Method for producing plasma display panel
    1.
    发明授权
    Method for producing plasma display panel 失效
    等离子体显示面板的制造方法

    公开(公告)号:US08113899B2

    公开(公告)日:2012-02-14

    申请号:US12502369

    申请日:2009-07-14

    IPC分类号: H01J9/24

    CPC分类号: H01J11/12 H01J9/261

    摘要: A method for producing a plasma display panel, the method comprising the steps of: (i) preparing a front panel and a rear panel, the front panel being a panel wherein an electrode A, a dielectric layer A and a protective layer are formed on a substrate A, and the rear panel being a panel wherein an electrode B, a dielectric layer B, a partition wall and a phosphor layer are formed on a substrate B; (ii) applying a glass frit material onto a peripheral region of the substrate A or B, and then opposing the front and rear panels with each other such that the glass frit material is interposed therebetween; (iii) supplying a gas into a space formed between the opposed front and rear panels from a direction lateral to the opposed front and rear panels, under such a condition that the front and rear panels are heated; and (iv) melting the glass frit material to cause the front and rear panels to be sealed.

    摘要翻译: 一种等离子体显示面板的制造方法,其特征在于,包括以下步骤:(i)前面板和后面板的制作,前面板为面板,其中,电极A,电介质层A和保护层形成在 基板A,后面板是在基板B上形成电极B,电介质层B,分隔壁和荧光体层的面板; (ii)将玻璃料材料施加到基板A或B的周边区域上,然后使前后板彼此相对,使得玻璃料材料插入其间; (iii)在前后板被加热的条件下,从相对的前板和后板的横向方向将气体供给到形成在相对的前板和后板之间的空间中; 和(iv)熔化玻璃料材料以使前面板和后面板被密封。

    METHOD FOR PRODUCING PLASMA DISPLAY PANEL
    2.
    发明申请
    METHOD FOR PRODUCING PLASMA DISPLAY PANEL 失效
    生产等离子显示面板的方法

    公开(公告)号:US20100015877A1

    公开(公告)日:2010-01-21

    申请号:US12502369

    申请日:2009-07-14

    IPC分类号: H01J9/26

    CPC分类号: H01J11/12 H01J9/261

    摘要: A method for producing a plasma display panel, the method comprising the steps of: (i) preparing a front panel and a rear panel, the front panel being a panel wherein an electrode A, a dielectric layer A and a protective layer are formed on a substrate A, and the rear panel being a panel wherein an electrode B, a dielectric layer B, a partition wall and a phosphor layer are formed on a substrate B; (ii) applying a glass frit material onto a peripheral region of the substrate A or B, and then opposing the front and rear panels with each other such that the glass frit material is interposed therebetween; (iii) supplying a gas into a space formed between the opposed front and rear panels from a direction lateral to the opposed front and rear panels, under such a condition that the front and rear panels are heated; and (iv) melting the glass frit material to cause the front and rear panels to be sealed.

    摘要翻译: 一种等离子体显示面板的制造方法,其特征在于,包括以下步骤:(i)前面板和后面板的制作,前面板为面板,其中,电极A,电介质层A和保护层形成在 基板A,后面板是在基板B上形成电极B,电介质层B,分隔壁和荧光体层的面板; (ii)将玻璃料材料施加到基板A或B的周边区域上,然后使前后板彼此相对,使得玻璃料材料插入其间; (iii)在前后板被加热的条件下,从相对的前板和后板的横向方向将气体供给到形成在相对的前板和后板之间的空间中; 和(iv)熔化玻璃料材料以使前面板和后面板被密封。

    Sputtering apparatus and method
    3.
    发明授权
    Sputtering apparatus and method 失效
    溅射装置和方法

    公开(公告)号:US5626727A

    公开(公告)日:1997-05-06

    申请号:US504516

    申请日:1995-07-20

    CPC分类号: H01J37/347 H01J37/3405

    摘要: A sputtering apparatus uses a plurality of rectangular targets to form a thin film on a substrate, and includes a plurality of magnets disposed along both side edges of each target in such a manner that the polarities of adjacent magnets along the side edges of the targets are opposite, and polarities of the magnets confronting each other across the targets are opposite. The surfaces of at least two targets are inclined to a surface of the substrate at an angle not smaller than 30.degree. and not larger than 60.degree..

    摘要翻译: 溅射装置使用多个矩形目标在基板上形成薄膜,并且包括沿着目标的两个侧边缘设置的多个磁体,使得沿着靶的侧边缘的相邻磁体的极性为 相反的,并且彼此面对的磁体的极性相反。 至少两个靶的表面以不小于30°并且不大于60°的角度倾斜到基底的表面。

    Sputtering electrode
    4.
    发明授权
    Sputtering electrode 失效
    溅射电极

    公开(公告)号:US5512156A

    公开(公告)日:1996-04-30

    申请号:US265019

    申请日:1994-06-24

    IPC分类号: C23C14/35 H01J37/34

    摘要: A magnetron sputtering electrode assembly which is used in a sputtering system having a rectangular flat-plate target, includes permanent magnets arranged along the longitudinal edges of the target to pass lines of magnetic forces in parallel to the surface of the rectangular flat-plate target, and a driving device for reversing polarity of the magnets to change by 180 degrees the direction of the lines of magnetic force caused by the permanent magnets passing in parallel to the surface of the rectangular flat-plate target.

    摘要翻译: 在具有矩形平板靶的溅射系统中使用的磁控溅射电极组件包括沿着靶的纵向边缘布置的永磁体,以平行于矩形平板靶的表面传递磁力线, 以及驱动装置,用于使磁铁的极性反转,使永磁体平行于矩形平板靶的表面产生的磁力线的方向变化180度。

    Plasma processing apparatus
    5.
    发明授权
    Plasma processing apparatus 失效
    等离子体处理装置

    公开(公告)号:US5766364A

    公开(公告)日:1998-06-16

    申请号:US893940

    申请日:1997-07-15

    摘要: Generated heat is effectively dissipated to prevent thermal deformation of a gas ejector plate in a plasma processing apparatus which is capable of processing a substrate of large scale. A temperature controlling plate 106 and heat conductor 109 are fixedly disposed on the upper electrode-cum-gas ejector plate 105 which is provided with a multiplicity of gas ejecting apertures 105a disposed at regular intervals. The heat conductor 109 is constructed to be a latticed member for effectively conducting heat from the gas ejector plate 105 to the temperature controlling plate 106, and has a plurality of gas pressure equalizing spaces 109a defined between crossing bars of the lattice for pressuring process gas to be evenly ejected through the gas ejecting apertures 105a.

    摘要翻译: 产生的热量被有效地消散,以防止能够处理大规模基板的等离子体处理装置中的气体喷射板的热变形。 温度控制板106和导热体109被固定地设置在上部电极 - 气体顶出器板105上,该喷射板105设置有以规则间隔设置的多个气体喷射孔105a。 热导体109被构造为用于将热量从气体喷射板105有效地​​传导到温度控制板106的格子构件,并且具有限定在格子的交叉条之间的多个气体平衡空间109a,用于将工作气体加压到 均匀地喷射通过气体喷射孔105a。