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12 条记录 (耗时 0.031 秒)

    Production of a zeolite-containing solid
    1.
    发明申请
    Production of a zeolite-containing solid 审中-公开
    制备含沸石的固体

    公开(公告)号：US20060183629A1

    公开(公告)日：2006-08-17

    申请号：US11044195

    申请日：2005-01-28

    申请人： Ulrich Muller ,  Hartwig Voss ,  Erich Schubert ,  Friedrich Hill ,  Hermann Petersen

    发明人： Ulrich Muller ,  Hartwig Voss ,  Erich Schubert ,  Friedrich Hill ,  Hermann Petersen

    IPC分类号： B01J29/04

    CPC分类号： C01B21/1409 ,  B01J29/04 ,  B01J29/06 ,  B01J29/89 ,  C01B39/026 ,  C07C239/08 ,  C07C249/04 ,  C07D301/12

    摘要： In a process for concentrating an at least partially crystalline solid containing at least one zeolite in a mixture comprising at least one auxiliary, for example a template compound, and said solid, the mixture is ultrafiltrated in a step (II) to divide the mixture into a retentate and a permeate, the solids content in the retentate being higher than that in the mixture and the solids content in the permeate being lower than that in the mixture. This procedure allows auxiliaries, in particular template compounds, present in the permeate to be recycled into a crystallizing step (I) upstream of step (II).

    摘要翻译： 在将包含至少一种沸石的至少部分结晶的固体在包含至少一种助剂例如模板化合物和所述固体的混合物中浓缩的方法中，在步骤（II）中将混合物超滤以将混合物分成 渗余物和渗透物，渗余物中的固体含量高于混合物中的固体含量，并且渗透物中的固体含量低于混合物中的固体含量。 该方法允许存在于渗透物中的助剂，特别是模板化合物再循环到步骤（II）上游的结晶步骤（I）中。

    Illumination system particularly for microlithography
    3.
    发明授权
    Illumination system particularly for microlithography 有权
    照明系统特别适用于微光刻

    公开(公告)号：US07405809B2

    公开(公告)日：2008-07-29

    申请号：US11384636

    申请日：2006-03-21

    申请人： Joachim Hainz ,  Wolfgang Singer ,  Erich Schubert

    发明人： Joachim Hainz ,  Wolfgang Singer ,  Erich Schubert

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70083 ,  G03F7/70075 ,  G03F7/70116 ,  G21K1/02 ,  G21K1/06 ,  G21K2201/067

    摘要： An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

    摘要翻译： 一种用于沿扫描方向扫描型微光刻的照明系统，其中发射波长特别<= 193nm的光源。 照明系统包括多个光栅元件。 将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。 该场在扫描方向上定义非矩形强度分布。

    Illumination system for illuminating a mask in a microlithographic exposure apparatus
    5.
    发明授权
    Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
    用于在微光刻曝光设备中照射掩模的照明系统

    公开(公告)号：US08467031B2

    公开(公告)日：2013-06-18

    申请号：US12795014

    申请日：2010-06-07

    申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    IPC分类号： G03B27/68 ,  G03B27/32

    CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

    摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

    摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。

    OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE
    7.
    发明申请
    OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE 审中-公开
    光学单元在光学模块上具有可调节的作用

    公开(公告)号：US20110019171A1

    公开(公告)日：2011-01-27

    申请号：US12730395

    申请日：2010-03-24

    申请人： Erich Schubert ,  Andreas Heisler ,  Joachim Hartjes

    发明人： Erich Schubert ,  Andreas Heisler ,  Joachim Hartjes

    IPC分类号： G03B27/54 ,  G02B7/00

    CPC分类号： G02B7/00 ,  G03F7/70266 ,  G03F7/70825

    摘要： The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device is connected to the optical module and the supporting structure and is designed to exert a clamping force on the optical module. The force-generating device has a fluidic force-generating element having a working chamber to which a working fluid having a working pressure can be applied. The force-generating element takes the form of a muscle element which exerts a first tensile force at a first working pressure and a second tensile force which is increased with respect to the first tensile force at a second working pressure which is increased with respect to the first working pressure.

    摘要翻译： 本发明涉及具有光学模块，支撑结构和力产生装置的光学装置，特别是用于微光刻的光学装置。 力产生装置连接到光学模块和支撑结构，并被设计成在光学模块上施加夹紧力。 力产生装置具有流体力产生元件，其具有可以施加工作压力的工作流体的工作室。 力产生元件采取在第一工作压力下施加第一拉力的肌肉元件的形式和在相对于第一工作压力增加的第二工作压力下相对于第一拉力增加的第二张力 第一工作压力。

    DOUBLE-FACETTED ILLUMINATION SYSTEM WITH ATTENUATOR ELEMENTS ON THE PUPIL FACET MIRROR
    8.
    发明申请
    DOUBLE-FACETTED ILLUMINATION SYSTEM WITH ATTENUATOR ELEMENTS ON THE PUPIL FACET MIRROR 审中-公开
    双面照明系统，带有衰减器元件的PUPIL FACET MIRROR

    公开(公告)号：US20080165925A1

    公开(公告)日：2008-07-10

    申请号：US11961431

    申请日：2007-12-20

    申请人： Wolfgang Singer ,  Joachim Hainz ,  Erich Schubert

    发明人： Wolfgang Singer ,  Joachim Hainz ,  Erich Schubert

    IPC分类号： G21K5/00 ,  G02B13/14

    CPC分类号： G03F7/70075 ,  G03F7/70083 ,  G03F7/70191

    摘要： The invention relates to an illumination system with a light source emitting radiation with a wavelength ≦193 nm, especially radiation in the EUV wavelength range. The invention comprises a first facetted optical element in a first plane with at least a first and second field raster element which receive the light of the light source and divide the same into a first and second bundle of light; a optical component comprising at least a second facetted optical element in a second plane with a first and second pupil raster element, with the first light bundle impinging upon the first pupil raster element and the second light bundle impinging upon the second pupil raster element, with an attenuator being arranged in or close to the second plane or a plane conjugated to the second plane at least in the first light bundle extending from the first field raster element to the first pupil raster element, wherein the optical component images the first and second field raster element into a field plane.

    摘要翻译： 本发明涉及具有发射波长<= 193nm的辐射的光源的照明系统，特别是EUV波长范围内的辐射。 本发明包括具有至少第一和第二场光栅元件的第一平面中的第一刻面光学元件，其接收光源的光并将其分成第一和第二光束; 光学部件包括具有第一和第二光瞳光栅元件的第二平面中的至少第二分面光学元件，第一光束照射在第一光瞳光栅元件上，第二光束入射到第二光瞳光栅元件上， 至少在从第一场光栅元件延伸到第一光瞳光栅元件的第一光束中，布置在或靠近第二平面的衰减器或与第二平面共轭的平面，其中光学部件将第一和第二场成像 光栅元素进入场平面。

    ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
    9.
    发明申请
    ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS 有权
    用于在微波曝光装置中照射掩模的照明系统

    公开(公告)号：US20100265482A1

    公开(公告)日：2010-10-21

    申请号：US12795014

    申请日：2010-06-07

    申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

    摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

    摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。