公开(公告)号：US20160236124A1

公开(公告)日：2016-08-18

申请号：US15025045

申请日：2014-09-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yuichi YOSHIDA ,  Ryouichirou NAITOU ,  Arnaud Alain Jean DAUENDORFFER ,  Koji TAKAYANAGI ,  Shinobu MIYAZAKI

IPC: B01D37/02 ,  B01D35/18

CPC classification number: B01D37/02 ,  B01D35/18 ,  H01L21/67017

Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract translation: 在一个实施例中，在将新的过滤器单元（3）安装在处理液供给装置中之后，在使含溶剂的处理液通过过滤器单元之前，进行将过滤器单元与溶剂浸泡的步骤 预处理，然后从其中排出溶剂。 构成过滤器单元的过滤器部件（31）的材料对溶剂的溶解度大于材料对处理液体的溶解度。 该步骤使得可以在处理液体通过过滤器单元之前去除可能从过滤部分洗脱到处理液中以产生异物（颗粒）的组分。

公开(公告)号：US20240248413A1

公开(公告)日：2024-07-25

申请号：US18416087

申请日：2024-01-18

Applicant: Tokyo Electron Limited

Inventor： Takeshi SHIMOAOKI ,  Arnaud Alain Jean DAUENDORFFER ,  Keisuke YOSHIDA ,  Shinichiro KAWAKAMI ,  Yuya KAMEI ,  Soichiro OKADA ,  Takafumi NIWA

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  H01L21/033

CPC classification number: G03F7/706837 ,  G03F7/161 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/70008 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70866 ,  H01L21/0337 ,  G03F7/0042

Abstract: A substrate treatment method includes: developing a substrate which has a coating film of an inorganic resist formed on a base film thereon and has been subjected to an exposure treatment, with a developing solution to form a pattern of the inorganic resist; supplying an embedding solution to the developed substrate to fill a space between adjacent protrusions of the pattern; drying the filled embedding solution to form an embedded film on the substrate; and reducing a thickness of the embedded film by an ultraviolet ray.

公开(公告)号：US20240038533A1

公开(公告)日：2024-02-01

申请号：US18022213

申请日：2021-08-10

Applicant: Tokyo Electron Limited

Inventor： Hiroki TADATOMO ,  Makoto MURAMATSU ,  Kenichi UEDA ,  Arnaud Alain Jean DAUENDORFFER ,  Tomoya ONITSUKA ,  Keisuke YOSHIDA

IPC: H01L21/027 ,  H01L21/311 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/0274 ,  H01L21/31144 ,  H01L21/68742 ,  H01L21/67098

Abstract: The present disclosure provides a substrate processing method and a substrate processing apparatus which are effective in preventing pattern collapse of an uneven pattern. The substrate processing method according to an exemplary embodiment includes replacing a liquid in a recess of a substrate having an uneven pattern of a negative type resist including a metal formed on a surface of the substrate with a solid-state stiffener, and subjecting the substrate to a molecular weight reduction processing that reduces the number of intermolecular bonds contained in the solid-state stiffener while maintaining the solid-state stiffener in a solid state.

公开(公告)号：US20200016521A1

公开(公告)日：2020-01-16

申请号：US16580292

申请日：2019-09-24

Applicant: Tokyo Electron Limited

Inventor： Yuichi YOSHIDA ,  Ryouichirou NAITOU ,  Arnaud Alain Jean DAUENDORFFER ,  Koji TAKAYANAGI ,  Shinobu MIYAZAKI

IPC: B01D37/02 ,  B01D35/18

Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.