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公开(公告)号:US12043042B2
公开(公告)日:2024-07-23
申请号:US17242599
申请日:2021-04-28
Applicant: Universal Display Corporation
Inventor: Peter van Putten , Sven Pekelder , Mark Meuwese , Maurits Willenbroek , Piet van Rens
IPC: B41J25/308 , B41J11/00 , B41J25/00 , B41J25/316 , C23C14/04 , C23C14/12 , C23C14/22 , C23C14/54
CPC classification number: B41J25/308 , B41J11/008 , B41J25/001 , B41J25/3086 , B41J25/316 , C23C14/04 , C23C14/12 , C23C14/228 , C23C14/54
Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
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公开(公告)号:US11981987B2
公开(公告)日:2024-05-14
申请号:US17510529
申请日:2021-10-26
Applicant: Universal Display Corporation
Inventor: Edwin van den Tillaart , Sven Pekelder , Mark Meuwese , William E. Quinn , Gregory McGraw , Gregg Kottas
CPC classification number: C23C14/24 , C23C14/12 , C23C16/45517 , C23C16/45525 , C23C16/45563 , C23C16/45565 , C23C16/45574 , C23C16/45578 , C23C16/545 , H10K71/135 , H10K85/342
Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
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公开(公告)号:US20170291187A1
公开(公告)日:2017-10-12
申请号:US15483251
申请日:2017-04-10
Applicant: UNIVERSAL DISPLAY CORPORATION
Inventor: Peter van Putten , Sven Pekelder , Mark Meuwese , Maurits Willenbroek , Piet van Rens
CPC classification number: B05B15/70 , B41J25/001 , B41J25/3086
Abstract: A device for use in OVJP and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
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公开(公告)号:US11946131B2
公开(公告)日:2024-04-02
申请号:US15982187
申请日:2018-05-17
Applicant: Universal Display Corporation
Inventor: Gregory McGraw , Edwin Van Den Tillaart , William E. Quinn , Sven Pekelder , Matthew King
IPC: C23C14/24 , C23C14/12 , C23C14/22 , H10K50/11 , H10K50/15 , H10K50/16 , H10K50/18 , H10K50/81 , H10K50/82 , B05D1/00 , H10K71/16
CPC classification number: C23C14/243 , C23C14/12 , C23C14/228 , H10K50/11 , H10K50/15 , H10K50/16 , H10K50/18 , H10K50/81 , H10K50/82 , B05D1/60 , H10K71/16
Abstract: Designs and arrangements for sublimation cells are provided, which enriches an inert carrier gas with organic vapor such that the partial pressure of the organic vapor is highly stable in time. Stability is achieved by controlling the local rates of evaporation along the solid-gas interface through one or more crucibles, thereby reducing the effects of greater headspace and lowering interfacial area as the source depletes. Local evaporation rates also can be controlled using either temperature distribution or convective flow fields.
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公开(公告)号:US20170294615A1
公开(公告)日:2017-10-12
申请号:US15475408
申请日:2017-03-31
Applicant: Universal Display Corporation
Inventor: Edwin van den Tillaart , Sven Pekelder , Mark Meuwese , William E. Quinn , Gregory McGraw , Gregg Kottas
CPC classification number: C23C14/24 , C23C14/12 , H01L51/0005 , H01L51/0085
Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
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公开(公告)号:US20240279789A1
公开(公告)日:2024-08-22
申请号:US18610937
申请日:2024-03-20
Applicant: Universal Display Corporation
Inventor: Edwin van den Tillaart , Sven Pekelder , Mark Meuwese , William E. Quinn , Gregory McGraw , Gregg Kottas
CPC classification number: C23C14/24 , C23C14/12 , C23C16/45517 , C23C16/45525 , C23C16/45563 , C23C16/45565 , C23C16/45574 , C23C16/45578 , C23C16/545 , H10K71/135 , H10K85/342
Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
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公开(公告)号:US11168391B2
公开(公告)日:2021-11-09
申请号:US15475408
申请日:2017-03-31
Applicant: Universal Display Corporation
Inventor: Edwin van den Tillaart , Sven Pekelder , Mark Meuwese , William E. Quinn , Gregory McGraw , Gregg Kottas
IPC: C23C14/24 , C23C14/12 , C23C16/455 , C23C16/54 , H01L51/00
Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
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公开(公告)号:US20210245533A1
公开(公告)日:2021-08-12
申请号:US17242599
申请日:2021-04-28
Applicant: Universal Display Corporation
Inventor: Peter van Putten , Sven Pekelder , Mark Meuwese , Maurits Willenbroek , Piet van Rens
IPC: B41J25/308 , B41J25/00 , B41J25/316 , B41J11/00
Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
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公开(公告)号:US11014386B2
公开(公告)日:2021-05-25
申请号:US15483251
申请日:2017-04-10
Applicant: UNIVERSAL DISPLAY CORPORATION
Inventor: Peter van Putten , Sven Pekelder , Mark Meuwese , Maurits Willenbroek , Piet van Rens
IPC: B41J25/308 , B41J25/316 , B41J11/00 , B41J25/00
Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
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