Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like
    5.
    发明授权
    Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like 失效
    具有通过齐纳二极管,晶闸管和/或类似物保持在除地电位之外的电极的离子源

    公开(公告)号:US07030390B2

    公开(公告)日:2006-04-18

    申请号:US10919479

    申请日:2004-08-17

    IPC分类号: H01J27/00

    摘要: An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or the perform other functions. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the cathode(s) is maintained or kept at a reference potential(s) other than ground for at least a period of time. This may be done, for example and without limitation, by electrically connecting a zener diode (single or double type, for example), thyristor (actively), or the like to the cathode. Thus, the ion source can be made so that it does not react adversely to its environment, and/or undesirable arcing between the anode and cathode can be reduced thereby improving ion source operation.

    摘要翻译: 提供离子源,其产生或发射可用于在衬底上沉积层的离子束或执行其它功能。 离子源包括至少一个阳极和至少一个阴极。 在某些示例性实施例中,阴极保持或保持在除地面以外的参考电位至少一段时间。 这可以例如但不限于通过将齐纳二极管(例如单一或双类型),可控硅(主动)等电连接到阴极来完成。 因此,可以使离子源不会对其环境产生不利影响,和/或可以减少阳极和阴极之间的不期望的电弧,从而改善离子源的操作。

    Ion beam source with coated electrode(s)
    9.
    发明授权
    Ion beam source with coated electrode(s) 失效
    带有电极的离子束源

    公开(公告)号:US06815690B2

    公开(公告)日:2004-11-09

    申请号:US10200553

    申请日:2002-07-23

    IPC分类号: H01J3708

    CPC分类号: H01J37/08 H01J2237/083

    摘要: An ion source includes an anode and/or cathode which is/are coated with a conductive coating. The coating has a sputtering yield less than that of an uncoated anode and/or cathode, so that erosion of the resulting anode and/or cathode in the source is reduced during source operation. Example coating materials for the anode and/or cathode of the ion beam source include metal borides including but not limited to TiB2 and ZrB2.

    摘要翻译: 离子源包括被导电涂层涂覆的阳极和/或阴极。 该涂层的溅射产率小于未涂覆的阳极和/或阴极的溅射产率,从而在源操作期间减少源中产生的阳极和/或阴极的侵蚀。 用于离子束源的阳极和/或阴极的示例性涂层材料包括金属硼化物,包括但不限于TiB 2和ZrB 2。