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    SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND BAFFLE STRUCTURE OF THE SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND BAFFLE STRUCTURE OF THE SUBSTRATE PROCESSING APPARATUS 有权
    基板加工装置，制造半导体装置的方法以及基板加工装置的结构

    公开(公告)号：US20120132228A1

    公开(公告)日：2012-05-31

    申请号：US13306277

    申请日：2011-11-29

    申请人： Hidehiro Yanai ,  Shin Hiyama ,  Toru Kakuda ,  Toshiya Shimada ,  Tomihiro Amano

    发明人： Hidehiro Yanai ,  Shin Hiyama ,  Toru Kakuda ,  Toshiya Shimada ,  Tomihiro Amano

    IPC分类号： B08B6/00 ,  H01L21/3065

    CPC分类号： H01J37/32458 ,  G03F7/427 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32633 ,  H01L21/31138

    摘要： A conventional substrate processing apparatus for generating plasma cannot generate plasma with high density and thus throughput of substrate processing is low. In order to solve this problem, provided is a substrate processing apparatus including a reaction vessel having a tubular shape and provided with a coil installed at an outer circumference thereof; a cover installed at a first end of the reaction vessel; a gas introduction port installed at the cover; a first plate installed between the gas introduction port and an upper end of the coil; a second plate installed between the first plate and the upper end of the coil; a substrate processing chamber installed at a second end of the reaction vessel; and a gas exhaust part connected to the substrate processing chamber.

    摘要翻译： 用于产生等离子体的常规基板处理装置不能产生高密度的等离子体，因此基板处理的生产量低。 为了解决这个问题，提供了一种基板处理装置，其包括具有管状形状的反应容器，并且设置有设置在其外周的线圈; 安装在反应容器的第一端的盖子; 安装在盖子上的气体导入口; 安装在气体引入口和线​​圈的上端之间的第一板; 安装在所述第一板和所述线圈的上端之间的第二板; 安装在反应容器的第二端的基板处理室; 以及连接到基板处理室的排气部。

    Composite particle and process for producing the same
    3.
    发明申请
    Composite particle and process for producing the same 失效
    复合粒子及其制造方法

    公开(公告)号：US20060067895A1

    公开(公告)日：2006-03-30

    申请号：US11231991

    申请日：2005-09-22

    申请人： Masafumi Miyamoto ,  Yasushi Sasaki ,  Toshiya Shimada ,  Shinobu Hiramatsu

    发明人： Masafumi Miyamoto ,  Yasushi Sasaki ,  Toshiya Shimada ,  Shinobu Hiramatsu

    IPC分类号： A61K8/81 ,  A61K8/27

    CPC分类号： C09C1/043 ,  A61K8/02 ,  A61K8/11 ,  A61K8/27 ,  A61K8/8111 ,  A61K2800/412 ,  A61Q17/04 ,  C01P2002/80 ,  C01P2004/61 ,  C08J3/203 ,  C08J2323/04

    摘要： The invention provides a composite particle, a process for producing the same, and cosmetics containing the same The invention relates to composite particles containing a polyolefin-based resin having a crystallization degree of 80% or less and zinc oxide and obtained by hot melt microencapsulation or spray cooling, or composite particles containing a polyolefin-based resin having a crystallization degree of 80% or less and zinc oxide, wherein the degree of remaining zinc oxide in the particles is 50 wt % or more after being dipped for 1 hour in 0.5 mol/L hydrochloric acid solution at 25° C. (solution composition: water and ethanol in equal volumes), a process for producing the composite particles, and cosmetics containing the composite particles.

    摘要翻译： 本发明提供一种复合颗粒及其制造方法，含有该化合物的化妆品技术领域本发明涉及含有结晶度为80％以下的聚烯烃系树脂和氧化锌的热复合微粒化复合粒子， 喷雾冷却或含有结晶度为80％以下的聚烯烃类树脂的复合粒子和氧化锌，其中，在0.5摩尔浸渍1小时后，粒子中剩余氧化锌的含量为50重量％以上 / L盐酸溶液（溶液组成：等体积的水和乙醇），复合粒子的制造方法和含有复合粒子的化妆品。

    Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
    5.
    发明申请
    Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device 有权
    基板处理装置及制造半导体装置的方法

    公开(公告)号：US20130012035A1

    公开(公告)日：2013-01-10

    申请号：US13536128

    申请日：2012-06-28

    申请人： Yukinori Aburatani ,  Toshiya Shimada ,  Kenji Shinozaki ,  Tomihiro Amano ,  Hiroshi Ashihara ,  Hidehiro Yanai ,  Masahiro Miyake ,  Shin Hiyama

    发明人： Yukinori Aburatani ,  Toshiya Shimada ,  Kenji Shinozaki ,  Tomihiro Amano ,  Hiroshi Ashihara ,  Hidehiro Yanai ,  Masahiro Miyake ,  Shin Hiyama

    IPC分类号： H01L21/26

    CPC分类号： H01L21/67115 ,  C23C16/481 ,  F27B5/14 ,  F27B17/0025 ,  F27D2009/0056 ,  H01L21/324 ,  H05B3/0047 ,  H05B3/08

    摘要： A substrate processing apparatus capable of increasing the life span of a lamp for heating a substrate is provided. The substrate processing apparatus includes: a light receiving chamber for processing a substrate; a substrate support unit inside the light receiving chamber; a lamp including an electrical wire, and a seal accommodating the electrical wire to hermetically seal the lamp with a gas therein, the lamp irradiating the substrate with a light; a lamp receiving unit outside the light receiving chamber to accommodate the lamp therein, the lamp receiving unit including a lamp connector connected to the lamp to supply an electric current through the electrical wire, a heat absorption member including a material having a thermal conductivity higher than that of the seal, and a base member fixing the heat absorption member; and an external electrical wire connected to the lamp connector to supply current to the lamp connector.

    摘要翻译： 提供了能够增加用于加热基板的灯的寿命的基板处理装置。 基板处理装置包括：用于处理基板的光接收室; 光接收室内的基板支撑单元; 包括电线的灯和容纳所述电线以密封所述灯的密封件的密封件，所述灯用光照射所述基板; 在所述光接收室外部的灯接收单元，用于容纳所述灯，所述灯接收单元包括连接到所述灯的灯连接器以通过所述电线提供电流;吸热构件，其包括导热率高于 密封件的固定件和固定吸热件的基件; 以及连接到灯连接器以向灯连接器提供电流的外部电线。

    Substrate Placement Stage, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
    7.
    发明申请
    Substrate Placement Stage, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device 审中-公开
    基板放置阶段，基板处理装置及制造半导体装置的方法

    公开(公告)号：US20120329290A1

    公开(公告)日：2012-12-27

    申请号：US13479441

    申请日：2012-05-24

    申请人： Toshiya Shimada ,  Kazuhiro Shimeno ,  Masakazu Sakata ,  Hidehiro Yanai ,  Tomihiro Amano ,  Yuichi Wada

    发明人： Toshiya Shimada ,  Kazuhiro Shimeno ,  Masakazu Sakata ,  Hidehiro Yanai ,  Tomihiro Amano ,  Yuichi Wada

    IPC分类号： B05C13/02 ,  H01L21/324

    CPC分类号： H01L21/6719 ,  H01L21/67781 ,  H01L21/68757

    摘要： Provided is a substrate placement stage or substrate processing apparatus which can suppress thermal deformation of the substrate placement stage when the substrate placement stage on which a substrate is placed is heated in a process chamber. The substrate placement stage includes: a heating element; a first member surrounding the heating element; and a second member covering a surface of the first member and including a placing surface for placing a substrate thereon, wherein the first member is made of a first material containing ceramics and aluminum, and the second member is made of a second material containing ceramics and aluminum, a content of the ceramics in the second material being lower than that of the first material.

    摘要翻译： 提供了当在处理室中加热放置基板的基板放置台时，可以抑制基板放置台的热变形的基板放置台或基板处理装置。 基板放置台包括：加热元件; 围绕所述加热元件的第一构件; 以及第二构件，其覆盖所述第一构件的表面并且包括用于在其上放置衬底的放置表面，其中所述第一构件由包含陶瓷和铝的第一材料制成，并且所述第二构件由包含陶瓷的第二材料制成， 铝，第二材料中的陶瓷的含量低于第一材料的含量。

    Composite particle and process for producing the same
    8.
    发明授权
    Composite particle and process for producing the same 失效
    复合粒子及其制造方法

    公开(公告)号：US07691413B2

    公开(公告)日：2010-04-06

    申请号：US11231991

    申请日：2005-09-22

    申请人： Masafumi Miyamoto ,  Yasushi Sasaki ,  Toshiya Shimada ,  Shinobu Hiramatsu

    发明人： Masafumi Miyamoto ,  Yasushi Sasaki ,  Toshiya Shimada ,  Shinobu Hiramatsu

    IPC分类号： A61K33/30 ,  A61K9/14 ,  A61K8/27

    CPC分类号： C09C1/043 ,  A61K8/02 ,  A61K8/11 ,  A61K8/27 ,  A61K8/8111 ,  A61K2800/412 ,  A61Q17/04 ,  C01P2002/80 ,  C01P2004/61 ,  C08J3/203 ,  C08J2323/04

    摘要： The invention provides a composite particle, a process for producing the same, and cosmetics containing the same The invention relates to composite particles containing a polyolefin-based resin having a crystallization degree of 80% or less and zinc oxide and obtained by hot melt microencapsulation or spray cooling, or composite particles containing a polyolefin-based resin having a crystallization degree of 80% or less and zinc oxide, wherein the degree of remaining zinc oxide in the particles is 50 wt % or more after being dipped for 1 hour in 0.5 mol/L hydrochloric acid solution at 25° C. (solution composition: water and ethanol in equal volumes), a process for producing the composite particles, and cosmetics containing the composite particles.

    摘要翻译： 本发明提供一种复合颗粒及其制造方法，含有该化合物的化妆品技术领域本发明涉及含有结晶度为80％以下的聚烯烃系树脂和氧化锌的热复合微粒化复合粒子， 喷雾冷却或含有结晶度为80％以下的聚烯烃类树脂的复合粒子和氧化锌，其中，在0.5摩尔浸渍1小时后，粒子中剩余氧化锌的含量为50重量％以上 / L盐酸溶液（溶液组成：等体积的水和乙醇），复合粒子的制造方法和含有复合粒子的化妆品。

    Oral composition
    9.
    发明授权
    Oral composition 失效
    口语构成

    公开(公告)号：US5626837A

    公开(公告)日：1997-05-06

    申请号：US601831

    申请日：1996-02-15

    申请人： Toshiya Shimada ,  Kazuo Mukasa ,  Tetsuo Gomi ,  Takao Yokoo

    发明人： Toshiya Shimada ,  Kazuo Mukasa ,  Tetsuo Gomi ,  Takao Yokoo

    IPC分类号： A61K8/41 ,  A61K8/43 ,  A61K8/73 ,  A61K8/92 ,  A61Q11/00 ,  A61K7/16 ,  A61K7/18 ,  A61K7/22

    CPC分类号： A61K8/922 ,  A61K8/416 ,  A61K8/43 ,  A61K8/738 ,  A61Q11/00

    摘要： In an oral composition comprising a cationic bactericide, either one or both of cyclodextrin and a water-soluble flavor obtained by extracting an oil-soluble flavor with an aqueous ethanol solution are blended. The composition allows the cationic bactericide to exert its activity to a full extent, presents a pleasant feel on use without any peculiar taste, and is stable during storage. The invention eliminates the use of anionic and nonionic surfactants.

    摘要翻译： 在包含阳离子杀菌剂的口腔组合物中，混合通过用乙醇水溶液萃取油溶性风味剂而获得的环糊精和水溶性香料中的一种或两种。 该组合物使阳离子杀菌剂能够充分发挥其活性，在没有任何特殊味道的情况下使用愉悦的使用感，并且在储存期间是稳定的。 本发明消除了阴离子和非离子表面活性剂的使用。

    Process for the production of glass-like carbon substrates for use as recording media and a setter for use in the process
    10.
    发明授权
    Process for the production of glass-like carbon substrates for use as recording media and a setter for use in the process 失效
    用于生产用作记录介质的玻璃状碳基板和用于该方法的固定器的方法

    公开(公告)号：US5613848A

    公开(公告)日：1997-03-25

    申请号：US454628

    申请日：1995-05-31

    申请人： Ryoichi Hashimoto ,  Toshiya Shimada ,  Hiroshi Inatome ,  Manabu Shibata

    发明人： Ryoichi Hashimoto ,  Toshiya Shimada ,  Hiroshi Inatome ,  Manabu Shibata

    IPC分类号： C04B35/52 ,  C04B35/64 ,  F26B25/18 ,  F27D5/00 ,  G11B5/84 ,  F27B5/00

    CPC分类号： F27D5/00 ,  F26B25/18

    摘要： A supporting shaft 11 that can be inserted through a center hole 5a in each of cured resin disks 5 and which has a bottom plate in a disk form at an end, as well as a plurality of spacer disks 12 each having a center hole through which the supporting shaft 11 can be inserted are used in the process of manufacturing GC (glass-like carbon) by baking to carbonize the cured resin disks 5. The cured resin disks 5 are stacked alternately with the spacer disks 12 on the supporting shaft 11 in an erect position that is inserted through the center holes in each of the cured resin and spacer disks. The stack is then baked in a baking furnace. By so doing, the cured resin disks can be set up easily and the baking furnace can be operated to its full capacity.

    摘要翻译： 一个支撑轴11，其可以穿过固化树脂盘5中的中心孔5a插入，并且其端部具有圆盘形状的底板，以及多个间隔盘12，每个间隔盘12具有中心孔， 可以将支撑轴11插入到通过烘烤来制造GC（玻璃状碳）的过程中，以使固化的树脂盘5碳化。将固化的树脂盘5与支撑轴11上的间隔盘12交替堆叠 通过每个固化树脂和间隔盘中的中心孔插入的直立位置。 然后将该堆叠在烘烤炉中烘烤。 通过这样做，可以容易地设置固化的树脂盘，并且烘烤炉可以充分运行。