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公开(公告)号：US4384011A
公开(公告)日：1983-05-17
申请号：US302237
申请日：1981-09-14
CPC分类号： B41N1/12
摘要： A process for producing novel resinous gravure printing plates comprises coating on a printing substrate such as a cylinder a radiation-curable resin coating composition containing in a specific ratio a soluble polyamide resin and a radiation-polymerizable monomer or the like dissolved in a solvent, curing the coated film by irradiation with actinic rays, and engraving the resulting cured film. As a result, a novel resinous gravure printing plate having excellent engraving property, printing durability, and solvent resistance is produced.
摘要翻译： 一种生产新型树脂凹版印刷版的方法，包括在诸如圆筒的印刷基材上涂布一种辐照固化树脂涂料组合物，该组合物以特定比例包含溶解在溶剂中的可溶性聚酰胺树脂和可辐射聚合单体等，固化 通过照射光化射线涂覆涂膜，并雕刻所得的固化膜。 结果，产生了具有优异的雕刻性能，印刷耐久性和耐溶剂性的新型树脂凹版印刷版。
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2.发明授权Method for providing a pattern-wise photoresist layer on a substrate plate and a surface-protected substrate plate therefor 失效在基板上提供图案化的光致抗蚀剂层的方法和用于其的表面保护的基板
公开(公告)号：US4557996A
公开(公告)日：1985-12-10
申请号：US614655
申请日：1984-05-29
申请人： Toshimi Aoyama , Hiroyuki Tohda , Kazuo Kato , Hisashi Nakane
发明人： Toshimi Aoyama , Hiroyuki Tohda , Kazuo Kato , Hisashi Nakane
CPC分类号： G03F7/095 , G03F7/091 , H05K3/064 , H05K2203/0577 , H05K2203/066
摘要： The invention provides an improved method for the so-called dry-film process for forming a pattern-wise photoresist layer on the substrate surface in which a substrate is overlaid and laminated with a preformed film of a photosensitive composition called a dry film and photolithographically processed. In the inventive method, different from conventional dry-film processes, the substrate plate is first provided with a protecting layer of a photosensitive composition containing a halation inhibitor and the lamination with a dry film is performed without removing the protecting layer. After pattern-wise exposure to light, development of the photosensitive layer is undertaken by use of a developer solvent capable of dissolving both of the protecting layer and the pattern-forming layer. Despite the intervention of the protecting layer, the resolving power and image reproducibility are excellent.
摘要翻译： 本发明提供了一种用于在衬底表面上形成图案化光致抗蚀剂层的所谓干膜工艺的改进方法，其中衬底被覆盖并与预先形成的称为干膜的感光组合物的膜层压并且光刻加工 。 在本发明的方法中，与传统的干膜工艺不同，首先提供含有防晕抑制剂的感光组合物的保护层，并且在不除去保护层的情况下进行与干膜的层压。 在图案曝光之后，通过使用能够溶解保护层和图案形成层两者的显影剂溶剂进行感光层的显影。 尽管保护层的干预，分辨率和图像再现性都很好。
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公开(公告)号：US5185235A
公开(公告)日：1993-02-09
申请号：US504070
申请日：1990-03-30
申请人： Hiromitsu Sato , Kenji Tazawa , Toshimi Aoyama
发明人： Hiromitsu Sato , Kenji Tazawa , Toshimi Aoyama
摘要： The remover solution of the invention comprises (A) from 35 to 80% by weight of an alcoholic solvent such as ethylene glycol monoethyl ether, (B) from 10 to 40% by weight of an organic solvent which is a halogenated hydrocarbon solvent, e.g., 1,2-dichlorobenzene and methylene chloride, an ether solvent, e.g., tetrahydrofuran, or an aromatic solvent, e.g., benzene and xylene, and (C) from 0.1 to 25% by weight of a quaternay ammonium compound such as tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide. Different from conventional remover solutions which only can swell cured photoresist compositions, the inventive remover solution has a power to completely dissolve a cured photoresist layer to give a quite satisfactory result in the removing works of patterned photoresist layers in the manufacture of semiconductor devices.
摘要翻译： 本发明的去除剂溶液包含（A）35至80重量％的醇溶剂如乙二醇单乙醚，（B）10至40重量％的作为卤代烃溶剂的有机溶剂，例如 ，1,2-二氯苯和二氯甲烷，醚溶剂，例如四氢呋喃或芳族溶剂，例如苯和二甲苯，和（C）0.1至25重量％的季铵化合物如四甲基氢氧化铵 和三甲基羟乙基铵氢氧化物。 与仅可以溶胀固化的光致抗蚀剂组合物的常规去除剂溶液不同，本发明的去除剂溶液具有完全溶解固化的光致抗蚀剂层的功能，以在半导体器件的制造中去除图案化的光致抗蚀剂层的工作方面给出相当令人满意的结果。
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公开(公告)号：US4933260A
公开(公告)日：1990-06-12
申请号：US401081
申请日：1989-08-31
CPC分类号： G03F7/027 , Y10S430/11
摘要： A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.
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公开(公告)号：US5645974A
公开(公告)日：1997-07-08
申请号：US635814
申请日：1996-04-22
申请人： Katsuyuki Ohta , Toshiya Takagi , Toshimi Aoyama
发明人： Katsuyuki Ohta , Toshiya Takagi , Toshimi Aoyama
CPC分类号： G03F7/12 , G03F7/031 , Y10S430/117 , Y10S430/124
摘要： Compositions comprising a linear base polymer, an ethylenically unsaturated addition-polymerizable compound and a combination of (A) a 1-benzoyl-1-amino-substituted-1-benzylalkane with (B) an .alpha.-phenyl-.alpha.,.alpha.-dialkoxyacetophenone as photopolymerization initiator are suitable for the production of thick-film printing plates.
摘要翻译： 包含线性基础聚合物，烯键式不饱和可加成聚合化合物和（A）1-苯甲酰基-1-氨基取代的-1-苄基链烷烃与（B）α-苯基-α，α-二烷氧基苯乙酮的组合 光聚合引发剂适用于生产厚膜印刷版。
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6.发明授权
公开(公告)号：US5368991A
公开(公告)日：1994-11-29
申请号：US94214
申请日：1993-07-21
CPC分类号： G03F7/0007 , G02F1/133512
摘要： Disclosed is a photosensitive resin composition for use in a light-shielding film, comprising a photosensitive resin and a light-shielding coloring material, wherein light transmission properties after formation of the light-shielding film are controlled by the light-shielding coloring material so that (i) the light transmission through the light-shielding film is 1% or more in at least one wavelength of a light wavelength region of from 330 nm to less than 425 nm, and (ii) the light transmission through the light-shielding film is 2% or less in a light wavelength region of from 425 to 650 nm.
摘要翻译： 公开了一种用于遮光膜的感光性树脂组合物，其包含光敏树脂和遮光性着色材料，其中在形成遮光膜之后的透光性由遮光性着色材料控制，使得 （i）在330nm至小于425nm的光波长区域的至少一个波长中通过遮光膜的透光率为1％以上，（ii）通过遮光膜的透光率 在425〜650nm的光波长区域中为2％以下。
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公开(公告)号：US5541038A
公开(公告)日：1996-07-30
申请号：US417186
申请日：1995-04-05
申请人： Katsuyuki Ohta , Toshiya Takagi , Toshimi Aoyama
发明人： Katsuyuki Ohta , Toshiya Takagi , Toshimi Aoyama
CPC分类号： G03F7/12 , G03F7/031 , Y10S430/117 , Y10S430/124
摘要： Compositions comprising a linear base polymer, an ethylenically unsaturated addition-polymerizable compound and a combination of (A) a 1-benzoyl-1-amino-substituted-1-benzylalkane with (B) an .alpha.-phenyl-.alpha.,.alpha.-dialkoxyacetophenone as photopolymerization initiator are suitable for the production of thick-film printing plates.
摘要翻译： 包含线性基础聚合物，烯键式不饱和可加成聚合化合物和（A）1-苯甲酰基-1-氨基取代的-1-苄基链烷烃与（B）α-苯基-α，α-二烷氧基苯乙酮的组合 光聚合引发剂适用于生产厚膜印刷版。
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公开(公告)号：US5087552A
公开(公告)日：1992-02-11
申请号：US420961
申请日：1989-10-13
申请人： Tomoki Horigome , Kenji Tazawa , Toshimi Aoyama
发明人： Tomoki Horigome , Kenji Tazawa , Toshimi Aoyama
IPC分类号： G03F7/027 , C08F8/14 , C08F290/00 , C08F290/12 , C08F299/00 , C08L63/10 , G03F7/033
CPC分类号： G03F7/033 , C08F290/126 , C08F8/14 , C08L63/10 , C08F2810/30
摘要： The invention provides a photosensitive resin composition useful as a solder resist, etching resist or plating resist in the manufacture of printed circuit boards to exhibit excellent resistance against heat and chemicals and good adhesion to the substrate surface. The composition essentially comprises (a) a copolymeric resin of an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride and an ethylenically unsaturated polymerizable compound, of which the acid anhydride units are partially esterified with an unsaturated alcohol and a saturated alcohol, and (b) a photopolymerization initiator. The composition may further comprise optional ingredients such as (c) a photopolymerizable monomeric compound, (d) an epoxy-based resin and (e) an aromatic diamine compound.
摘要翻译： 本发明提供了一种在印刷电路板的制造中用作阻焊剂，抗蚀剂或电镀抗蚀剂的光敏树脂组合物，以显示出优异的耐热和化学性能以及对基材表面的良好粘附性。 组合物基本上包含（a）α，β-不饱和二羧酸酐和烯键式不饱和可聚合化合物的共聚树脂，其中酸酐单元用不饱和醇和饱和醇部分酯化，和（b） 光聚合引发剂。 组合物还可以包含任选的成分，例如（c）可光聚合的单体化合物，（d）环氧基树脂和（e）芳族二胺化合物。
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公开(公告)号：US4209581A
公开(公告)日：1980-06-24
申请号：US945341
申请日：1978-09-25
IPC分类号： C08F299/00 , C08F290/00 , C08G12/00 , C08G12/10 , C08G12/12 , C08G12/22 , G03F7/032 , G03F7/038 , G03C1/68
摘要： A photocurable soluble resin suitable for manufacturing photosensitive resin plates obtained by polycondensing an alkylol derivative or an alkylated alkylol derivative of urea or thiourea with an N-alkylolacrylamide or N-alkylolmethacrylamide in the presence of an acid or an ammonium salt thereof or by reacting urea or thiourea with formaldehyde to form a linear polycondensation product and then grafting an N-alkylolacrylamide or N-alkylolmethacrylamide on the linear polycondensation product in the presence of an acid or an ammonium salt thereof. This soluble resin is incorporated with known soluble resins such as soluble nylon, photosensitizers and thermal polymerization inhibitors and mixed thoroughly to obtain a soluble photosensitive resin composition.
摘要翻译： 适用于制造感光性树脂板的光固化性可溶性树脂，其通过在酸或其铵盐的存在下，使N-羟烷基丙烯酰胺或N-羟烷基甲基丙烯酰胺在其酸或其铵盐的存在下使羟烷基衍生物或脲或硫脲的烷基化羟烷基衍生物缩聚得到，或者使脲或 硫脲与甲醛形成线性缩聚产物，然后在酸或其铵盐的存在下将N-羟烷基丙烯酰胺或N-羟烷基甲基丙烯酰胺接枝在线性缩聚产物上。 该可溶性树脂与已知的可溶性树脂如可溶性尼龙，光敏剂和热聚合抑制剂混合并充分混合以获得可溶性光敏树脂组合物。
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公开(公告)号：US06291133B1
公开(公告)日：2001-09-18
申请号：US09308783
申请日：1999-05-25
IPC分类号： G03F7028
CPC分类号： C08G18/4018 , C08G18/67 , C08G18/672 , C08G18/8175 , G03F7/035 , G03F7/0388
摘要： The present invention provides a photosensitive resin composition which comprises an urethane resin obtained by reacting (A) a carboxyl group-containing polymer having an acid value of 30 mg KOH/g or more and a glass transition temperature of 30° C. or more, (B) a compound having two isocyanate groups in one molecule, (C) a compound having two hydroxyl groups in one molecule and (D) a photopolymerizable unsaturated monomer having one hydroxyl group in one molecule, and a photopolymerization initiator, and a resin plate for flexography using the photosensitive resin composition, whereby the photosensitive resin composition having water developing properties, high in sensitivity and impact resilience, and excellent in water resistance, ink resistance and press life of a hardened portion forming a line pattern area of a printing plate material and the resin plate for flexography prepared by the use of the photosensitive resin composition can be provided.
摘要翻译： 本发明提供一种感光性树脂组合物，其包含通过使（A）含有酸值为30mg KOH / g以上的玻璃化转变温度为30℃以上的含羧基的聚合物反应而得到的聚氨酯树脂， （B）在一个分子中具有两个异氰酸酯基的化合物，（C）在一个分子中具有两个羟基的化合物和（D）在一个分子中具有一个羟基的光聚合性不饱和单体和光聚合引发剂，以及树脂板 对于使用感光性树脂组合物的柔性版印刷，由此具有水显影性，高灵敏度和回弹性的感光性树脂组合物，并且形成印版材料的线图案区域的硬化部分的耐水性，耐油墨性和印刷寿命优异 并且可以提供通过使用感光性树脂组合物制备的用于柔性版印刷用树脂板。
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