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公开(公告)号：US06316165B1
公开(公告)日：2001-11-13
申请号：US09264061
申请日：1999-03-08
IPC分类号： G03F700
CPC分类号： G03F7/091 , Y10S430/151
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，包括用于深UV应用。 本发明的抗反射组合物在需要平面化涂层时特别有用。 本发明的ARCs含有低分子量树脂，增塑剂化合物和/或低Tg树脂。 本发明还包括用于施加成形平坦化ARC涂层的方法。
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2.发明授权Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers 失效通过与乙烯基醚反应通过羟基封闭增加成像光致抗蚀剂的差异溶解度的方法
公开(公告)号：US5719003A
公开(公告)日：1998-02-17
申请号：US534565
申请日：1995-09-27
申请人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
发明人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
IPC分类号： G03F7/004 , C09D7/12 , G03F7/022 , G03F7/033 , G03F7/039 , H01L21/027 , H05K3/06 , G03F7/023 , G03F7/38
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
摘要翻译： 一种光致抗蚀剂组合物，其包含多羟基醇的碱溶性树脂和邻萘醌二叠氮磺酸酯。 光致抗蚀剂的特征在于在光活性化合物上具有至少一部分游离羟基被酸不稳定的封闭基团封端，在裂解时产生氢氧化物。
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公开(公告)号：US07147983B1
公开(公告)日：2006-12-12
申请号：US08726613
申请日：1996-10-07
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
IPC分类号： G03F7/04
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US06653049B2
公开(公告)日：2003-11-25
申请号：US09788111
申请日：2001-02-17
IPC分类号： G03F711
CPC分类号： G03F7/091
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，特别是用于深UV应用。 本发明的抗反射组合物通常包含含有高分子量聚合物的树脂粘合剂组分，例如， 具有至少约40,000道尔顿的Mw的聚合物。 本发明的ARC在应用于基底表面时表现出非凡的共形性。 例如，本发明的ARCs可以涂覆基本的形貌，例如具有高共形性的垂直和倾斜的台阶。
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公开(公告)号：US20090220888A1
公开(公告)日：2009-09-03
申请号：US12316578
申请日：2008-12-12
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US07256127B2
公开(公告)日：2007-08-14
申请号：US10661051
申请日：2003-09-13
IPC分类号： H01L21/311
CPC分类号： B81B7/0006 , B81B2203/0315 , B81C2201/0108 , H01L21/764 , H01L21/7682 , H01L23/5222 , H01L2924/0002 , Y10T428/24628 , H01L2924/00
摘要： A method of forming air gaps within a solid structure is provided. In this method, a sacrificial material is covered by an overlayer. The sacrificial material is then removed through the overlayer to leave an air gap. Such air gaps are particularly useful as insulation between metal lines in an electronic device such as an electrical interconnect structure. Structures containing air gaps are also provided.
摘要翻译： 提供了一种在固体结构内形成气隙的方法。 在该方法中，牺牲材料被覆盖层覆盖。 然后通过覆盖层去除牺牲材料以留下空隙。 这种气隙特别适用于诸如电互连结构的电子设备中的金属线之间的绝缘。 还提供了包含气隙的结构。
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公开(公告)号：US06033830A
公开(公告)日：2000-03-07
申请号：US966006
申请日：1997-11-07
IPC分类号： G03F7/11 , C09D5/00 , C09D7/12 , C09D133/14 , C09D201/02 , G02B1/11 , G03F7/09 , H01L21/027 , G03F7/38
CPC分类号： G03F7/091
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
摘要翻译： 本发明提供适合用作抗反射组合物（ARC）的新的光吸收交联组合物，特别是用于深UV应用。 本发明的ARC通常包含有效吸收反射的深紫外线照射辐射的交联剂和新型ARC树脂粘合剂。
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8.发明授权Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers 失效具有通过与乙烯基醚反应通过羟基封闭改善的差异溶解度的光致抗蚀剂组合物
公开(公告)号：US5641604A
公开(公告)日：1997-06-24
申请号：US583223
申请日：1996-01-04
申请人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
发明人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
IPC分类号： G03F7/004 , C09D7/12 , G03F7/022 , G03F7/033 , G03F7/039 , H01L21/027 , H05K3/06 , G03F7/023
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
摘要翻译： 一种光致抗蚀剂组合物，其包含多羟基醇的碱溶性树脂和邻 - 萘醌二叠氮磺酸酯。 光致抗蚀剂的特征在于在光活性化合物上具有至少一部分游离羟基被酸不稳定的封闭基团封端，在裂解时产生氢氧化物。
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公开(公告)号：US4857227A
公开(公告)日：1989-08-15
申请号：US69172
申请日：1987-07-02
申请人： Timothy G. Adams , Roger F. Sinta
发明人： Timothy G. Adams , Roger F. Sinta
IPC分类号： C09K19/20
CPC分类号： C09K19/2021
摘要： Mixtures of liquid crystal compounds from among different classes of liquid crystal ester compounds are disclosed. The mixtures exhibit freezing points substantially lower than the freezing point of either ester compound alone, so as to provide a substantially improved (widened) smectic C mesomorphic temperature range and protection against freezing or crystallization of liquid crystal material over a range of temperatures at which an electrooptic display device would typically be operated.
摘要翻译： 公开了来自不同种类的液晶酯化合物的液晶化合物的混合物。 混合物显示出比单独的酯化合物的凝固点低的凝固点，从而提供基本上改进的（加宽的）近晶C介晶温度范围，并且防止液晶材料在温度范围内的冷冻或结晶， 电光显示装置通常将被操作。
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10.发明授权公开(公告)号：US07632630B2
公开(公告)日：2009-12-15
申请号：US11418520
申请日：2006-05-03
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
摘要翻译： 本发明提供了新的光致抗蚀剂组合物，其包含树脂粘合剂，光活性组分，特别是酸发生剂，以及含有一种或多种可以减少曝光辐射的不希望的反射的发色团的染料。 优选的染料化合物是包括一种或多种发色团，例如蒽和其它有效吸收深紫外线照射辐射的多环部分的聚合材料。
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