Method of producing color filters
    4.
    发明授权
    Method of producing color filters 失效
    生产滤色片的方法

    公开(公告)号:US4311773A

    公开(公告)日:1982-01-19

    申请号:US120114

    申请日:1980-02-11

    CPC分类号: H01L31/02162 G03F7/0007

    摘要: A method of producing color filters comprising:a step for forming a photosensitive film by coating, on a rugged substrate, a mixture of a light-absorbing material which absorbs light and which can be removed with a solvent and a photosensitive material;a step for irradiating light onto the photosensitive film through a predetermined pattern;a step for removing dissolvable portions of the photosensitive film and the light-absorbing material from the photosensitive film which remains on the substrate; anda step for dyeing the photosensitive film into any desired color.

    摘要翻译: 一种彩色滤光片的制造方法,其特征在于,包括:通过在粗糙基板上涂布吸收光并可用溶剂和感光材料除去的吸光材料的混合物来形成感光膜的步骤; 用于通过预定图案将光照射到感光膜上的步骤; 从保留在基板上的感光膜除去感光膜和光吸收材料的可溶解部分的步骤; 以及将感光膜染色成任何所需颜色的步骤。

    Color solid-state imager and method of making the same
    5.
    发明授权
    Color solid-state imager and method of making the same 失效
    彩色固态成像仪及其制作方法

    公开(公告)号:US4285007A

    公开(公告)日:1981-08-18

    申请号:US123085

    申请日:1980-02-20

    摘要: A color solid-state imager comprises a semiconductor body over which are successively laminated a predetermined number of filter layers of any desired shape having predetermined spectral characteristics and, laminated on the filter layers, a predetermined number of layers composed of a transparent, organic high molecular material which is sensitive to radiation, the semiconductor substrate having at least a detector portion composed of an array of a plurality of optical detector elements. The method of making color solid-state imagers can be simplified by at least using the radiation-sensitive high molecular material for the intermediate layers or protection layers which are used for forming a laminate construction of color-decomposing filters.Further, in mounting the color-decomposing filters on the semiconductor substrate, it is particularly preferred to form beforehand a film of an organic high molecular material.

    摘要翻译: 彩色固态成像器包括半导体本体,其上依次层叠具有预定光谱特性的任意所需形状的预定数量的滤光层,并且层叠在滤光层上,预定数量的层由透明的有机高分子 对辐射敏感的材料,所述半导体衬底至少具有由多个光学检测器元件的阵列组成的检测器部分。 通过至少使用辐射敏感的高分子材料用于形成分色滤光片的层叠结构的中间层或保护层,可以简化制备彩色固态成像器的方法。 此外,在将分色滤光片安装在半导体基板上时,特别优选预先形成有机高分子材料的膜。

    Photosensitive resin composition and method of forming resist images
    8.
    发明授权
    Photosensitive resin composition and method of forming resist images 失效
    光敏树脂组合物和形成抗蚀剂图像的方法

    公开(公告)号:US06319649B1

    公开(公告)日:2001-11-20

    申请号:US09024873

    申请日:1998-02-17

    IPC分类号: G03F7021

    摘要: A chemically amplified photosensitive resin composition containing a first compound forming an acid by irradiation of actinic ray and a second compound that changes the solubility to an aqueous alkali solution with acid-catalyzed reaction wherein an ion dissociative compound having the composition represented by the general formula (1) or (2), as well a method of forming a resist pattern using the composition are disclosed, the formulae being expressed by: where each of R2, R3 and R4 represents hydrogen, and an alkyl or aryl group of 1 to 7 carbon atoms, at least one of R1, R2, R3 and R4 represents hydrogen, Y1 represents chlorine, bromine, iodine, carbonate group of 1 to 7 carbon atoms or sulfonate group of 1 to 7 carbon atoms, and

    摘要翻译: 一种化学放大型光敏树脂组合物,其含有通过光化射线照射形成酸的第一化合物和通过酸催化反应改变其对碱性水溶液的溶解度的第二化合物,其中具有由通式表示的组成的离子解离化合物( 1)或(2),以及使用该组合物形成抗蚀剂图案的方法,其公式表示为:其中R2,R3和R4各自表示氢,并且具有1至7个碳原子的烷基或芳基 R1,R2,R3和R4中的至少一个表示氢,Y1表示氯,溴,碘,1〜7个碳原子的碳酸酯基或1〜7个碳原子的磺酸酯基,

    Method of forming a positive photoresist pattern utilizing contrast
enhancement overlayer containing trifluoromethanesulfonic,
methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
    9.
    发明授权
    Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt 失效
    使用含有三氟甲磺酸,甲磺酸或三氟甲烷乙酸芳族重氮盐的对比增强覆盖层形成正性光致抗蚀剂图案的方法

    公开(公告)号:US5290666A

    公开(公告)日:1994-03-01

    申请号:US715694

    申请日:1991-06-17

    CPC分类号: G03F7/091 G03C1/54

    摘要: The present invention relates to a method of forming a pattern using a photosensitive film having bleaching properties for use as a contrast enhancing layer. The photosensitive film comprises an aromatic diazonium salt having extremely high purity content. In addition, no harmful metals are incorporated during preparation. Fine patterns of various semiconductor devices can thus be formed with high accuracy. The diazonium salt is selected from the group consisting of trifluromethanesulfonic acid salt, methanesulfonic acid salts, and trifluromethaneacetic salts of aromatic diazonium compounds.

    摘要翻译: 本发明涉及使用具有漂白性的感光膜形成图案的方法,用作对比增强层。 感光膜包含具有极高纯度含量的芳族重氮盐。 此外,在制备过程中没有掺入有害金属。 因此可以高精度地形成各种半导体器件的精细图案。 重氮盐选自芳族重氮化合物的三氟甲烷磺酸盐,甲磺酸盐和三氟乙烷醋酸盐。