摘要:
A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a release-modifier disposed between the support layer and the transfer layer.
摘要:
A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a release-modifier disposed between the support layer and the transfer layer.
摘要:
A donor element useful in an assemblage for imaging by exposure to light comprises a support layer formed by a stretching process, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The light-to-heat conversion layer is coated on the support prior to completion of the stretching process.
摘要:
A donor element useful in an assemblage for imaging by exposure to radiation comprises a substrate, a transfer-assist layer disposed adjacent the substrate comprising one or more water-soluble or water-dispersible radiation-absorbing compound(s), and a transfer layer disposed adjacent the transfer-assist layer opposite the substrate.
摘要:
A composite film comprising a heat-stabilised, heat-set, oriented poly(ethylene naphthalate) substrate, and a coating layer having a surface; wherein said substrate exhibits one or more of: (i) a shrinkage at 30 mins at 230° C. of less than 1%; and/or (ii) a residual dimensional change ΔLr measured at 25° C. before and after heating the substrate from 8° C. to 200° C. and then cooling to 8° C., of less than 0.75% of the original dimension; and/or (iii) a coefficient of linear thermal expansion (CLTE) within the temperature range from −40° C. to +100° C. of less than 40×10−6/° C.; and wherein the surface of said coating layer exhibits an Ra value of less than 0.6 nm, and/or an Rq value of less than 0.8 nm, the thickness of the substrate is between 50 and 250 μm and wherein the number of surface peaks in the range 300 to 600 nm per 5 cm2 area (N(300-600)) of the film is less than 50.
摘要:
A method of manufacture of a composite film, and a method of manufacturing an electronic or opto-electronic device, said method comprising the steps of (i) forming a polymeric substrate layer; (ii) stretching the substrate layer in at least one direction; (iii) heat-setting under dimensional restraint at a tension in the range of about 19 to about 75 kg/m of film width, at a temperature above the glass transition temperature of the polymer of the substrate layer but below the melting temperature thereof; (iv) heat-stabilising the film at a temperature above the glass transition temperature of the polymer of the substrate layer but below the melting temperature thereof; (v) applying a planarising coating composition such that the surface of said coated substrate exhibits an Ra value of less than 0.6 nm, and/or an Rq value of less than 0.8 nm; and (vi) providing an inorganic barrier layer of thickness from 2 to 1000 nm by high-energy vapour deposition; and optionally (vii) providing the composite film comprising said polymeric substrate layer, said planarising coating layer and said inorganic barrier layer as a substrate in said electronic or opto-electronic device; and said composite film and said electronic or opto-electronic device, per se.
摘要:
The use of a coating composition comprising: (a) from about 5 to about 50 weight percent solids, the solids comprising from about 10 to about 70 weight percent silica and from about 90 to about 30 weight percent of a partially polymerized organic silanol of the general formula RSi(OH)3, wherein R is selected from methyl and up to about 40% of a group selected from the group consisting of vinyl, phenyl, gamma-glycidoxypropyl, and gamma-methacryloxypropyl, and (b) from about 95 to about 50 weight percent solvent, the solvent comprising from about 10 to about 90 weight percent water and from about 90 to about 10 weight percent lower aliphatic alcohol, wherein the coating composition has a pH of from about 3.0 to about 8.0, for the purpose of improving the surface smoothness of a polymeric substrate, particularly a heat-stabilised, heat-set, oriented polyester substrate, and use of said coated substrate in the manufacture of an electronic or optoelectronic device containing a conjugated conductive polymer.
摘要:
A method of preventing or minimising the formation of haze in a biaxially oriented polyester film during the annealing of said film above its glass transition temperature, said method comprising: (a) selecting a biaxially oriented polyester film having glass transition temperature (Tg (° C.)); (b) disposing a coating on one or both surfaces of said biaxially oriented film; (c) annealing said coated biaxially oriented polyester film at a temperature above its glass transition temperature, wherein said coating composition is selected from: (i) an organic coating comprising a low molecular weight reactive diluent; an unsaturated oligomer; a solvent; and a photoinitiator; (ii) an organic/inorganic hybrid coating comprising a low molecular weight reactive component and/or an unsaturated oligomeric component; a solvent; and inorganic particles, and optionally further comprising a photoinitiator; (iii) a predominantly inorganic hardcoat comprising inorganic particles contained in a polymerisable predominantly inorganic matrix; and (iv) a composition comprising a cross-linkable organic polymer selected from polyethylene imine (PEI), polyester and polyinylalcohol (PVOH), and a cross-linking agent.
摘要:
A method of preventing or minimizing the formation of haze in a biaxially oriented polyester film during the annealing of said film above its glass transition temperature, said method comprising: (a) selecting a biaxially oriented polyester film having glass transition temperature (Tg (° C.)); (b) disposing a coating on one or both surfaces of said biaxially oriented film; (c) annealing said coated biaxially oriented polyester film at a temperature above its glass transition temperature, wherein said coating composition is selected from: (i) an organic coating comprising a low molecular weight reactive diluent; an unsaturated oligomer; a solvent; and a photoinitiator; (ii) an organic/inorganic hybrid coating comprising a low molecular weight reactive component and/or an unsaturated oligomeric component; a solvent; and inorganic particles, and optionally further comprising a photoinitiator; (iii) a predominantly inorganic hardcoat comprising inorganic particles contained in a polymerisable predominantly inorganic matrix; and (iv) a composition comprising a cross-linkable organic polymer selected from polyethylene imine (PEI), polyester and polyinylalcohol (PVOH), and a cross-linking agent.
摘要:
A method of manufacture of a coated polymeric film which comprises performing in sequence the steps of: (i) forming a substrate layer comprising poly(ethylene naphthalate) having a thickness in a range from 50 μm to 250 μm; (ii) stretching the substrate layer in at least one direction; (iii) heat-setting the substrate layer under dimensional restraint at a tension in the range of about 19 to about 75 kg/m of film width, at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; (iv) heat-stabilizing the substrate layer under a tension of less than 5 kg/m of film width, and at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; and (v) disposing a coating layer on a surface of the substrate layer by a process comprising applying a planarizing coating composition thereto such that a surface of said coating layer exhibits an Ra value of less than 0.6 nm, and/or an Rq value of less than 0.8 nm; and wherein the coating layer has a dry thickness in a range from 1 μm to 20 μm and the number of surface peaks in the range 300 to 600 nm per 5 cm2 area (N(300-600)) of the film after coating is less than 50.
摘要翻译:一种制造涂覆的聚合物膜的方法,其包括以下步骤:(i)形成包含厚度在50μm至250μm之间的聚萘二甲酸乙二醇酯的基材层; (ii)在至少一个方向上拉伸基底层; (iii)在高于聚萘二甲酸乙二醇酯的玻璃化转变温度但低于熔融的玻璃化转变温度的温度下,以约19至约75kg / m 2的膜宽度的张力在尺寸限制下热定型基材层 温度; (iv)在低于5kg / m 2膜宽的张力和高于聚萘二甲酸乙二醇酯的玻璃化转变温度但低于其熔融温度的温度下对基材层进行热稳定化; 和(v)通过包括在其上施加平坦化涂料组合物使得所述涂层的表面呈现小于0.6nm的Ra值和/或Rq值的方法在基材层的表面上设置涂层 小于0.8nm; 并且其中所述涂层的干燥厚度为1μm至20μm,并且涂布后的膜的每5cm2面积(N(300-600))在300-600nm范围内的表面峰数量(N(300-600))较小 超过50。