Process and plant for the production of a gaseous mixture containing a carrier gas an oxidizing gas and a silane
    2.
    发明授权
    Process and plant for the production of a gaseous mixture containing a carrier gas an oxidizing gas and a silane 失效
    用于生产含有载气的氧化性气体和硅烷的气态混合物的方法和装置

    公开(公告)号:US06177134B1

    公开(公告)日:2001-01-23

    申请号:US09007333

    申请日:1998-01-15

    IPC分类号: C23C1600

    摘要: Process for the production of a final gaseous mixture comprising a carrier gas, an oxidizing gas and a silane, with a predetermined content of each of the three gaseous components, comprising the steps of: a) preparing a primary gaseous mixture comprising a neutral gas and the silane, wherein the silane is present in the primary gaseous mixture at a content below a self-ignition limit of that particular silane in air; b) providing a first gas stream, comprising the carrier gas and a controlled residual content of the oxidizing gas; c) preparing the final mixture according to one or other of the following two procedures, as a function of the residual content of oxidizing gas in the gas stream comprising the carrier gas: P1: mixing the first gas stream with a second stream of the primary gaseous mixture and with a third stream of the oxidizing gas in proportions which make it possible to obtain the final mixture, the addition of the oxidizing gas stream being carried out under dynamic conditions; P2: mixing the first gas stream with a second stream of the primary gaseous mixture, in proportions which make it possible to obtain the final mixture, the addition of the primary mixture stream being carried out under dynamic conditions.

    摘要翻译: 用于生产包含三种气体组分中的每一种的预定含量的载体气体,氧化气体和硅烷的最终气体混合物的方法包括以下步骤:a)制备包含中性气体和 硅烷,其中硅烷以低于特定硅烷在空气中的自燃极限的含量存在于初级气体混合物中; b)提供第一气流,其包含载气和受控的氧化气体残留量 ; c)根据以下两种方法中的一种或其它方法制备最终混合物,作为包含载气的气流中的氧化气体的残留含量的函数:P1:将第一气流与第二气流混合 初级气体混合物和第三条氧化气体的比例使得可以获得最终的混合物,在动态条件下加入氧化气体流 离子; P2:将第一气流与主要气体混合物的第二流混合,使得可以获得最终混合物的比例,在动态条件下进行初级混合物流的添加。

    Device for the zonal surface treatment of an article by dielectric barrier discharge
    6.
    发明授权
    Device for the zonal surface treatment of an article by dielectric barrier discharge 失效
    用介质阻挡放电对物品进行区域表面处理的装置

    公开(公告)号:US07699022B2

    公开(公告)日:2010-04-20

    申请号:US10556949

    申请日:2004-05-07

    IPC分类号: C23C16/00 C23F1/00 H01L21/306

    CPC分类号: C23C16/45563 C23C16/545

    摘要: The invention relates to equipment for area-based surface treatment of an article by electric dielectric barrier discharge in the presence of a non-atmospheric controlled gaseous mixture, comprising a hollow metal electrode enabling the gaseous mixture to circulate therewithin and the mixture to be transported to a discharge area, whereby said electrode is divided into individual elements which can each be pivoted about a central axis to ensure sufficient distance between the element which is considered as being pivoted and the area of the article opposite the element in question so that the discharge cannot develop; the central pivoting axis is used as a channel for the circulation of the gaseous mixture inside the electrode and is provided with openings enabling the gaseous mixture to be evacuated to the discharge area; pivoting one of the elements of the electrodes blocks up the evacuating opening associated therewith and the gaseous mixture can only be evacuated via the evacuating openings of non-pivoted elements.

    摘要翻译: 本发明涉及在非气氛控制气体混合物存在的情况下通过电介质阻挡放电对物品进行面积表面处理的设备,其包括使气体混合物在其中循环的空心金属电极,并将待运输的混合物 放电区域,由此所述电极被分成单独的元件,每个元件可以围绕中心轴线枢转,以确保被认为是枢转的元件与制品的与所述元件相对的区域之间的足够距离,使得放电不能 发展; 中心枢转轴线用作气体混合物在电极内循环的通道,并且设置有使气体混合物能够排出到排放区域的开口; 枢转电极中的一个元件堵住与其相关联的抽空开口,并且气体混合物只能通过非枢转元件的抽空开口抽真空。

    Equipment for ultraviolet crosslinking in a controlled atmosphere
    8.
    发明授权
    Equipment for ultraviolet crosslinking in a controlled atmosphere 有权
    在受控气氛中进行紫外线交联的设备

    公开(公告)号:US07806075B2

    公开(公告)日:2010-10-05

    申请号:US10586102

    申请日:2005-01-24

    摘要: The invention concerns an installation wherein is performed a crosslinking operation for a coating such as an ink or a varnish through ultraviolet radiation or electronic beam, in the presence of a gas mixture with controlled oxygen residual content. The installation comprises a chamber including one or more UV lamps or a source of accelerated electrons, required for performing the crosslinking operation, and is characterized in that it comprises an input device adjacent the chamber comprising at least the following three components, viewed successively by the product moving to be treated: a labyrinth system, means for injecting an inert gas forming a gas knife and a channel.

    摘要翻译: 本发明涉及一种在具有受控氧残留含量的气体混合物的存在下通过紫外线辐射或电子束对涂层如油墨或清漆进行交联操作的装置。 该装置包括一个包括一个或多个UV灯或加速电子源的室,用于进行交联操作,其特征在于,其包括邻近室的输入装置,该输入装置至少包括以下三个组件, 移动待处理的产品:迷宫系统,用于注入形成气刀和通道的惰性气体的装置。

    Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them
    9.
    发明授权
    Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them 有权
    用于处理全氟化氢和氢氟碳化合物气体的方法和设备,以摧毁它们

    公开(公告)号:US06290918B1

    公开(公告)日:2001-09-18

    申请号:US09347024

    申请日:1999-07-02

    IPC分类号: B01J1908

    摘要: An apparatus for the treatment of perfluorinated and/or hydrofluorocarbon gases, for the purpose of destroying them, is provided. The apparatus includes at least one high-frequency surface-wave exciter which produces surface waves, a waveguide designed to guide the surface waves produced by the at least one wave exciter to at least one hollow dielectric tube for (i) creating, when supplied with a carrier gas an atmospheric-pressure plasma and (ii) for dissociating the molecules of the perfluorinated and/or hydrofluorocarbon gases within the plasma in order to form reactive compounds, and at least one treatment unit for the reactive fluorinated compounds which is arranged on an exit side of a corresponding hollow dielectric tube.

    摘要翻译: 提供了用于处理全氟化和/或氢氟烃气体的装置,用于破坏它们。 该装置包括产生表面波的至少一个高频表面波激励器,设计成将由至少一个波激励器产生的表面波引导到至少一个中空电介质管的波导,用于(i)在被提供时产生 载气,大气压等离子体和(ii)用于解离等离子体内的全氟化和/或氢氟烃气体的分子以形成反应性化合物,以及至少一个反应性氟化合物的处理单元,其布置在 相应的中空电介质管的出口侧。