摘要:
Slag fiber is used to fabricate a friction material. Friction factor and abrasion loss of the friction material are controlled. The friction material can be used to make linings. Thus, slag fiber can be used as a replacement for natural material to make a friction material, and waste is thus recycled.
摘要:
Slag fiber is used to fabricate a friction material. Friction factor and abrasion loss of the friction material are controlled. The friction material can be used to make linings. Thus, slag fiber can be used as a replace of natural material to make a friction material, and waste is thus recycled.
摘要:
Incinerator ashes, which is obtained after treating municipal solid waste, incinerator ashes or its plasma vitrified slag is made into mineral fibers. Cullet is added during manufacturing the mineral fibers for conditioning. The mineral fibers thus obtained have a good strength and could raise value of recycled product. In addition, it could reduce impact of the incinerator ashes to the environment and environmental protection is achieved.
摘要:
Disclosed is a method for making fiber paper. In this method, mineral fibers and PVA resin are blended in water, thus forming first solution. Polymer fibers and PVA resin are blended in water, thus forming second solution. The first solution is mixed with the second solution. A wet paper-making machine is used to make mineral fiber paper from the mixture.
摘要:
Disclosed is a method for making fiber paper. In this method, mineral fibers and PVA resin are blended in water, thus forming first solution. Polymer fibers and PVA resin are blended in water, thus forming second solution. The first solution is mixed with the second solution. A wet paper-making machine is used to make mineral fiber paper from the mixture.
摘要:
Incinerator ashes, which is obtained after treating municipal solid waste, incinerator ashes or its plasma vitrified slag is made into mineral fibers. Cullet is added during manufacturing the mineral fibers for conditioning. The mineral fibers thus obtained have a good strength and could raise value of recycled product. In addition, it could reduce impact of the incinerator ashes to the environment and environmental protection is achieved.
摘要:
Disclosed is a method for making a refractory material from aluminum residues of aluminum recycling. At first, the aluminum residues is mixed with adhesive solution so that the percentage by weight of the adhesive solution is 5 wt % to 10 wt %. The mixture is granulated into grains. The grains are filled in a mold, pressed and then removed from the mold so that the grains are turned into a green body. The green body is heated in a furnace at a range of temperature from 1100° C. to 1400° C. so that the grains are sintered and become a refractory material.
摘要:
The present disclosure uses aluminum residues to fabricate artificial stones. The aluminum residues are obtained from a recycle process of aluminum scrap. The aluminum residues is made into dross and baghouse dust as raw materials for the artificial stones. The artificial stones thus made are improved in characteristics of mechanical strength, hardness, abrasion resistance, flame resistance and anti-oxidation. Hence, the present disclosure reduces impacts to the nature; obtains derived products from recycled aluminum residues; increases commercial income; decreases cost for handling aluminum residues; and saves the use of aluminum oxide, aluminium hydroxide or silicon oxide on making artificial stones. The artificial stones thus made are fit to be used in fields of green material, green construction and green industry.
摘要:
The present invention provides an anti-pop circuit including a diode. A control signal is used to change the bias of the diode so as to shunt the “pop” sound usually happening when the power is turned on or off.
摘要:
A dynamic random access memory cell having vertical channel transistor includes a semiconductor pillar, a drain layer, an assisted gate, a control gate, a source layer, and a capacitor. The vertical channel transistor has an active region formed by the semiconductor pillar. The drain layer is formed at the bottom of the semiconductor pillar. The assisted gate is formed beside the drain layer, and separated from the drain layer by a first gate dielectric layer. The control gate is formed beside the semiconductor pillar, and separated from the active region by a second gate dielectric layer. The source layer is formed at the top of the semiconductor pillar. The capacitor is formed to electrical connect to the source layer.