Quartz glass blank and method for producing said blank
    1.
    发明授权
    Quartz glass blank and method for producing said blank 有权
    石英玻璃坯料及其制造方法

    公开(公告)号:US07981824B2

    公开(公告)日:2011-07-19

    申请号:US11597087

    申请日:2005-05-11

    摘要: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

    摘要翻译: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料,该坯料由掺杂有钛和/或氟的高纯石英玻璃组成,其特征在于极高的均匀性 。 均匀性涉及以下特征:a)相对于TiO 2含量的平均值,TiO 2分布的局部方差(<0.05%TiO 2,相对于(5μm)的体积元素平均)引起的微不均匀性) ,b)主要功能方向(<5ppb / K)的热膨胀系数&Dgr;α的绝对最大不均匀性,c)不大于石英玻璃坯料的可用表面的热膨胀系数的径向变化 超过0.4ppb /(K.cm); d)具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射(SDB) 和e)根据(b)在光学表面上平均的&Dgr;α的具体进展。 所述石英玻璃坯料只能通过将含有硅,钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料,其中使用几个成形步骤 并均质化。

    Quartz Glass Blank and Method for Producing Said Blank
    2.
    发明申请
    Quartz Glass Blank and Method for Producing Said Blank 有权
    石英玻璃空白和生产所述空白的方法

    公开(公告)号:US20080274869A1

    公开(公告)日:2008-11-06

    申请号:US11597087

    申请日:2005-05-11

    IPC分类号: C03C3/06 C03B29/00

    摘要: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

    摘要翻译: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料,该坯料由掺杂有钛和/或氟的高纯石英玻璃组成,其特征在于极高的均匀性 。 均匀性涉及以下特征:a)由TiO 2分布(<0.05%TIO 2 2)的局部方差引起的微不均匀性,其平均值在 (5umum)相对于TiO 2含量的平均值),b)主要功能方向上的热膨胀系数Deltaalpha的绝对最大不均匀性( <5ppb / K),c)在石英玻璃坯料的可用表面上的热膨胀系数的径向变化不大于0.4ppb /(K.cm); d)具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射(SDB) 和e)根据(b)在光学表面上平均的Deltaalpha的特定进展。 所述石英玻璃坯料只能通过将含有硅,钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料,其中使用几个成形步骤 并均质化。

    Porous silica granule, method for producing the same, and method for producing synthetic quartz glass powder using the porous silica granule
    5.
    发明授权
    Porous silica granule, method for producing the same, and method for producing synthetic quartz glass powder using the porous silica granule 有权
    多孔二氧化硅颗粒,其制造方法以及使用多孔二氧化硅颗粒制造合成石英玻璃粉末的方法

    公开(公告)号:US06849242B1

    公开(公告)日:2005-02-01

    申请号:US09672438

    申请日:2000-09-28

    摘要: The granule consists of individual granules approximately spherical in shape, having a pore volume of 0.5 cm3, a mean diameter of pores of 50 nm or less, a specific surface area of 100 m2/g or less, and a bulk density of 0.7 g/cm3 or higher. It is produced by dispersing a fumed silica obtained by hydrolysis of a silicon compound into pure water to obtain a slurry, and drying the slurry. The granule is used for producing high purity synthetic quartz glass powder. The method further comprises: a first heat treatment under an oxygen-containing atmosphere, a second heat treatment in a temperature range of from 600 to 1100° C., and a third heat treatment in a temperature range of from 1100 to 1300° C. under an atmosphere containing hydrogen chloride; and a step of densification comprising calcining the product at a temperature not higher than 1500° C. under vacuum or in an atmosphere of gaseous hydrogen or gaseous helium. To calcine the powder without causing fusion adhesion of the particles, bubbling fluidization of said porous silica granule is conducted by supplying gaseous helium and calcining thereof in a temperature range of from 1000 to 1600° C.

    摘要翻译: 颗粒由近似球形的单个颗粒组成,孔体积为0.5cm 3,孔的平均直径为50nm以下,比表面积为100m 2 / g以下, 堆积密度为0.7g / cm 3以上。 通过将通过硅化合物的水解获得的热解法二氧化硅分散在纯水中得到浆料并干燥浆料而制备。 该颗粒用于生产高纯度合成石英玻璃粉末。 该方法还包括:在含氧气氛下进行第一次热处理,在600〜1100℃的温度范围进行第二次热处理,在1100〜1300℃的温度范围进行第三次热处理。 在含有氯化氢的气氛下; 以及致密化步骤,包括在真空下或在气态氢气或气态氦气氛中,在不高于1500℃的温度下煅烧产品。 为了煅烧粉末而不引起颗粒的熔融粘附,所述多孔二氧化硅颗粒的鼓泡流化是通过在1000至1600℃的温度范围内提供气态氦和煅烧来进行的。

    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof
    6.
    发明授权
    Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof 有权
    SiO 2含量高的复合材料的制造方法,根据该方法得到的复合材料及其永久模具

    公开(公告)号:US06660671B2

    公开(公告)日:2003-12-09

    申请号:US10103660

    申请日:2002-03-21

    IPC分类号: C03C100

    摘要: Composite material with high resistance to temperature changes and a high density, and having an SiO2-containing matrix with quartz glass grains embedded therein is produced by preparing a suspension from a particle mixture of finely divided SiO2 powder having at least two different particle fractions and of the quartz glass grains, forming a green compact and sintering the compact. The matrix has an SiO2 content of at least 99% by wt. and is formed from at least first and second particle fractions, each of which is present as granules of nanoscale, amorphous, synthetically produced SiO2 primary particles having a mean primary particle size of less than 100 nm. The composite material has an SiO2-containing matrix with an SiO2 content of at least 99% by wt. It is particularly suited for applications such as starting material for producing a permanent mold for melting solar silicon.

    摘要翻译: 通过从具有至少两种不同颗粒级分的细分SiO 2粉末和具有至少两种不同颗粒级分的颗粒混合物制备悬浮液,制备具有高耐温变化和高密度的复合材料,并且具有嵌入石英玻璃颗粒的含SiO 2基质 石英玻璃颗粒,形成一个生坯并烧结成型。 该基质具有至少99重量%的SiO 2含量。 并且由至少第一和第二颗粒组分形成,每个颗粒级分以纳米级,无定形,合成产生的平均一次粒径小于100nm的SiO 2一次颗粒的颗粒形式存在。 复合材料具有SiO 2含量至少为99重量%的含SiO 2的基体。 特别适合用于制造用于熔化太阳能硅的永久模具的起始材料。