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    DIRECT WRITE NANOLITHOGRAPHY USING HEATED TIP
    1.
    发明申请
    DIRECT WRITE NANOLITHOGRAPHY USING HEATED TIP 失效
    使用加热提示的直接写入纳米尺度

    公开(公告)号：US20070114401A1

    公开(公告)日：2007-05-24

    申请号：US11468409

    申请日：2006-08-30

    申请人： William King ,  Clifford Henderson

    发明人： William King ,  Clifford Henderson

    IPC分类号： G21K7/00

    CPC分类号： G03F7/0002 ,  G01Q80/00

    摘要： A device for sculpting a substrate includes a vertically displaceable probe having a nano-scale dimensioned probe tip. A displacement mechanism is configured to adjust a vertical displacement between the probe tip and the substrate. A heating mechanism selectively heats the probe tip to a preselected temperature that is sufficient to cause a portion of the substrate in contact with the probe tip to decompose.

    摘要翻译： 用于雕刻衬底的装置包括具有纳米级尺寸的探针尖端的可垂直移位的探针。 位移机构构造成调节探针尖端和基底之间的垂直位移。 加热机构将探针尖端选择性地加热到足以使基底的一部分与探针尖端接触的预选温度分解。

    Photosensitive Polyimides and Methods of Making the Same
    6.
    发明申请
    Photosensitive Polyimides and Methods of Making the Same 审中-公开
    光敏聚酰亚胺及其制备方法

    公开(公告)号：US20100216070A1

    公开(公告)日：2010-08-26

    申请号：US12517501

    申请日：2006-12-04

    申请人： Kazuhiro Yamanaka ,  Clifford Henderson ,  Michael Romeo ,  Kazuhiko Maeda

    发明人： Kazuhiro Yamanaka ,  Clifford Henderson ,  Michael Romeo ,  Kazuhiko Maeda

    IPC分类号： G03F7/004 ,  C08G73/10

    CPC分类号： C07C233/75 ,  C08G73/06 ,  C08G73/1039 ,  C08L79/08 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/0382 ,  G03F7/0387 ,  G03F7/0392

    摘要： Photosensitive polyimide compositions include a photosensitive additive and a polymer comprising a repeating unit represented by the following formula (I): wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R3 represents hydrogen or an organic group comprising a hydrophilic group, an acid-cleavable group, a base-cleavable group, a cross-linkable group, or combinations thereof, and h represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a processing solvent, followed by a relatively low-temperature cyclization process in which the precursor polymer is converted to the final polymer. The resulting polyimide may be separated from the solution and purified. It may then be combined with a casting solvent and a photosensitive additive.

    摘要翻译： 感光性聚酰亚胺组合物包括光敏添加剂和包含由下式（I）表示的重复单元的聚合物：其中R1包括脂族基团，脂环族基团，芳族基团，杂环基团或其组合，R 2包括脂肪族 基团，脂环族基团，芳族基团，杂环基团或其组合，R 3表示氢或包含亲水基团，酸可裂解基团，碱基可裂解基团，可交联基团或组合的有机基团 h表示1以上的整数。 光敏组合物可以通过将前体聚合物与加工溶剂组合，然后将前体聚合物转化为最终聚合物的相对低温环化过程来形成。 所得聚酰亚胺可以与溶液分离并纯化。 然后可将其与铸造溶剂和光敏添加剂组合。