High efficiency replicated x-ray optics and fabrication method
    1.
    发明授权
    High efficiency replicated x-ray optics and fabrication method 有权
    高效复制x射线光学元件及其制造方法

    公开(公告)号:US06278764B1

    公开(公告)日:2001-08-21

    申请号:US09359581

    申请日:1999-07-22

    IPC分类号: G21K106

    摘要: Replicated x-ray optics are fabricated by sputter deposition of reflecting layers on a super-polished reusable mandrel. The reflecting layers are strengthened by a supporting multilayer that results in stronger stress-relieved reflecting surfaces that do not deform during separation from the mandrel. The supporting multilayer enhances the ability to part the replica from the mandrel without degradation in surface roughness. The reflecting surfaces are comparable in smoothness to the mandrel surface. An outer layer is electrodeposited on the supporting multilayer. A parting layer may be deposited directly on the mandrel before the reflecting surface to facilitate removal of the layered, tubular optic device from the mandrel without deformation. The inner reflecting surface of the shell can be a single layer grazing reflection mirror or a resonant multilayer mirror. The resulting optics can be used in a wide variety of applications, including lithography, microscopy, radiography, tomography, and crystallography.

    摘要翻译: 通过在超级抛光的可重复使用的心轴上溅射沉积反射层来制造复制的x射线光学器件。 反射层通过支撑多层增强,其导致在与心轴分离期间不变形的较强应力消除的反射表面。 支撑多层增强了从芯轴部分复制品而不降低表面粗糙度的能力。 反射表面的平滑度与心轴表面相当。 外层电沉积在支撑层上。 分离层可以在反射表面之前直接沉积在心轴上,以有助于将层状管状光学器件从心轴移除而不变形。 外壳的内反射面可以是单层放射反射镜或共振多层反射镜。 所得到的光学器件可以用于各种各样的应用,包括光刻,显微镜,放射照相,断层摄影和晶体学。

    Selectively-etched nanochannel electrophoretic and electrochemical devices
    2.
    发明授权
    Selectively-etched nanochannel electrophoretic and electrochemical devices 失效
    选择性蚀刻的纳米通道电泳和电化学装置

    公开(公告)号:US07067351B2

    公开(公告)日:2006-06-27

    申请号:US10864778

    申请日:2004-06-08

    IPC分类号: H01L21/44

    CPC分类号: B82Y30/00 C23F1/02

    摘要: Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches and baffles. The modifications of the prior utilized flat exposed surfaces increase the amount of exposed metal to facilitate electrochemical redox reaction or control the exposure of the metal surfaces to analytes of large size. These etched areas variously increase the sensitivity of electrochemical detection devices to low concentrations of analyte, improve the plug flow characteristic of the channel, and allow additional discrimination of the colloidal particles during cyclic voltammetry.

    摘要翻译: 纳米通道电泳和电化学装置具有位于流体输送通道中的选择性蚀刻的纳米级氨基酸盐。 具有暴露的导电(金属)条纹的纳米材料的通常平坦表面被选择性蚀刻以形成沟槽和挡板。 现有利用的平坦暴露表面的改进增加暴露的金属的量以促进电化学氧化还原反应或控制金属表面暴露于大尺寸分析物。 这些蚀刻区域将电化学检测装置的灵敏度各不相同地提高到低浓度的分析物,改善了通道的插塞流动特性,并允许在循环伏安法期间对胶体颗粒进行额外的鉴别。

    Selectively-etched nanochannel electrophoretic and electrochemical devices
    3.
    发明授权
    Selectively-etched nanochannel electrophoretic and electrochemical devices 失效
    选择性蚀刻的纳米通道电泳和电化学装置

    公开(公告)号:US06818964B2

    公开(公告)日:2004-11-16

    申请号:US10261349

    申请日:2002-09-30

    IPC分类号: H01L2900

    CPC分类号: B82Y30/00 C23F1/02

    摘要: Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches and baffles. The modifications of the prior utilized flat exposed surfaces increase the amount of exposed metal to facilitate electrochemical redox reaction or control the exposure of the metal surfaces to analytes of large size. These etched areas variously increase the sensitivity of electrochemical detection devices to low concentrations of analyte, improve the plug flow characteristic of the channel, and allow additional discrimination of the colloidal particles during cyclic voltammetry.

    摘要翻译: 纳米通道电泳和电化学装置具有位于流体输送通道中的选择性蚀刻的纳米级氨基酸盐。 具有暴露的导电(金属)条纹的纳米材料的通常平坦表面被选择性蚀刻以形成沟槽和挡板。 现有利用的平坦暴露表面的改进增加暴露的金属的量以促进电化学氧化还原反应或控制金属表面暴露于大尺寸分析物。 这些蚀刻区域将电化学检测装置的灵敏度各不相同地提高到低浓度的分析物,改善了通道的插塞流动特性,并允许在循环伏安法期间对胶体颗粒进行额外的鉴别。

    Nanolaminate microfluidic device for mobility selection of particles
    4.
    发明授权
    Nanolaminate microfluidic device for mobility selection of particles 失效
    用于迁移率选择颗粒的纳米级氨基酸微流体装置

    公开(公告)号:US07118661B2

    公开(公告)日:2006-10-10

    申请号:US10261392

    申请日:2002-09-30

    IPC分类号: G01N27/453

    CPC分类号: G01N27/447

    摘要: A microfluidic device made from nanolaminate materials that are capable of electrophoretic selection of particles on the basis of their mobility. Nanolaminate materials are generally alternating layers of two materials (one conducting, one insulating) that are made by sputter coating a flat substrate with a large number of layers. Specific subsets of the conducting layers are coupled together to form a single, extended electrode, interleaved with other similar electrodes. Thereby, the subsets of conducting layers may be dynamically charged to create time-dependent potential fields that can trap or transport charge colloidal particles. The addition of time-dependence is applicable to all geometries of nanolaminate electrophoretic and electrochemical designs from sinusoidal to nearly step-like.

    摘要翻译: 由纳米材料制成的微流体装置,其能够基于它们的迁移率电泳选择颗粒。 纳米层压材料通常是通过溅射涂覆具有大量层的平坦基底而制成的两种材料(一个导体,一个绝缘体)的交替层。 导电层的特定子集耦合在一起以形成与其它类似电极交错的单个延伸电极。 因此,导电层的子集可以被动态充电以产生可以捕获或运输电荷胶体颗粒的时间依赖性电场。 时间依赖性的增加适用于从正弦曲线到几乎阶梯状的纳米压电电泳和电化学设计的所有几何形状。

    Nanostructure multilayer dielectric materials for capacitors and
insulators
    5.
    发明授权
    Nanostructure multilayer dielectric materials for capacitors and insulators 失效
    用于电容器和绝缘体的纳米结构多层介电材料

    公开(公告)号:US5742471A

    公开(公告)日:1998-04-21

    申请号:US755619

    申请日:1996-11-25

    IPC分类号: H01G4/10 H01G4/20 H01G4/06

    CPC分类号: H01G4/20 H01G4/10 Y10T29/435

    摘要: A capacitor is formed of at least two metal conductors having a multilayer dielectric and opposite dielectric-conductor interface layers in between. The multilayer dielectric includes many alternating layers of amorphous zirconium oxide (ZrO.sub.2) and alumina (Al.sub.2 O.sub.3). The dielectric-conductor interface layers are engineered for increased voltage breakdown and extended service life. The local interfacial work function is increased to reduce charge injection and thus increase breakdown voltage. Proper material choices can prevent electrochemical reactions and diffusion between the conductor and dielectric. Physical vapor deposition is used to deposit the zirconium oxide (ZrO.sub.2) and alumina (Al.sub.2 O.sub.3) in alternating layers to form a nano-laminate.

    摘要翻译: 电容器由至少两个金属导体形成,金属导体之间具有多层电介质和相对的电介质 - 导体界面层。 多层电介质包括许多交替层的无定形氧化锆(ZrO 2)和氧化铝(Al 2 O 3)。 电介质 - 导体界面层被设计用于增加电压击穿和延长的使用寿命。 增加局部界面功函数以减少电荷注入,从而增加击穿电压。 适当的材料选择可以防止导体和电介质之间的电化学反应和扩散。 物理气相沉积用于以交替的层沉积氧化锆(ZrO 2)和氧化铝(Al 2 O 3)以形成纳米层压板。

    Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
    7.
    发明授权
    Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application 有权
    具有尖锐,稳定界面的多层膜,用于EUV和软X射线应用

    公开(公告)号:US06396900B1

    公开(公告)日:2002-05-28

    申请号:US09847744

    申请日:2001-05-01

    IPC分类号: G21K106

    摘要: The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B4C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

    摘要翻译: 用于软X射线和极紫外区域的Mo / Si(钼/硅)多层薄膜的反射率和热稳定性通过在Mo交替层之间沉积碳化硼薄层(例如,B4C)而得到增强, Si。 本发明对于用于软X射线和极紫外光学器件的反射涂层,用于掩模的多层膜,用于其它波长的涂层以及对于比纯Mo / Si多层膜更热稳定的掩模的多层膜是有用的

    Method for fabricating an ignitable heterogeneous stratified metal
structure
    9.
    发明授权
    Method for fabricating an ignitable heterogeneous stratified metal structure 失效
    用于制造可点燃的非均质分层金属结构的方法

    公开(公告)号:US5547715A

    公开(公告)日:1996-08-20

    申请号:US542976

    申请日:1995-10-13

    摘要: A multilayer structure has a selectable, (i) propagating reaction front velocity V, (ii) reaction initiation temperature attained by application of external energy and (iii) amount of energy delivered by a reaction of alternating unreacted layers of the multilayer structure. Because V is selectable and controllable, a variety of different applications for the multilayer structures are possible, including but not limited to their use as ignitors, in joining applications, in fabrication of new materials, as smart materials and in medical applications and devices. The multilayer structure has a period D, and an energy release rate constant K. Two or more alternating unreacted layers are made of different materials and separated by reacted zones. The period D is equal to a sum of the widths of each single alternating reaction layer of a particular material, and also includes a sum of reacted zone widths, t.sub.i, in the period D. The multilayer structure has a selectable propagating reaction front velocity V, whereV=K(1/D.sup.n).times.[1-(t.sub.i /D)]and n is about 0.8 to 1.2.

    摘要翻译: 多层结构具有可选择的(i)传播的反应前速度V,(ii)通过施加外部能量获得的反应起始温度和(iii)通过多层结构的交替的未反应层的反应而传递的能量的量。 由于V是可选择和可控的,所以多层结构的各种不同应用是可能的,包括但不限于它们作为点火器的用途,在接合应用中,新材料的制造,智能材料以及医疗应用和设备中的应用。 多层结构具有周期D和能量释放速度常数K.两个或更多个交替的未反应层由不同的材料制成并通过反应区分离。 周期D等于特定材料的每个单个交替反应层的宽度的总和,并且还包括周期D中反应的区域宽度ti的总和。多层结构具有可选择的传播反应前沿速度V ,其中V = K(1 / Dn)x [1-(ti / D)],n为约0.8至1.2。

    Method for forming a barrier layer
    10.
    发明授权
    Method for forming a barrier layer 失效
    形成阻挡层的方法

    公开(公告)号:US06339020B1

    公开(公告)日:2002-01-15

    申请号:US09567513

    申请日:2000-05-09

    IPC分类号: H01L214763

    摘要: Cubic or metastable cubic refractory metal carbides act as barrier layers to isolate, adhere, and passivate copper in semiconductor fabrication. One or more barrier layers of the metal carbide are deposited in conjunction with copper metallizations to form a multilayer characterized by a cubic crystal structure with a strong (100) texture. Suitable barrier layer materials include refractory transition metal carbides such as vanadium carbide (VC), niobium carbide (NbC), tantalum carbide (TaC), chromium carbide (Cr3C2), tungsten carbide (WC), and molybdenum carbide (MoC).

    摘要翻译: 立方或亚稳态立方难熔金属碳化物作为阻挡层,以在半导体制造中分离,粘附和钝化铜。 金属碳化物的一个或多个阻挡层与铜金属化结合沉积以形成特征在于具有强(100)结构的立方晶体结构的多层。 合适的阻挡层材料包括耐火过渡金属碳化物,如碳化钒(VC),碳化铌(NbC),碳化钽(TaC),碳化铬(Cr3C2),碳化钨(WC)和碳化钼(MoC)。