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1.发明授权Polyvinylammonium compound, method of manufacturing same, acidic solution containing said compound and method of electrolytically depositing a copper deposit 有权聚乙烯基铵化合物，其制造方法，含有所述化合物的酸性溶液和电沉积铜沉积物的方法公开(公告)号：US08114263B2
公开(公告)日：2012-02-14
申请号：US11816717
申请日：2006-03-01
申请人： Wolfgang Dahms , Udo Grieser , Olanda Grieser, legal representative , Christopher Grieser, legal representative , Philip Hartmann
发明人： Wolfgang Dahms , Udo Grieser , Philip Hartmann
IPC分类号： C25D3/38
CPC分类号： C25D3/38 , C08F8/02 , C08F8/44 , C08F226/02 , C08F2800/10 , H05K3/423
摘要： The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices I and m are present in the neutral form.
摘要翻译： 本发明涉及一种聚乙烯基铵化合物，涉及一种制备所述化合物的方法，至少含有所述聚乙烯基铵化合物的酸性水溶液用于电沉积铜沉积物以及使用所述酸性水溶液电沉积铜沉积物的方法 ，对应于通式（1）的所述聚乙烯基铵化合物：以及一般化学式（1）的聚乙烯基铵化合物，其中一个单体单元或两个具有指数I和m的两者均以中性形式存在。
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2.发明申请Polyvinylammonium Compound, Method of Manufacturing Same, Acidic Solution Containing Said Compound and Method of Electrolytically Depositing a Copper Deposit 有权聚乙烯铵化合物，其制造方法，含有所述化合物的酸性溶液和电沉积铜沉积物的方法公开(公告)号：US20080210569A1
公开(公告)日：2008-09-04
申请号：US11816717
申请日：2006-03-01
CPC分类号： C25D3/38 , C08F8/02 , C08F8/44 , C08F226/02 , C08F2800/10 , H05K3/423
摘要： The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices l and m are present in the neutral form.
摘要翻译： 本发明涉及一种聚乙烯基铵化合物，涉及一种制备所述化合物的方法，至少含有所述聚乙烯基铵化合物的酸性水溶液用于电沉积铜沉积物以及使用所述酸性水溶液电沉积铜沉积物的方法 ，对应于通式（1）的所述聚乙烯基铵化合物：以及一般化学式（1）的聚乙烯基铵化合物，其中一个单体单元或两个具有指数l和m的两者均以中性形式存在。
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3.发明授权Method of inspecting a metal coating and a method for analytical control of a deposition electrolyte serving to deposit said metal coating 有权检查金属涂层的方法和用于沉积所述金属涂层的沉积电解质的分析控制方法公开(公告)号：US08894835B2
公开(公告)日：2014-11-25
申请号：US13127507
申请日：2009-10-26
申请人： Philip Hartmann , Michael Jonat , Mathias Wuensche
发明人： Philip Hartmann , Michael Jonat , Mathias Wuensche
摘要： For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel and for analytical control of the deposition electrolyte, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarization of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during a dissolution of the metal coating; and d) determining a time-averaged vale of the dissolution potential.
摘要翻译： 为了快速和可靠地确定金属涂层以及用于沉积金属的电解质的质量，特别是用于镍的电解沉积，例如半光泽镍和亮镍，并且用于分析控制沉积电解质， 提供检查金属涂层的方法，其包括以下方法步骤：a）将沉积电解质的金属涂层沉积到工作电极上; b）通过工作电极的阳极极化相对于与工作电极电解接触的对电极电解溶解金属涂层; c）随着时间在工作电极处记录电解溶解电位，所述电势在金属涂层溶解期间发生; 和d）确定溶解电位的时间平均值。
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4.发明申请Method of Inspecting a Metal Coating and a Method for Analytical Control of a Deposition Electrolyte Serving to Deposit Said Metal Coating 有权检查金属涂层的方法和用于分析控制沉积电沉积所述金属涂层的电解质的方法公开(公告)号：US20110215003A1
公开(公告)日：2011-09-08
申请号：US13127507
申请日：2009-10-26
申请人： Philip Hartmann , Michael Jonat , Mathias Wuensche
发明人： Philip Hartmann , Michael Jonat , Mathias Wuensche
IPC分类号： G01N27/416 , G01N27/42 , G01N17/02
摘要： For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel and for analytical control of the deposition electrolyte, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarisation of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during a dissolution of the metal coating; and d) determining a time-averaged vale of the dissolution potential.
摘要翻译： 为了快速和安全地确定金属涂层以及用于沉积金属的电解质的质量，特别是用于镍的电解沉积，例如半光泽镍和亮镍，并且用于分析控制沉积电解质， 提供检查金属涂层的方法，其包括以下方法步骤：a）将沉积电解质的金属涂层沉积到工作电极上; b）通过工作电极的阳极极化相对于与工作电极电解接触的对电极电解溶解金属涂层; c）随着时间在工作电极处记录电解溶解电位，所述电势在金属涂层溶解期间发生; 和d）确定溶解电位的时间平均值。
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公开(公告)号：US08647491B2
公开(公告)日：2014-02-11
申请号：US12864180
申请日：2009-02-05
CPC分类号： C25D3/60
摘要： An aqueous cyanide-free electrolyte bath for plating of tin alloy layers on substrate surfaces comprising (i) a tin ion source and a source for another alloy element, characterized in that it further contains (ii) N-methyl pyrrolidone is described.
摘要翻译： 一种用于在基底表面上镀锡合金层的不含氰化氰的电解质浴，包括（i）锡离子源和另一合金元素的源，其特征在于还描述了（ⅱ）N-甲基吡咯烷酮。
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6.发明申请PYROPHOSPHATE-CONTAINING BATH FOR CYANIDE-FREE DEPOSITION OF COPPER-TIN ALLOYS 审中-公开含磷酸根合金的无氰沉淀的含磷酸盐浴公开(公告)号：US20100326838A1
公开(公告)日：2010-12-30
申请号：US12866996
申请日：2009-05-29
IPC分类号： C25D3/38
摘要： A pyrophosphate-containing bath for the cyanide-free deposition of copper alloys on substrate surfaces, comprising a reaction product of a secondary monoamine with a diglycidyl ether, is described. The electrolyte bath is suitable for the galvanic deposition of glossy white, even and uniform copper-tin alloy coatings.
摘要翻译： 描述了含有二次单胺与二缩水甘油醚的反应产物的用于在基底表面上无氰化物沉积铜合金的含焦磷酸盐浴。 电解液浴适用于光滑的白色均匀和均匀的铜 - 锡合金涂层的电沉积。
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公开(公告)号：US10266957B2
公开(公告)日：2019-04-23
申请号：US13148807
申请日：2009-02-13
摘要： The present invention is to provide a chrome-plated part having a corrosion resistance in normal and specific circumstances and not requiring additional treatments after chrome plating, and to provide a manufacturing method of such a chrome plated part. The chrome-plated part 1 includes: a substrate 2; a bright nickel plating layer 5b formed over the substrate 2; a noble potential nickel plating layer 5a formed on the bright nickel plating layer 5b. An electric potential difference between the bright nickel plating layer 5b and the noble potential nickel plating layer 5a is within a range from 40 mV to 150 mV. The chrome-plated part 1 further includes: a trivalent chrome plating layer 6 formed on the noble potential nickel plating layer 5a and having at least any one of a microporous structure and a microcrack structure.
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公开(公告)号：US20120052319A1
公开(公告)日：2012-03-01
申请号：US13148807
申请日：2009-02-13
CPC分类号： C25D5/14 , C23C28/322 , C23C28/3455 , C25D3/06 , C25D3/12 , Y10T428/12479
摘要： The present invention is to provide a chrome-plated part having a corrosion resistance in normal and specific circumstances and not requiring additional treatments after chrome plating, and to provide a manufacturing method of such a chrome plated part. The chrome -plated part 1 includes: a substrate 2; a bright nickel plating layer 5b formed over the substrate 2; a noble potential nickel plating layer 5a formed on the bright nickel plating layer 5b. An electric potential difference between the bright nickel plating layer 5b and the noble potential nickel plating layer 5a is within a range from 40 mV to 150 mV. The chrome-plated part 1 further includes: a trivalent chrome plating layer 6 formed on the noble potential nickel plating layer 5a and having at least any one of a microporous structure and a microcrack structure.
摘要翻译： 本发明是提供一种在正常和具体情况下具有耐腐蚀性并且不需要在镀铬后进一步处理的镀铬部件，并且提供这种镀铬部件的制造方法。 镀铬部分1包括：基底2; 形成在基板2上的光亮镍镀层5b; 形成在亮镍镀层5b上的高电位镍镀层5a。 亮镍镀层5b和贵金属电镀镍层5a之间的电位差在40mV至150mV的范围内。 镀铬部分1还包括：形成在贵金属镍镀层5a上并且具有微孔结构和微裂纹结构中的至少一种的三价铬镀层6。
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公开(公告)号：US09689081B2
公开(公告)日：2017-06-27
申请号：US14113247
申请日：2012-04-27
摘要： The invention relates to methods and plating baths for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.
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公开(公告)号：US20140042033A1
公开(公告)日：2014-02-13
申请号：US14113247
申请日：2012-04-27
IPC分类号： C25D3/06
摘要： The invention relates to methods and plating baths for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.
摘要翻译： 本发明涉及用于在工件上电沉积暗铬层的方法和电镀液。 三价铬电镀浴包含硫化合物，并且用于电沉积暗铬层的方法采用这些三价铬电镀浴。 暗铬沉积物和携带暗铬沉积物的工件适用于装饰目的。
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