
摘要： A method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member enables a uniform and high quality image to be obtained without leaving image defects and irregular images. The method includes a cleaning step during which the circulation flow rate during dipping of the cleaning subject in a cleaning solution is different from the circulation flow rate when the cleaning subject is pulled up, and where the cleaning solution is showered on the surface of the cleaning subject when it is pulled up. The cleaning method may be used in a method for manufacturing an electrophotographic photosensitive member for depositing a functional film by a plasma CVD method on a substrate.
摘要翻译： 特别是一种用于清洁电子照相感光构件的清洁方法，能够获得均匀且高质量的图像，而不会留下图像缺陷和不规则图像。 该方法包括清洁步骤，在该步骤中，清洁对象浸入清洗溶液中时的循环流量与清洁对象被拉起时的循环流量不同，清洁溶液在清洗表面上淋浴 当被拉起时。 清洁方法可以用于制造用于通过等离子体CVD法在基板上沉积功能膜的电子照相感光构件的方法。
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3.发明授权Light receiving member, substrate for said light receiving member, and electrophotographic apparatus having said light receiving member 失效光接收元件，用于所述光接收元件的基片和具有所述光接收元件的电子照相设备
公开(公告)号：US5853936A
公开(公告)日：1998-12-29
申请号：US814588
申请日：1997-03-10
CPC分类号： G03G15/751 , G03G5/10
摘要： An electrophotographic light receiving member comprising a substrate in a cylindrical form and a light receiving layer formed on said substrate, wherein said substrate has (i) a portion with an enlarged bore at least on the side of an end portion of said substrate and (ii) a portion in a tapered form situated next to and outside said portion (i). An electrophotographic apparatus provided with said electrophotographic light receiving member.
摘要翻译： 一种电子照相光接收元件，包括圆柱形的基底和形成在所述基底上的光接收层，其中所述基底具有（i）至少在所述基底的端部侧上具有扩大的孔的部分， ）位于所述部分（i）旁边和外侧的锥形形状的部分。 设置有所述电子照相光接收元件的电子照相设备。
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公开(公告)号：US06435130B1
公开(公告)日：2002-08-20
申请号：US08916540
申请日：1997-08-22
申请人： Satoshi Takaki , Yoshio Segi , Atsushi Yamagami , Hiroyuki Katagiri , Hitoshi Murayama , Yasuyoshi Takai
发明人： Satoshi Takaki , Yoshio Segi , Atsushi Yamagami , Hiroyuki Katagiri , Hitoshi Murayama , Yasuyoshi Takai
IPC分类号： C23C16509
CPC分类号： H01J37/32091 , C23C16/24 , C23C16/45578 , C23C16/509 , G03G5/08278
摘要： A plasma CVD apparatus comprising a substantially enclosed reaction chamber containing substrate holding means and a cathode electrode arranged therein, wherein a high frequency power from a high frequency power source is supplied to said cathode electrode to generate plasma between said substrate holding means having a subtrate positioned thereon and said cathode electrode whereby plasma-processing said substrate, characterized in that said cathode electrode comprises a plurality of conductor members situated on substantially the same axis which are capacitively coupled by a dielectric member. A plasma-processing method using said cathode electrode.
摘要翻译： 一种等离子体CVD装置，包括：基本封闭的反应室，其包含基板保持装置和布置在其中的阴极电极，其中来自高频电源的高频功率被提供给所述阴极，以在所述基板保持装置之间产生等离子体，所述基板保持装置具有位于 在其上和所述阴极电极，由此对所述衬底进行等离子体处理，其特征在于，所述阴极包括位于基本上相同的轴上的多个导体构件，所述多个导体构件通过电介质构件电容耦合。1。一种使用所述阴极电极的等离子体处理方法。
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公开(公告)号：US06335281B1
公开(公告)日：2002-01-01
申请号：US09334176
申请日：1999-06-16
IPC分类号： H01L2144
CPC分类号： C23C16/54 , C23C16/4581 , C23C16/46
摘要： In a deposited film forming process or apparatus, a deposited film is formed on a film-forming substrate by reduced-pressure vapor phase growth. The film-forming substrate is set on an auxiliary substrate and an auxiliary-substrate cap member is set at the upper part thereof. A maximum temperature difference between temperature at the upper end of the film-forming substrate and the temperature at the lower end of the auxiliary-substrate cap member provided on the film-forming substrate at its upper part is so controlled as to be not greater than a prescribed value so that a film deposited on the auxiliary-substrate cap member is improved in adhesion. Any deposits of films on the part other than the film-forming substrate can be prevented from coming off and scattering on the film-forming substrate so that deposited films having uniform film thickness and film quality can steadily be formed and also faulty images can occur less frequently. It is also possible to achieve improvements of various properties of films formed, film forming rate, reproducibility, and productivity so that yield can dramatically be improved in mass production.
摘要翻译： 在沉积膜形成工艺或装置中，通过减压气相生长在成膜基板上形成沉积膜。 成膜基板设置在辅助基板上，辅助基板盖部件设置在其上部。 成膜基板的上端的温度与设置在成膜基板上部的辅助基板盖部件的下端的温度之间的最大温度差被控制为不大于 规定值，使得沉积在辅助基板盖构件上的膜提高了粘附性。 可以防止膜形成基板以外的部分的沉积物在成膜基板上脱落并散射，从而可以稳定地形成膜厚度和膜质量均匀的沉积膜，并且可以发生较少的图像 经常。 也可以实现成膜的各种性能，成膜速度，再现性和生产率的改善，从而大量提高产量。
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6.发明授权Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition 失效通过等离子体化学气相沉积形成沉积膜的方法和通过等离子体化学气相沉积形成沉积膜的装置
公开(公告)号：US6158382A
公开(公告)日：2000-12-12
申请号：US989233
申请日：1997-12-12
申请人： Yoshio Segi , Hiroyuki Katagiri , Yasuyoshi Takai
发明人： Yoshio Segi , Hiroyuki Katagiri , Yasuyoshi Takai
IPC分类号： G03G5/082 , C23C16/27 , C23C16/44 , C23C16/455 , C23C16/50 , C23C16/509 , H01L21/205 , C23C16/00
CPC分类号： C23C16/45561 , C23C16/455 , C23C16/45578 , C23C16/5093
摘要： A film-forming method by a plasma CVD process, comprising introducing a raw material gas into a reaction chamber containing a substrate positioned therein through a plurality of gas ejecting holes provided at a gas feed pipe and introducing a discharging energy into said reaction chamber to excite and decompose said film-forming raw material gas introduced into said reaction chamber whereby causing the formation of a deposited film on said substrate, characterized in that the introduction of said film-forming raw material gas into said reaction chamber is conducted by ejecting the film-forming raw material gas toward a member opposed to the substrate from each of right and left sides of the gas feed pipe through the gas ejecting holes of the gas feed pipe at a gas-ejecting angle (a) of 45.degree..ltoreq.(a)
摘要翻译： 通过等离子体CVD法的成膜方法，包括通过设置在气体供给管上的多个气体喷射孔将原料气体引入到设置在其中的基板的反应室中，并将排出能量引入到所述反应室中以进行激发 并且分解引入所述反应室的所述成膜原料气体，从而在所述基材上形成沉积膜，其特征在于，将所述成膜原料气体引入所述反应室中， 通过气体供给管的气体喷射孔，以45°的气体喷射角（a）从气体供给管的左右两侧向与基板相对的部件形成原料气体 ）<90°相对于在所述圆柱形基底和所述多个气体供给管中的每一个之间通过的管线。
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公开(公告)号：US06686109B2
公开(公告)日：2004-02-03
申请号：US10106440
申请日：2002-03-27
IPC分类号： G03G1322
CPC分类号： G03G15/751 , G03G5/08221 , G03G5/08285 , G03G5/14704 , G03G2215/00957
摘要： In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013 Ds≦−0.136Ln(Rs)+(−0.004×PS+6).
摘要翻译： 在使用具有表面保护层并进行反向显影和用清洁刮板清洁的非晶硅感光构件的电子照相方法中，感光构件的表面移动速度PS（mm / sec）为320mm / sec以上， 表面保护层的膜厚和电阻值分别为Ds（mum）和Rs（Ω·cm），满足以下条件：
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8.发明授权Method of manufacturing an electrophotographic photosensitive member including multiple liquid cleaning steps and machining step 失效制造电子照相感光构件的方法，包括多个液体清洗步骤和加工步骤公开(公告)号：US06557569B2
公开(公告)日：2003-05-06
申请号：US09871612
申请日：2001-06-04
IPC分类号： B08B102
CPC分类号： C23G1/24 , B08B3/10 , B08B3/12 , C11D11/0047 , C11D11/0064 , C11D11/007 , C23C16/0227 , G03G5/005 , G03G5/08214 , Y10S134/902
摘要： A method of manufacturing an electrophotographic photosensitive member includes the steps of: cleaning a substrate of the electrophotographic photosensitive member by cleaning step using a vessel and machining the substrate. The cleaning step includes a first overflowing step and a second overflowing step. In the first overflowing step, the liquid is allowed to be overflowed from a vessel while the substrate of the electrophotographic photosensitive member is immersed in the liquid contained in the vessel. In the second overflowing step, the liquid is allowed to overflow from a vessel while the substrate of the electrophotographic photosensitive member is pulled up in the liquid contained in the vessel. A flow rate Q2 of the overflowing liquid of the second overflowing step is higher than a flow rate Q1 of the overflowing liquid of the first overflowing step. The machining step forms a film of a photosensitive substance on the substrate.
摘要翻译： 一种制造电子照相感光构件的方法包括以下步骤：通过使用容器的清洁步骤清洁电子照相感光构件的基底并加工基底。 清洗步骤包括第一溢流步骤和第二溢流步骤。 在第一溢流步骤中，允许液体从容器溢出，同时将电子照相感光构件的基底浸入容纳在容器中的液体中。 在第二溢流步骤中，允许液体从容器溢出，同时将电子照相感光构件的基底在包含在容器中的液体中拉起。 第二溢流工序的溢流液的流量Q2高于第一溢流工序的溢流液的流量Q1。 加工步骤在基板上形成感光性物质的膜。
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9.发明授权公开(公告)号：US06406554B1
公开(公告)日：2002-06-18
申请号：US09605759
申请日：2000-06-28
IPC分类号： B08B908
CPC分类号： G03G5/08278 , G03G5/08214 , G03G5/08221 , G03G5/08235
摘要： The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member includes a step forming a functional film on a substrate, and a washing step of spraying water on the substrate surface from concentrically arranged nozzle groups positioned in a twisted relationship before the step of forming the functional film.
摘要翻译： 本发明提供一种制造电子照相感光构件的方法，该方法能够获得高质量均匀的图像，而没有图像缺陷和图像密度不均匀。 制造电子照相感光构件的方法包括在基板上形成功能膜的步骤，以及在形成功能膜的步骤之前，从位于扭曲关系的同心布置的喷嘴组在基板表面上喷射水的洗涤步骤。
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10.发明授权Method for manufacturing electrophotographic photosensitive member and jig used therein 失效用于制造电子照相感光构件和夹具的方法公开(公告)号：US06391394B1
公开(公告)日：2002-05-21
申请号：US08999456
申请日：1997-12-29
IPC分类号： H05H146
CPC分类号： C23C16/0227 , C23C16/4581 , G03G5/005 , G03G5/05 , G03G5/08214 , G03G5/102 , H01J2237/3321
摘要： A method for manufacturing an electrophotographic photosensitive member in which an aluminum substrate is fitted on a substrate holder and a functional film comprising a non-monocrystalline material containing silicon atoms as the matrix is formed by low pressure chemical deposition on the surface of the substrate, which comprises surface of the substrate is cleaned with water in which carbon dioxide is dissolved, the substrate holder comprises a metal as the matrix and has formed ceramics at least on the inner surface. This method and a jig used therein make it possible to prevent fine image defects, thereby improving electrophotography characteristics, and to economically and stably manufacture electrophotographic photosensitive members which provide high quality images free from defects and unevenness.
摘要翻译： 一种电子照相感光构件的制造方法，其中铝基板安装在基板保持器上，并且包括含有硅原子的非单晶材料作为基体的功能膜通过在基板的表面上的低压化学沉积形成， 包含基板的表面用二氧化碳溶解的水进行清洗，基板保持器包括金属作为基体，并且至少在内表面上形成陶瓷。 该方法和其中使用的夹具使得可以防止精细图像缺陷，从而改善电子照相术特性，以及经济地和稳定地制造提供没有缺陷和不均匀性的高质量图像的电子照相感光构件。
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