利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

62 条记录 (耗时 0.077 秒)

    SYSTEMS AND METHODS FOR SEARCHING FOR MEDIA BASED ON DERIVED ATTRIBUTES
    5.
    发明申请
    SYSTEMS AND METHODS FOR SEARCHING FOR MEDIA BASED ON DERIVED ATTRIBUTES 审中-公开
    基于衍生属性搜索媒体的系统和方法

    公开(公告)号：US20130347038A1

    公开(公告)日：2013-12-26

    申请号：US13529613

    申请日：2012-06-21

    申请人： Christopher Lee

    发明人： Christopher Lee

    IPC分类号： H04N21/462

    CPC分类号： H04N21/4312 ,  H04N21/42202 ,  H04N21/44218 ,  H04N21/44222 ,  H04N21/4532 ,  H04N21/4622 ,  H04N21/4668 ,  H04N21/47202 ,  H04N21/4788 ,  H04N21/4828 ,  H04N21/84

    摘要： Systems and methods described herein provide for generating disruptive recommendations based on a seed input. The viewer may receive recommendations having varying affinity between a media asset being currently viewed and the seed input. In some embodiments, the viewer interacts with a slider interface having the currently viewed media asset at one end and the seed input at the other, and an affinity indicator proximate to either end. The viewer may select a location of the affinity indicator on the slider for determining recommendations. The viewer may receive recommendations based on the currently viewed media asset and the seed input as the affinity indicator slides from one end of the slider interface to the other.

    摘要翻译： 本文所述的系统和方法提供了基于种子输入产生破坏性推荐。 观众可以接收当前正在观看的媒体资产与种子输入之间具有不同亲和度的建议。 在一些实施例中，观看者与一端的具有当前观看的媒体资产的滑块接口和另一端的种子输入以及接近任一端的亲和度指示器交互。 观众可以在滑块上选择亲和度指示符的位置以确定推荐。 当亲和度指示器从滑块界面的一端滑动到另一端时，观看者可以基于当前观看的媒体资源和种子输入接收推荐。

    High selectivity slurry compositions for chemical mechanical polishing
    7.
    发明申请
    High selectivity slurry compositions for chemical mechanical polishing 审中-公开
    用于化学机械抛光的高选择性浆料组合物

    公开(公告)号：US20060097219A1

    公开(公告)日：2006-05-11

    申请号：US11258466

    申请日：2005-10-24

    申请人： Benjamin Bonner ,  Anand Iyer ,  Olivier Nguyen ,  Donald Chua ,  Christopher Lee ,  Shijian Li

    发明人： Benjamin Bonner ,  Anand Iyer ,  Olivier Nguyen ,  Donald Chua ,  Christopher Lee ,  Shijian Li

    IPC分类号： C09K13/00 ,  H01L21/461

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1463

    摘要： A chemical-mechanical polishing composition that includes less than about 1% wt. abrasive, an additive, and water, where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of polishing a semiconductor substrate in a shallow trench isolation process, the method including contacting the substrate with a polishing pad of a polishing apparatus while applying a high selectivity slurry to the polishing pad, where the slurry comprises less than about 1% wt. abrasive, an additive, and water, and where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of making a chemical-mechanical polishing slurry composition, the method including adding together an abrasive, an additive and water to form the slurry, where a weigh percent of the additive is greater than a weight percent of the abrasive, and the abrasive and additive together comprise less than 2% by wt. of the slurry.

    摘要翻译： 化学机械抛光组合物，其包含小于约1重量％ 研磨剂，添加剂和水，其中添加剂的重量百分比大于研磨剂的重量百分比。 此外，在浅沟槽隔离工艺中抛光半导体衬底的方法，该方法包括使衬底与抛光装置的抛光垫接触，同时向抛光垫施加高选择性浆料，其中浆料包含小于约1％ 重量 研磨剂，添加剂和水，并且其中添加剂的重量百分比大于研磨剂的重量百分比。 另外，制备化学 - 机械抛光浆料组合物的方法，该方法包括将研磨剂，添加剂和水相加以形成浆料，其中添加剂的重量百分比大于磨料的重量百分数，并且 研磨剂和添加剂一起包含小于2重量％。 的浆料。

    Feature isolation for frequency-shifting interferometry
    9.
    发明申请
    Feature isolation for frequency-shifting interferometry 有权
    用于频移干涉测量的特征隔离

    公开(公告)号：US20060061773A1

    公开(公告)日：2006-03-23

    申请号：US10946693

    申请日：2004-09-22

    申请人： Christopher Lee ,  Andrew Kulawiec ,  Mark Tronolone

    发明人： Christopher Lee ,  Andrew Kulawiec ,  Mark Tronolone

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441

    摘要： Frequency-scanning interferometry is used for measuring test objects having multiple surface regions. The regions are distinguished and can be measured based on different measuring criteria. Interference data is gathered for the imageable portion of the test object from a plurality of interference patterns taken over substantially the same imageable portion at different measuring beam frequencies. The interference data is evaluated to determine topographical measures of associated points on the test object. The topographical measures are compared against a benchmark to distinguish between points on the test object that are within a first of the surface regions from points on a boundary separating the first surface region from one or more other surface regions of the imageable portion of the test object. The interference data of points within the first surface region are further evaluated to a higher accuracy.

    摘要翻译： 频率扫描干涉测量用于测量具有多个表面区域的测试对象。 区域是区别的，可以根据不同的测量标准进行测量。 从不同测量光束频率的基本上相同的可成像部分上拍摄的多个干涉图案收集测试对象的可成像部分的干扰数据。 对干扰数据进行评估，以确定测试对象上相关点的拓扑测量。 将地形测量与基准进行比较，以将分离第一表面区域与测试对象的可成像部分的一个或多个其他表面区域的边界上的点之间区分在第一表面区域内的测试对象上的点 。 进一步对第一表面区域内的点的干涉数据进行更高精度的评估。